METHOD OF MANUFACTURING TRENCH GATE TYPE SWITCHING ELEMENT

To provide a technology capable of suppressing generation of crystal defects at an upper end of a trench.SOLUTION: A method of manufacturing a switching element includes first to eighth steps. At the first step, an n-type region exposed to an upper surface of a semiconductor substrate is formed in t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WATANABE YUKIHIKO, URAGAMI YASUSHI, OTSUBO HIROAKI
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!