FILTRATION DEVICE AND PROCESSING METHOD OF LIQUID TO BE PROCESSED
To provide a filtration device and a processing method of liquid to be processed in which a deposit deposited to the surface of a filtration film is removed while suppressing damage of the surface of the filtration film of a pleat filter.SOLUTION: The problem is solved by a filtration device 10 and...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a filtration device and a processing method of liquid to be processed in which a deposit deposited to the surface of a filtration film is removed while suppressing damage of the surface of the filtration film of a pleat filter.SOLUTION: The problem is solved by a filtration device 10 and a processing method of liquid A to be processed, characterized in that the filtration device 10 provided with a filter container 11 on an inner part is provided with a tubular filtration filter 12 whose outer surface is a filter surface and an inner part thereof is a passage of filtrate, on an inner part of the filter container 11; a slit-shaped nozzle for washing the filtration filter 12 is provided on the filtration device 10; the slit-shaped nozzles are arranged opposite to the filtration filter on the outside of the filter surface, are extended in an axial center direction of the filtration filter, are plurally arranged at intervals in the axial center direction to form a slit-shaped nozzle group; and washing liquid C including soft particulate matter is injected toward the filtration filter 12 from the slit-shaped nozzle.SELECTED DRAWING: Figure 1
【課題】プリーツフィルタの濾過膜の表面の損傷を抑制しつつ、この濾過膜の表面に付着した付着物が除去される濾過装置及び被処理液の処理方法を提供すること。【解決手段】課題は、濾過容器11を内部に備える濾過装置10であって、前記濾過容器の11内部に、外面が濾過面であり内部が濾液の通路である筒状の濾過フィルタ12が設けられ、前記濾過装置10には、前記濾過フィルタ12を洗浄するスリット状ノズルが備わり、前記スリット状ノズルは、前記濾過面の外側に前記濾過フィルタに対向して配され、前記濾過フィルタの軸心方向に延在し、かつ、この軸心方向に間隔を空けて複数配されてスリット状ノズル群を成し、前記スリット状ノズル群から、軟性の粉粒体を含む前記洗浄液Cが前記濾過フィルタ12へ向かって噴射される、ことを特徴とする濾過装置及び被処理液Aの処理方法で解決される。【選択図】図1 |
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