VACUUM TREATMENT APPARATUS

To provide a vacuum treatment apparatus capable of effectively performing a transportation of a series of a substrate.SOLUTION: A vacuum treatment apparatus VM1 includes a load lock chamber Lc1 in which a substrate Sw is carried in/out in a horizontal posture, a posture changing chamber Ac1 having posture changing means 1 which can change a posture of the substrate between the horizontal posture and a perpendicular posture, a rotation chamber Rc having rotation means 31 which can rotate the substrate in the perpendicular posture around a Z-axis, and driving means 32 for reciprocating the rotation means in at least one direction of an X-axis direction and a Y-axis direction, a treatment chamber Pc1 to Pc4 having treatment means 43a, 43b for treating the substrate with a vacuum treatment, and a turnback chamber Bc having turnback means 5 which inverts the substrate transported from a middle chamber Pc4 in a posture facing one direction of the Y-axis to another direction of the Y-axis and carries out the substrate to the middle chamber. The vacuum treatment apparatus includes at least two first transportation routes R11, R12 extending from the posture changing chamber and the rotation chamber.SELECTED DRAWING: Figure 1 【課題】一連の基板搬送を効率よく行うことができる真空処理装置を提供する。【解決手段】真空処理装置ＶＭ１は、水平姿勢で基板Ｓｗが搬出入されるロードロックチャンバＬｃ１と、水平姿勢と垂直姿勢との間で基板の姿勢変更を可能とする姿勢変更手段１を有する姿勢変更チャンバＡｃ１と、垂直姿勢の基板のＺ軸回りの回転を可能とする回転手段３１と、回転手段をＸ軸方向及びＹ軸方向の少なくとも一方に往復動する駆動手段３２とを有する回転チャンバＲｃと、基板に真空処理を施す処理手段４３ａ，４３ｂを有する処理チャンバＰｃ１〜Ｐｃ４と、中間チャンバＰｃ４からＹ軸方向一方を向く姿勢で搬入される基板をＹ軸方向他方を向く姿勢に反転させて中間チャンバに搬出するターンバック手段５を有するターンバックチャンバＢｃとを備え、姿勢変更チャンバと回転チャンバとに跨ってのびる少なくとも２本の第１搬送路Ｒ１１，Ｒ１２が備えられている。【選択図】図１