FINE PARTICLE PRODUCTION APPARATUS
To provide a fine particle production apparatus in which sticking of liquid material to the vicinity of a distal end of a nozzle can be directly removed and possibility of damaging the distal end of the nozzle is reduced, and which therefore allows for stable production of uniform particles.SOLUTION...
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| creator | TATEYAMA YUICHI SUEMATSU RYOICHI MISAKI NORIHIKO MASUDA KENTA YAMAZAKI HIROKI |
| description | To provide a fine particle production apparatus in which sticking of liquid material to the vicinity of a distal end of a nozzle can be directly removed and possibility of damaging the distal end of the nozzle is reduced, and which therefore allows for stable production of uniform particles.SOLUTION: A fine particle production apparatus comprises: a solution tank 10 storing a solution; a nozzle 20 spraying a solution supplied from the solution tank; a furnace core tube 30 heating the sprayed solution and generating fine particles; a recovery device 40 recovering the generated fine particles; and a sticking removal mechanism 50 removing a solid stuck to the nozzle 20. The sticking removal mechanism 50 comprises: an edge portion 52 contacting with the solid stuck to the nozzle 20 and sliding thereby removing the solid; an operation portion 54 operating motion of the edge portion 52. The edge portion 52 is mutually movable between a standby position not for inhibiting spraying of the solution from the nozzle 20 and a sticking removal position for removing sticking on the nozzle 20, and the edge portion 52 does not contact the distal end 22 of the nozzle 20 at the sticking removal position.SELECTED DRAWING: Figure 4
【課題】ノズルの先端部近傍の固着を直接的に除去できると共にノズルの先端部を傷つける虞が低減し、均質な粒子を安定的に製造できる微粒子製造装置を提供する。【解決手段】溶液を貯留する溶液タンク１０と、溶液タンクから供給された溶液を噴霧するノズル２０と、噴霧された溶液を加熱し微粒子を生成する炉芯管３０と、生成された微粒子を回収する回収装置４０と、ノズル２０に固着した固体を除去する固着除去機構５０と、を備え、固着除去機構５０は、ノズル２０に固着した固体に接触させ摺動させることで固体を除去するエッジ部５２と、エッジ部５２の動きを操作する操作部５４と、を備え、エッジ部５２は、ノズル２０からの溶液の噴霧を妨げない待機位置およびノズル２０の固着を除去する固着除去位置に相互に移動可能であり、エッジ部５２は、固着除去位置においてノズル２０の先端部２２に接触しない。【選択図】図４ |
| format | Patent |
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【課題】ノズルの先端部近傍の固着を直接的に除去できると共にノズルの先端部を傷つける虞が低減し、均質な粒子を安定的に製造できる微粒子製造装置を提供する。【解決手段】溶液を貯留する溶液タンク１０と、溶液タンクから供給された溶液を噴霧するノズル２０と、噴霧された溶液を加熱し微粒子を生成する炉芯管３０と、生成された微粒子を回収する回収装置４０と、ノズル２０に固着した固体を除去する固着除去機構５０と、を備え、固着除去機構５０は、ノズル２０に固着した固体に接触させ摺動させることで固体を除去するエッジ部５２と、エッジ部５２の動きを操作する操作部５４と、を備え、エッジ部５２は、ノズル２０からの溶液の噴霧を妨げない待機位置およびノズル２０の固着を除去する固着除去位置に相互に移動可能であり、エッジ部５２は、固着除去位置においてノズル２０の先端部２２に接触しない。【選択図】図４</description><language>eng ; jpn</language><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210506&DB=EPODOC&CC=JP&NR=2021069992A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210506&DB=EPODOC&CC=JP&NR=2021069992A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TATEYAMA YUICHI</creatorcontrib><creatorcontrib>SUEMATSU RYOICHI</creatorcontrib><creatorcontrib>MISAKI NORIHIKO</creatorcontrib><creatorcontrib>MASUDA KENTA</creatorcontrib><creatorcontrib>YAMAZAKI HIROKI</creatorcontrib><title>FINE PARTICLE PRODUCTION APPARATUS</title><description>To provide a fine particle production apparatus in which sticking of liquid material to the vicinity of a distal end of a nozzle can be directly removed and possibility of damaging the distal end of the nozzle is reduced, and which therefore allows for stable production of uniform particles.SOLUTION: A fine particle production apparatus comprises: a solution tank 10 storing a solution; a nozzle 20 spraying a solution supplied from the solution tank; a furnace core tube 30 heating the sprayed solution and generating fine particles; a recovery device 40 recovering the generated fine particles; and a sticking removal mechanism 50 removing a solid stuck to the nozzle 20. The sticking removal mechanism 50 comprises: an edge portion 52 contacting with the solid stuck to the nozzle 20 and sliding thereby removing the solid; an operation portion 54 operating motion of the edge portion 52. The edge portion 52 is mutually movable between a standby position not for inhibiting spraying of the solution from the nozzle 20 and a sticking removal position for removing sticking on the nozzle 20, and the edge portion 52 does not contact the distal end 22 of the nozzle 20 at the sticking removal position.SELECTED DRAWING: Figure 4
