VACUUM TREATMENT APPARATUS

To provide a vacuum treatment apparatus capable of effectively performing a transportation of a series of a substrate.SOLUTION: A vacuum treatment apparatus VM1 includes a load lock chamber Lc1 in which a substrate Sw is carried in/out in a horizontal posture, a posture changing chamber Ac1 having p...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NISHIGUCHI MASAO, IWASE DAISUKE
Format: Patent
Sprache:eng ; jpn
Schlagworte:
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