MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR PROVIDING PRODUCT DIFFERENT FROM RAW MATERIAL BY TREATING RAW MATERIAL WITH MICRO WAVE SURFACE WAVE PLASMA
To provide a manufacturing device suitable in a point of view of raw material usage efficiency and making a product high purity in a manufacturing device and the manufacturing method for providing a product different from a raw material by treating the raw material with micro wave surface wave plasm...
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| creator | SAKAMOTO YUICHI MORIMOTO MINEO SHIRANE TAKASHI USUKI KOICHI TAKIZAWA TSUTOMU |
| description | To provide a manufacturing device suitable in a point of view of raw material usage efficiency and making a product high purity in a manufacturing device and the manufacturing method for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma.SOLUTION: A manufacturing device for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma, has a reaction chamber for treating the raw material with the micro wave surface wave plasma, a first exhaust port for discharging a gas in the reaction chamber, a gas supply port arranged in the reaction chamber for supplying a gas to be treated by micro wave surface wave plasma into the reaction chamber, microwave generation means for generating a micro wave for generating the micro wave surface wave plasma, a first window of a dielectric material arranged at a part for injecting the micro wave into the reaction chamber for generating the micro wave surface wave plasma on a surface, and first Lorentz force generation means for forming Lorentz force suppressing exhaust of a first ion used for generation of the product.SELECTED DRAWING: Figure 2
【課題】原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法において、原料利用効率又は生成物の高純度化の観点で好適な製造装置を提供する。【解決手段】本発明の反応室内で原料をマイクロ波表面波プラズマで処理して前記原料と異なる生成物を得る製造装置は、原料をマイクロ波表面波プラズマで処理する反応室と、反応室に設けられ、反応室内の気体を排気する第１排気口と、反応室に設けられ、マイクロ波表面波プラズマ化する気体を反応室内に供給する気体供給口と、マイクロ波表面波プラズマを生成するためのマイクロ波を発生させるマイクロ波発生手段と、反応室内にマイクロ波を入射させる部分に設けられ、表面でマイクロ波表面波プラズマを生成させる誘電体材料の第１窓と、生成物の生成に用いる第１イオンの排気を抑制するローレンツ力を形成する第１ローレンツ力発生手段と、を備える。【選択図】図２ |
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【課題】原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法において、原料利用効率又は生成物の高純度化の観点で好適な製造装置を提供する。【解決手段】本発明の反応室内で原料をマイクロ波表面波プラズマで処理して前記原料と異なる生成物を得る製造装置は、原料をマイクロ波表面波プラズマで処理する反応室と、反応室に設けられ、反応室内の気体を排気する第１排気口と、反応室に設けられ、マイクロ波表面波プラズマ化する気体を反応室内に供給する気体供給口と、マイクロ波表面波プラズマを生成するためのマイクロ波を発生させるマイクロ波発生手段と、反応室内にマイクロ波を入射させる部分に設けられ、表面でマイクロ波表面波プラズマを生成させる誘電体材料の第１窓と、生成物の生成に用いる第１イオンの排気を抑制するローレンツ力を形成する第１ローレンツ力発生手段と、を備える。【選択図】図２</description><language>eng ; jpn</language><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMISTRY ; COMPOUNDS THEREOF ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210311&DB=EPODOC&CC=JP&NR=2021037511A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210311&DB=EPODOC&CC=JP&NR=2021037511A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAKAMOTO YUICHI</creatorcontrib><creatorcontrib>MORIMOTO MINEO</creatorcontrib><creatorcontrib>SHIRANE TAKASHI</creatorcontrib><creatorcontrib>USUKI KOICHI</creatorcontrib><creatorcontrib>TAKIZAWA TSUTOMU</creatorcontrib><title>MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR PROVIDING PRODUCT DIFFERENT FROM RAW MATERIAL BY TREATING RAW MATERIAL WITH MICRO WAVE SURFACE WAVE PLASMA</title><description>To provide a manufacturing device suitable in a point of view of raw material usage efficiency and making a product high purity in a manufacturing device and the manufacturing method for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma.SOLUTION: A manufacturing device for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma, has a reaction chamber for treating the raw material with the micro wave surface wave plasma, a first exhaust port for discharging a gas in the reaction chamber, a gas supply port arranged in the reaction chamber for supplying a gas to be treated by micro wave surface wave plasma into the reaction chamber, microwave generation means for generating a micro wave for generating the micro wave surface wave plasma, a first window of a dielectric material arranged at a part for injecting the micro wave into the reaction chamber for generating the micro wave surface wave plasma on a surface, and first Lorentz force generation means for forming Lorentz force suppressing exhaust of a first ion used for generation of the product.SELECTED DRAWING: Figure 2
