ETCHING LIQUID FOR GLASS AND METHOD FOR MANUFACTURING GLASS SUBSTRATE
To provide a method for manufacturing a liquid crystal panel, by which influences of side etching that accompanies an etching process can be suppressed to the minimum.SOLUTION: An etching solution for glass in accordance with the present invention is an etching solution for glass to etch glass, and...
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| creator | OKODA KENTA ISHIGAKI MASAKI NISHIKAWA HARUKA SAITO SHUNSUKE FUKUSHIGE RYOSUKE SHIMADA KAZUYA NAGAI TADASHI KASHIWABARA YASUHIRO KUME TAKAHIRO TOMIYA NATSUKI MOTOMOCHI TAKESHI HAYASHI ATSUSHI OYAMA HARUTERU MIYOSHI YUZO |
| description | To provide a method for manufacturing a liquid crystal panel, by which influences of side etching that accompanies an etching process can be suppressed to the minimum.SOLUTION: An etching solution for glass in accordance with the present invention is an etching solution for glass to etch glass, and contains at least an etching inhibitor that reduces an etching rate on glass, the etching inhibitor comprising at least either an alkaline or fluorine complexing agent. The etching inhibitor preferably generates a reaction product that inhibits an etching reaction by adhering to a modified part of glass where the glass is modified to be easily etched.SELECTED DRAWING: Figure 15
【課題】エッチング処理に伴うサイドエッチングの影響を最小限に抑制することが可能な液晶パネル製造方法を提供する。【解決手段】本願発明に係るガラス用エッチング液は、ガラスをエッチングするためのガラス用エッチング液であって、ガラスに対するエッチング速度を低下させるエッチング阻害物質であって、アルカリまたはフッ素錯化剤のいずれか一方を少なくとも含有するエッチング阻害物質を少なくとも含む。エッチング阻害物質は、ガラスにおけるエッチングされやすいように改質された改質部に付着することによってエッチング反応を阻害する反応生成物を発生させるものが好ましい。【選択図】図１５ |
| format | Patent |
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【課題】エッチング処理に伴うサイドエッチングの影響を最小限に抑制することが可能な液晶パネル製造方法を提供する。【解決手段】本願発明に係るガラス用エッチング液は、ガラスをエッチングするためのガラス用エッチング液であって、ガラスに対するエッチング速度を低下させるエッチング阻害物質であって、アルカリまたはフッ素錯化剤のいずれか一方を少なくとも含有するエッチング阻害物質を少なくとも含む。エッチング阻害物質は、ガラスにおけるエッチングされやすいように改質された改質部に付着することによってエッチング反応を阻害する反応生成物を発生させるものが好ましい。【選択図】図１５</description><language>eng ; jpn</language><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMISTRY ; GLASS ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201217&DB=EPODOC&CC=JP&NR=2020200237A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201217&DB=EPODOC&CC=JP&NR=2020200237A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKODA KENTA</creatorcontrib><creatorcontrib>ISHIGAKI MASAKI</creatorcontrib><creatorcontrib>NISHIKAWA HARUKA</creatorcontrib><creatorcontrib>SAITO SHUNSUKE</creatorcontrib><creatorcontrib>FUKUSHIGE RYOSUKE</creatorcontrib><creatorcontrib>SHIMADA KAZUYA</creatorcontrib><creatorcontrib>NAGAI TADASHI</creatorcontrib><creatorcontrib>KASHIWABARA YASUHIRO</creatorcontrib><creatorcontrib>KUME TAKAHIRO</creatorcontrib><creatorcontrib>TOMIYA NATSUKI</creatorcontrib><creatorcontrib>MOTOMOCHI TAKESHI</creatorcontrib><creatorcontrib>HAYASHI ATSUSHI</creatorcontrib><creatorcontrib>OYAMA HARUTERU</creatorcontrib><creatorcontrib>MIYOSHI YUZO</creatorcontrib><title>ETCHING LIQUID FOR GLASS AND METHOD FOR MANUFACTURING GLASS SUBSTRATE</title><description>To provide a method for manufacturing a liquid crystal panel, by which influences of side etching that accompanies an etching process can be suppressed to the minimum.SOLUTION: An etching solution for glass in accordance with the present invention is an etching solution for glass to etch glass, and contains at least an etching inhibitor that reduces an etching rate on glass, the etching inhibitor comprising at least either an alkaline or fluorine complexing agent. The etching inhibitor preferably generates a reaction product that inhibits an etching reaction by adhering to a modified part of glass where the glass is modified to be easily etched.SELECTED DRAWING: Figure 15
