MICROFLUIDIC EJECTION CHIP, HEAD, DISPENSING DEVICE, AND PRODUCTION METHOD

To provide, e.g., a microfluidic chip, for dispensing fluids containing an acidic component, such as HF/HNO3, that is chemically reactive with silicon.SOLUTION: A microfluidic ejection chip includes a silicon substrate having a fluid passageway. The fluid passageway is defined by a silicon sidewall...

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Bibliographische Detailangaben
Hauptverfasser:	DAVID L BERNARD, SEAN T WEAVER
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CORRECTION OF TYPOGRAPHICAL ERRORS i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LINING MACHINES MEASURING NOZZLES PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS PRINTING SELECTIVE PRINTING MECHANISMS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL STAMPS TESTING THEIR RELEVANT APPARATUS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	To provide, e.g., a microfluidic chip, for dispensing fluids containing an acidic component, such as HF/HNO3, that is chemically reactive with silicon.SOLUTION: A microfluidic ejection chip includes a silicon substrate having a fluid passageway. The fluid passageway is defined by a silicon sidewall of the silicon substrate that is covered by a permanent passivation layer to protect the silicon sidewall from exposure to an acidic fluid. The permanent passivation layer is retained on the silicon sidewall at a conclusion of etching of the silicon substrate to form the fluid passageway.SELECTED DRAWING: Figure 2 【課題】例えばシリコンと化学的に反応性であるＨＦ／ＨＮＯ３といった酸分を含む流体を分注するためのマイクロ流体チップを提供する。【解決手段】マイクロ流体吐出チップは、流体通路を有するシリコン基板を含む。流体通路は、酸性流体への露出からシリコン側壁を保護するための永久パッシベーション層により覆われた、シリコン基板のシリコン側壁により定義される。永久パッシベーション層は、流体通路を形成するためのシリコン基板のエッチングの終わりにシリコン側壁に残される。【選択図】図２