【課題】原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法において、原料利用効率又は生成物の高純度化の観点で好適な製造装置を提供する。【解決手段】本発明の反応室内で原料をマイクロ波表面波プラズマで処理して前記原料と異なる生成物を得る製造装置は、原料をマイクロ波表面波プラズマで処理する反応室と、反応室に設けられ、反応室内の気体を排気する第１排気口と、反応室に設けられ、マイクロ波表面波プラズマ化する気体を反応室内に供給する気体供給口と、マイクロ波表面波プラズマを生成するためのマイクロ波を発生させるマイクロ波発生手段と、反応室内にマイクロ波を入射させる部分に設けられ、表面でマイクロ波表面波プラズマを生成させる誘電体材料の第１窓と、生成物の生成に用いる第１イオンの排気を抑制するローレンツ力を形成する第１ローレンツ力発生手段と、を備える。【選択図】図２</description><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNTTsKwkAQTWMh6h0GeyEfxHrcnTUrbjZMJglWIrJWogE9joc1QZt0Vu_Pm0Zvh0VtUEnNttiBpsYqAiw0jANHknsNxjOU7BurB7NnulYC2hpDTIWAYe-Ase3XQmzxANsjCBPK0B8FrZUcnFXsocWGoKq5v6OvKA9YOZxHk-v59gyLH86ipSFR-Sp0j1N4dudLuIfXaV-mcZrE2WadJJj9VfoACYxEQg</recordid><startdate>20210311</startdate><enddate>20210311</enddate><creator>SAKAMOTO YUICHI</creator><creator>MORIMOTO MINEO</creator><creator>SHIRANE TAKASHI</creator><creator>USUKI KOICHI</creator><creator>TAKIZAWA TSUTOMU</creator><scope>EVB</scope></search><sort><creationdate>20210311</creationdate><title>MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR PROVIDING PRODUCT DIFFERENT FROM RAW MATERIAL BY TREATING RAW MATERIAL WITH MICRO WAVE SURFACE WAVE PLASMA</title><author>SAKAMOTO YUICHI ; MORIMOTO MINEO ; SHIRANE TAKASHI ; USUKI KOICHI ; TAKIZAWA TSUTOMU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2021037511A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2021</creationdate><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SAKAMOTO YUICHI</creatorcontrib><creatorcontrib>MORIMOTO MINEO</creatorcontrib><creatorcontrib>SHIRANE TAKASHI</creatorcontrib><creatorcontrib>USUKI KOICHI</creatorcontrib><creatorcontrib>TAKIZAWA TSUTOMU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAKAMOTO YUICHI</au><au>MORIMOTO MINEO</au><au>SHIRANE TAKASHI</au><au>USUKI KOICHI</au><au>TAKIZAWA TSUTOMU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR PROVIDING PRODUCT DIFFERENT FROM RAW MATERIAL BY TREATING RAW MATERIAL WITH MICRO WAVE SURFACE WAVE PLASMA</title><date>2021-03-11</date><risdate>2021</risdate><abstract>To provide a manufacturing device suitable in a point of view of raw material usage efficiency and making a product high purity in a manufacturing device and the manufacturing method for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma.SOLUTION: A manufacturing device for providing a product different from a raw material by treating the raw material with micro wave surface wave plasma, has a reaction chamber for treating the raw material with the micro wave surface wave plasma, a first exhaust port for discharging a gas in the reaction chamber, a gas supply port arranged in the reaction chamber for supplying a gas to be treated by micro wave surface wave plasma into the reaction chamber, microwave generation means for generating a micro wave for generating the micro wave surface wave plasma, a first window of a dielectric material arranged at a part for injecting the micro wave into the reaction chamber for generating the micro wave surface wave plasma on a surface, and first Lorentz force generation means for forming Lorentz force suppressing exhaust of a first ion used for generation of the product.SELECTED DRAWING: Figure 2
【課題】原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法において、原料利用効率又は生成物の高純度化の観点で好適な製造装置を提供する。【解決手段】本発明の反応室内で原料をマイクロ波表面波プラズマで処理して前記原料と異なる生成物を得る製造装置は、原料をマイクロ波表面波プラズマで処理する反応室と、反応室に設けられ、反応室内の気体を排気する第１排気口と、反応室に設けられ、マイクロ波表面波プラズマ化する気体を反応室内に供給する気体供給口と、マイクロ波表面波プラズマを生成するためのマイクロ波を発生させるマイクロ波発生手段と、反応室内にマイクロ波を入射させる部分に設けられ、表面でマイクロ波表面波プラズマを生成させる誘電体材料の第１窓と、生成物の生成に用いる第１イオンの排気を抑制するローレンツ力を形成する第１ローレンツ力発生手段と、を備える。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS THEIR RELEVANT APPARATUS TRANSPORTING |
| title | MANUFACTURING DEVICE AND MANUFACTURING METHOD FOR PROVIDING PRODUCT DIFFERENT FROM RAW MATERIAL BY TREATING RAW MATERIAL WITH MICRO WAVE SURFACE WAVE PLASMA |
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