SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD, AND CONTROL PROGRAM

To prevent the application of an unacceptable voltage to a specific component of a substrate processing device.SOLUTION: A substrate processing system includes a substrate processing device including a processing container that processes a substrate and a DC power supply that applies a DC voltage to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MOHD FAIRUZ BIN BUDIMAN, TAKAYOSHI JOJI, KINO SHU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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