IMPRINT METHOD, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND IMPRINT DEVICE

To improve a defect of effusion of resist.SOLUTION: An imprint method according an embodiment includes the steps of disposing a first chemical solution that is photocurable in a first region on a substrate, disposing a second chemical solution that is non-photocurable in an outer periphery of the fi...

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Bibliographische Detailangaben
Hauptverfasser:	HIGUCHI TSUYOSHI, KATO HIROKAZU, OKABE KASUMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	To improve a defect of effusion of resist.SOLUTION: An imprint method according an embodiment includes the steps of disposing a first chemical solution that is photocurable in a first region on a substrate, disposing a second chemical solution that is non-photocurable in an outer periphery of the first region, curing the first chemical solution by delivering light while a surface of a template including a pattern is pressed to the first chemical solution, thereby forming a resist pattern to which the pattern is transferred, separating the resist pattern and the template, and selectively removing at least the second chemical solution.SELECTED DRAWING: Figure 2 【課題】レジストの浸み出し欠陥を改善すること。【解決手段】実施形態のインプリント方法は、基板上の第１の領域に光硬化性の第１の薬液を配置するステップと、第１の領域の外周部に非光硬化性の第２の薬液を配置するステップと、テンプレートのパターンを有する面を第１の薬液に押し当てた状態で光を照射して第１の薬液を硬化させ、パターンが転写されたレジストパターンを形成するステップと、レジストパターンとテンプレートとを離間させるステップと、少なくとも第２の薬液を選択的に除去するステップと、を含む。【選択図】図２