【課題】エッチング処理に伴うサイドエッチングの影響を最小限に抑制することが可能な液晶パネル製造方法を提供する。【解決手段】本願発明に係るガラス用エッチング液は、ガラスをエッチングするためのガラス用エッチング液であって、ガラスに対するエッチング速度を低下させるエッチング阻害物質であって、アルカリまたはフッ素錯化剤のいずれか一方を少なくとも含有するエッチング阻害物質を少なくとも含む。エッチング阻害物質は、ガラスにおけるエッチングされやすいように改質された改質部に付着することによってエッチング反応を阻害する反応生成物を発生させるものが好ましい。【選択図】図１５</description><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMISTRY</subject><subject>GLASS</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB1DXH28PRzV_DxDAz1dFFw8w9ScPdxDA5WcPRzUfB1DfHwhwj6OvqFujk6h4QGgVRDlASHOgWHBDmGuPIwsKYl5hSn8kJpbgYlN5DBuqkF-fGpxQWJyal5qSXxXgFGBiBoYGRs7mhMlCIAyfMsVQ</recordid><startdate>20201217</startdate><enddate>20201217</enddate><creator>OKODA KENTA</creator><creator>ISHIGAKI MASAKI</creator><creator>NISHIKAWA HARUKA</creator><creator>SAITO SHUNSUKE</creator><creator>FUKUSHIGE RYOSUKE</creator><creator>SHIMADA KAZUYA</creator><creator>NAGAI TADASHI</creator><creator>KASHIWABARA YASUHIRO</creator><creator>KUME TAKAHIRO</creator><creator>TOMIYA NATSUKI</creator><creator>MOTOMOCHI TAKESHI</creator><creator>HAYASHI ATSUSHI</creator><creator>OYAMA HARUTERU</creator><creator>MIYOSHI YUZO</creator><scope>EVB</scope></search><sort><creationdate>20201217</creationdate><title>ETCHING LIQUID FOR GLASS AND METHOD FOR MANUFACTURING GLASS SUBSTRATE</title><author>OKODA KENTA ; ISHIGAKI MASAKI ; NISHIKAWA HARUKA ; SAITO SHUNSUKE ; FUKUSHIGE RYOSUKE ; SHIMADA KAZUYA ; NAGAI TADASHI ; KASHIWABARA YASUHIRO ; KUME TAKAHIRO ; TOMIYA NATSUKI ; MOTOMOCHI TAKESHI ; HAYASHI ATSUSHI ; OYAMA HARUTERU ; MIYOSHI YUZO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020200237A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMISTRY</topic><topic>GLASS</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><toplevel>online_resources</toplevel><creatorcontrib>OKODA KENTA</creatorcontrib><creatorcontrib>ISHIGAKI MASAKI</creatorcontrib><creatorcontrib>NISHIKAWA HARUKA</creatorcontrib><creatorcontrib>SAITO SHUNSUKE</creatorcontrib><creatorcontrib>FUKUSHIGE RYOSUKE</creatorcontrib><creatorcontrib>SHIMADA KAZUYA</creatorcontrib><creatorcontrib>NAGAI TADASHI</creatorcontrib><creatorcontrib>KASHIWABARA YASUHIRO</creatorcontrib><creatorcontrib>KUME TAKAHIRO</creatorcontrib><creatorcontrib>TOMIYA NATSUKI</creatorcontrib><creatorcontrib>MOTOMOCHI TAKESHI</creatorcontrib><creatorcontrib>HAYASHI ATSUSHI</creatorcontrib><creatorcontrib>OYAMA HARUTERU</creatorcontrib><creatorcontrib>MIYOSHI YUZO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OKODA KENTA</au><au>ISHIGAKI MASAKI</au><au>NISHIKAWA HARUKA</au><au>SAITO SHUNSUKE</au><au>FUKUSHIGE RYOSUKE</au><au>SHIMADA KAZUYA</au><au>NAGAI TADASHI</au><au>KASHIWABARA YASUHIRO</au><au>KUME TAKAHIRO</au><au>TOMIYA NATSUKI</au><au>MOTOMOCHI TAKESHI</au><au>HAYASHI ATSUSHI</au><au>OYAMA HARUTERU</au><au>MIYOSHI YUZO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ETCHING LIQUID FOR GLASS AND METHOD FOR MANUFACTURING GLASS SUBSTRATE</title><date>2020-12-17</date><risdate>2020</risdate><abstract>To provide a method for manufacturing a liquid crystal panel, by which influences of side etching that accompanies an etching process can be suppressed to the minimum.SOLUTION: An etching solution for glass in accordance with the present invention is an etching solution for glass to etch glass, and contains at least an etching inhibitor that reduces an etching rate on glass, the etching inhibitor comprising at least either an alkaline or fluorine complexing agent. The etching inhibitor preferably generates a reaction product that inhibits an etching reaction by adhering to a modified part of glass where the glass is modified to be easily etched.SELECTED DRAWING: Figure 15
【課題】エッチング処理に伴うサイドエッチングの影響を最小限に抑制することが可能な液晶パネル製造方法を提供する。【解決手段】本願発明に係るガラス用エッチング液は、ガラスをエッチングするためのガラス用エッチング液であって、ガラスに対するエッチング速度を低下させるエッチング阻害物質であって、アルカリまたはフッ素錯化剤のいずれか一方を少なくとも含有するエッチング阻害物質を少なくとも含む。エッチング阻害物質は、ガラスにおけるエッチングされやすいように改質された改質部に付着することによってエッチング反応を阻害する反応生成物を発生させるものが好ましい。【選択図】図１５</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
| title | ETCHING LIQUID FOR GLASS AND METHOD FOR MANUFACTURING GLASS SUBSTRATE |
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