【課題】ノズルの先端部近傍の固着を直接的に除去できると共にノズルの先端部を傷つける虞が低減し、均質な粒子を安定的に製造できる微粒子製造装置を提供する。【解決手段】溶液を貯留する溶液タンク１０と、溶液タンクから供給された溶液を噴霧するノズル２０と、噴霧された溶液を加熱し微粒子を生成する炉芯管３０と、生成された微粒子を回収する回収装置４０と、ノズル２０に固着した固体を除去する固着除去機構５０と、を備え、固着除去機構５０は、ノズル２０に固着した固体に接触させ摺動させることで固体を除去するエッジ部５２と、エッジ部５２の動きを操作する操作部５４と、を備え、エッジ部５２は、ノズル２０からの溶液の噴霧を妨げない待機位置およびノズル２０の固着を除去する固着除去位置に相互に移動可能であり、エッジ部５２は、固着除去位置においてノズル２０の先端部２２に接触しない。【選択図】図４</description><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBy8_RzVQhwDArxdPYBMoL8XUKdQzz9_RQcA4CijiGhwTwMrGmJOcWpvFCaG6jJNcTZQze1ID8-tbggMTk1L7Uk3ivAyMDI0MDM0tLSyNGYKEUAizUjGw</recordid><startdate>20210506</startdate><enddate>20210506</enddate><creator>TATEYAMA YUICHI</creator><creator>SUEMATSU RYOICHI</creator><creator>MISAKI NORIHIKO</creator><creator>MASUDA KENTA</creator><creator>YAMAZAKI HIROKI</creator><scope>EVB</scope></search><sort><creationdate>20210506</creationdate><title>FINE PARTICLE PRODUCTION APPARATUS</title><author>TATEYAMA YUICHI ; SUEMATSU RYOICHI ; MISAKI NORIHIKO ; MASUDA KENTA ; YAMAZAKI HIROKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2021069992A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2021</creationdate><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TATEYAMA YUICHI</creatorcontrib><creatorcontrib>SUEMATSU RYOICHI</creatorcontrib><creatorcontrib>MISAKI NORIHIKO</creatorcontrib><creatorcontrib>MASUDA KENTA</creatorcontrib><creatorcontrib>YAMAZAKI HIROKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TATEYAMA YUICHI</au><au>SUEMATSU RYOICHI</au><au>MISAKI NORIHIKO</au><au>MASUDA KENTA</au><au>YAMAZAKI HIROKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FINE PARTICLE PRODUCTION APPARATUS</title><date>2021-05-06</date><risdate>2021</risdate><abstract>To provide a fine particle production apparatus in which sticking of liquid material to the vicinity of a distal end of a nozzle can be directly removed and possibility of damaging the distal end of the nozzle is reduced, and which therefore allows for stable production of uniform particles.SOLUTION: A fine particle production apparatus comprises: a solution tank 10 storing a solution; a nozzle 20 spraying a solution supplied from the solution tank; a furnace core tube 30 heating the sprayed solution and generating fine particles; a recovery device 40 recovering the generated fine particles; and a sticking removal mechanism 50 removing a solid stuck to the nozzle 20. The sticking removal mechanism 50 comprises: an edge portion 52 contacting with the solid stuck to the nozzle 20 and sliding thereby removing the solid; an operation portion 54 operating motion of the edge portion 52. The edge portion 52 is mutually movable between a standby position not for inhibiting spraying of the solution from the nozzle 20 and a sticking removal position for removing sticking on the nozzle 20, and the edge portion 52 does not contact the distal end 22 of the nozzle 20 at the sticking removal position.SELECTED DRAWING: Figure 4
【課題】ノズルの先端部近傍の固着を直接的に除去できると共にノズルの先端部を傷つける虞が低減し、均質な粒子を安定的に製造できる微粒子製造装置を提供する。【解決手段】溶液を貯留する溶液タンク１０と、溶液タンクから供給された溶液を噴霧するノズル２０と、噴霧された溶液を加熱し微粒子を生成する炉芯管３０と、生成された微粒子を回収する回収装置４０と、ノズル２０に固着した固体を除去する固着除去機構５０と、を備え、固着除去機構５０は、ノズル２０に固着した固体に接触させ摺動させることで固体を除去するエッジ部５２と、エッジ部５２の動きを操作する操作部５４と、を備え、エッジ部５２は、ノズル２０からの溶液の噴霧を妨げない待機位置およびノズル２０の固着を除去する固着除去位置に相互に移動可能であり、エッジ部５２は、固着除去位置においてノズル２０の先端部２２に接触しない。【選択図】図４</abstract><oa>free_for_read</oa></addata></record> |
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| title | FINE PARTICLE PRODUCTION APPARATUS |
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