SUBSTRATE INSPECTION METHOD, SUBSTRATE INSPECTION SYSTEM, AND CONTROL DEVICE

To easily and accurately acquire the feature quantity (thickness, line width) of a film formed on a substrate.SOLUTION: Provided is an inspection method including the steps of: creating, on the basis of the measurement result of feature quantity of a film formed on a substrate for model formation and an imaged image for model formation which is generated by imaging the substrate for model formation with the imaging device of a first substrate processing system, a correlation model between the pixel value of the substrate and the feature quantity of a film formed on the substrate; generating an imaged image of a substrate the feature quantity of which is to be acquired, with the imaging device of a second substrate processing system and calculating the estimated feature quantity of the film on the basis of the imaged image and the correlation model; calculating the statistic value of the estimated feature quantity calculated for a plurality of substrates the feature quantity of which is to be acquired; and calculating the offset amount of the estimated feature quantity from the measurement result of feature quantity of the film formed on a substrate for offset calculation having been subjected to the same process by the second substrate processing system as the formation process of the film the estimated feature quantity of which is calculated and the statistic value of the estimated feature quantity.SELECTED DRAWING: Figure 1 【課題】基板に形成された膜の特徴量（厚み、線幅）を簡単且つ正確に取得する。【解決手段】モデル形成用基板に形成された膜の特徴量の計測結果と、前記モデル形成用基板を第１の基板処理システムの撮像装置で撮像して生成されたモデル形成用撮像画像と、に基づいて基板の画素値と当該基板に形成された膜の特徴量との相関モデルを作成する工程と、特徴量取得対象の基板を第２の基板処理システムの撮像装置で撮像画像を生成し、当該撮像画像と前記相関モデルとに基づいて、膜の推定特徴量を算出する工程と、複数枚の前記特徴量取得対象の基板について算出された前記推定特徴量の統計値を算出する工程と、前記推定特徴量が算出された膜の形成処理と同じ処理が前記第２の基板処理システムでオフセット算出用基板に対し行われ形成された膜の特徴量の測定結果と、前記推定特徴量の統計値とから、前記推定特徴量のオフセット量を算出する工程を含む検査方法。【選択図】図１