PHOTOSENSITIVE COMPOSITION
To provide a photosensitive composition capable of forming a fine pattern even by a simple production step.SOLUTION: There is provided a photosensitive composition which comprises a binder resin (A), a photopolymerizable monomer (B) and a photopolymerization initiator (C), wherein the binder resin (...
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| creator | TSUNEKAWA MISAO KADOWAKI TOMOYUKI WAKU TOSHIO |
| description | To provide a photosensitive composition capable of forming a fine pattern even by a simple production step.SOLUTION: There is provided a photosensitive composition which comprises a binder resin (A), a photopolymerizable monomer (B) and a photopolymerization initiator (C), wherein the binder resin (A) contains the following photosensitive resin (A1) and contains no pigment. The photosensitive resin (A1) includes an alkali-soluble resin having a carboxy group and a polymerizable unsaturated group in a side chain selected from the following (I) and (II): (I) an alkali-soluble resin obtained by reacting a polybasic acid or polybasic acid anhydride with a product of an epoxy group in an epoxy group-containing resin and a carboxy group-containing monomer and (II) an alkali-soluble resin which is a reaction product of a carboxy group in a carboxy group-containing resin and an epoxy group-containing monomer.SELECTED DRAWING: None
【課題】本発明は、簡易な製造工程でも微細なパターンを形成できる感光性組成物の提供を目的とする。【解決手段】バインダ樹脂（Ａ）、光重合性単量体（Ｂ）、および光重合開始剤（Ｃ）を含み、バインダ樹脂（Ａ）が、下記感光性樹脂（Ａ１）を含み、顔料を含まない、感光性組成物。感光性樹脂（Ａ１）が下記（Ｉ）および（ＩＩ）から選択される側鎖にカルボキシ基および重合性不飽和基を有するアルカリ可溶性樹脂を含み、（Ｉ）エポキシ基含有樹脂中のエポキシ基と、カルボキシ基含有単量体との生成物に、多塩基酸または多塩基酸無水物を反応させてなるアルカリ可溶性樹脂。（ＩＩ）カルボキシ基含有樹脂中のカルボキシ基と、エポキシ基含有単量体との反応物であるアルカリ可溶性樹脂。【選択図】なし |
| format | Patent |
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【課題】本発明は、簡易な製造工程でも微細なパターンを形成できる感光性組成物の提供を目的とする。【解決手段】バインダ樹脂（Ａ）、光重合性単量体（Ｂ）、および光重合開始剤（Ｃ）を含み、バインダ樹脂（Ａ）が、下記感光性樹脂（Ａ１）を含み、顔料を含まない、感光性組成物。感光性樹脂（Ａ１）が下記（Ｉ）および（ＩＩ）から選択される側鎖にカルボキシ基および重合性不飽和基を有するアルカリ可溶性樹脂を含み、（Ｉ）エポキシ基含有樹脂中のエポキシ基と、カルボキシ基含有単量体との生成物に、多塩基酸または多塩基酸無水物を反応させてなるアルカリ可溶性樹脂。（ＩＩ）カルボキシ基含有樹脂中のカルボキシ基と、エポキシ基含有単量体との反応物であるアルカリ可溶性樹脂。【選択図】なし</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210415&DB=EPODOC&CC=JP&NR=2021060436A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210415&DB=EPODOC&CC=JP&NR=2021060436A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSUNEKAWA MISAO</creatorcontrib><creatorcontrib>KADOWAKI TOMOYUKI</creatorcontrib><creatorcontrib>WAKU TOSHIO</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION</title><description>To provide a photosensitive composition capable of forming a fine pattern even by a simple production step.SOLUTION: There is provided a photosensitive composition which comprises a binder resin (A), a photopolymerizable monomer (B) and a photopolymerization initiator (C), wherein the binder resin (A) contains the following photosensitive resin (A1) and contains no pigment. The photosensitive resin (A1) includes an alkali-soluble resin having a carboxy group and a polymerizable unsaturated group in a side chain selected from the following (I) and (II): (I) an alkali-soluble resin obtained by reacting a polybasic acid or polybasic acid anhydride with a product of an epoxy group in an epoxy group-containing resin and a carboxy group-containing monomer and (II) an alkali-soluble resin which is a reaction product of a carboxy group in a carboxy group-containing resin and an epoxy group-containing monomer.SELECTED DRAWING: None
【課題】本発明は、簡易な製造工程でも微細なパターンを形成できる感光性組成物の提供を目的とする。【解決手段】バインダ樹脂（Ａ）、光重合性単量体（Ｂ）、および光重合開始剤（Ｃ）を含み、バインダ樹脂（Ａ）が、下記感光性樹脂（Ａ１）を含み、顔料を含まない、感光性組成物。感光性樹脂（Ａ１）が下記（Ｉ）および（ＩＩ）から選択される側鎖にカルボキシ基および重合性不飽和基を有するアルカリ可溶性樹脂を含み、（Ｉ）エポキシ基含有樹脂中のエポキシ基と、カルボキシ基含有単量体との生成物に、多塩基酸または多塩基酸無水物を反応させてなるアルカリ可溶性樹脂。（ＩＩ）カルボキシ基含有樹脂中のカルボキシ基と、エポキシ基含有単量体との反応物であるアルカリ可溶性樹脂。【選択図】なし</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAK8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f14GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8V4CRgZGhgZmBibGZozFRigCiaiEd</recordid><startdate>20210415</startdate><enddate>20210415</enddate><creator>TSUNEKAWA MISAO</creator><creator>KADOWAKI TOMOYUKI</creator><creator>WAKU TOSHIO</creator><scope>EVB</scope></search><sort><creationdate>20210415</creationdate><title>PHOTOSENSITIVE COMPOSITION</title><author>TSUNEKAWA MISAO ; KADOWAKI TOMOYUKI ; WAKU TOSHIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2021060436A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>TSUNEKAWA MISAO</creatorcontrib><creatorcontrib>KADOWAKI TOMOYUKI</creatorcontrib><creatorcontrib>WAKU TOSHIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSUNEKAWA MISAO</au><au>KADOWAKI TOMOYUKI</au><au>WAKU TOSHIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE COMPOSITION</title><date>2021-04-15</date><risdate>2021</risdate><abstract>To provide a photosensitive composition capable of forming a fine pattern even by a simple production step.SOLUTION: There is provided a photosensitive composition which comprises a binder resin (A), a photopolymerizable monomer (B) and a photopolymerization initiator (C), wherein the binder resin (A) contains the following photosensitive resin (A1) and contains no pigment. The photosensitive resin (A1) includes an alkali-soluble resin having a carboxy group and a polymerizable unsaturated group in a side chain selected from the following (I) and (II): (I) an alkali-soluble resin obtained by reacting a polybasic acid or polybasic acid anhydride with a product of an epoxy group in an epoxy group-containing resin and a carboxy group-containing monomer and (II) an alkali-soluble resin which is a reaction product of a carboxy group in a carboxy group-containing resin and an epoxy group-containing monomer.SELECTED DRAWING: None
【課題】本発明は、簡易な製造工程でも微細なパターンを形成できる感光性組成物の提供を目的とする。【解決手段】バインダ樹脂（Ａ）、光重合性単量体（Ｂ）、および光重合開始剤（Ｃ）を含み、バインダ樹脂（Ａ）が、下記感光性樹脂（Ａ１）を含み、顔料を含まない、感光性組成物。感光性樹脂（Ａ１）が下記（Ｉ）および（ＩＩ）から選択される側鎖にカルボキシ基および重合性不飽和基を有するアルカリ可溶性樹脂を含み、（Ｉ）エポキシ基含有樹脂中のエポキシ基と、カルボキシ基含有単量体との生成物に、多塩基酸または多塩基酸無水物を反応させてなるアルカリ可溶性樹脂。（ＩＩ）カルボキシ基含有樹脂中のカルボキシ基と、エポキシ基含有単量体との反応物であるアルカリ可溶性樹脂。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PHOTOSENSITIVE COMPOSITION |
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