VAPOR DEPOSITION SOURCE, VACUUM PROCESSING APPARATUS AND FILM DEPOSITION METHOD
To provide: a vapor deposition source capable of improving the directivity of a vapor deposition material ejected from an ejection nozzle; a vacuum processing apparatus; and a film deposition method.SOLUTION: The vapor deposition source includes an evaporation vessel for storing a vapor deposition m...
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| creator | UMEHARA SEIJI |
| description | To provide: a vapor deposition source capable of improving the directivity of a vapor deposition material ejected from an ejection nozzle; a vacuum processing apparatus; and a film deposition method.SOLUTION: The vapor deposition source includes an evaporation vessel for storing a vapor deposition material and an ejection nozzle provided in the evaporation vessel and ejecting the vapor deposition material. A blocking member for partially blocking the ejection port of the ejection nozzle is provided on the axis of the ejection nozzle. According to such a vapor deposition source, the directivity of the vapor deposition material is high, and the vapor deposition material further converges to be ejected from the ejection nozzle.SELECTED DRAWING: Figure 1
【課題】噴出ノズルから噴出する蒸着材料の指向性が向上する蒸着源、真空処理装置、及び成膜方法を提供する。【解決手段】上記目的を達成するため、本発明の一形態に係る蒸着源は、蒸着材料を収容する蒸発容器と、前記蒸発容器に設けられ、前記蒸着材料が噴出する噴出ノズルとを具備する。前記噴出ノズルの軸心上に、前記噴出ノズルの噴出口を部分的に閉塞する閉塞部材が設けられている。このような蒸着源によれば、蒸着材料の指向性が高くなり、蒸着材料がより集束して噴出ノズルから噴出する。【選択図】図１ |
| format | Patent |
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【課題】噴出ノズルから噴出する蒸着材料の指向性が向上する蒸着源、真空処理装置、及び成膜方法を提供する。【解決手段】上記目的を達成するため、本発明の一形態に係る蒸着源は、蒸着材料を収容する蒸発容器と、前記蒸発容器に設けられ、前記蒸着材料が噴出する噴出ノズルとを具備する。前記噴出ノズルの軸心上に、前記噴出ノズルの噴出口を部分的に閉塞する閉塞部材が設けられている。このような蒸着源によれば、蒸着材料の指向性が高くなり、蒸着材料がより集束して噴出ノズルから噴出する。【選択図】図１</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201029&DB=EPODOC&CC=JP&NR=2020176284A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201029&DB=EPODOC&CC=JP&NR=2020176284A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UMEHARA SEIJI</creatorcontrib><title>VAPOR DEPOSITION SOURCE, VACUUM PROCESSING APPARATUS AND FILM DEPOSITION METHOD</title><description>To provide: a vapor deposition source capable of improving the directivity of a vapor deposition material ejected from an ejection nozzle; a vacuum processing apparatus; and a film deposition method.SOLUTION: The vapor deposition source includes an evaporation vessel for storing a vapor deposition material and an ejection nozzle provided in the evaporation vessel and ejecting the vapor deposition material. A blocking member for partially blocking the ejection port of the ejection nozzle is provided on the axis of the ejection nozzle. According to such a vapor deposition source, the directivity of the vapor deposition material is high, and the vapor deposition material further converges to be ejected from the ejection nozzle.SELECTED DRAWING: Figure 1
【課題】噴出ノズルから噴出する蒸着材料の指向性が向上する蒸着源、真空処理装置、及び成膜方法を提供する。【解決手段】上記目的を達成するため、本発明の一形態に係る蒸着源は、蒸着材料を収容する蒸発容器と、前記蒸発容器に設けられ、前記蒸着材料が噴出する噴出ノズルとを具備する。前記噴出ノズルの軸心上に、前記噴出ノズルの噴出口を部分的に閉塞する閉塞部材が設けられている。このような蒸着源によれば、蒸着材料の指向性が高くなり、蒸着材料がより集束して噴出ノズルから噴出する。【選択図】図１</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAPcwzwD1JwcQ3wD_YM8fT3Uwj2Dw1ydtVRCHN0Dg31VQgI8nd2DQ729HNXcAwIcAxyDAkNVnD0c1Fw8_TxRdbn6xri4e_Cw8CalphTnMoLpbkZlNxcQ5w9dFML8uNTiwsSk1PzUkvivQKMDIwMDM3NjCxMHI2JUgQAzZcvhg</recordid><startdate>20201029</startdate><enddate>20201029</enddate><creator>UMEHARA SEIJI</creator><scope>EVB</scope></search><sort><creationdate>20201029</creationdate><title>VAPOR DEPOSITION SOURCE, VACUUM PROCESSING APPARATUS AND FILM DEPOSITION METHOD</title><author>UMEHARA SEIJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020176284A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>UMEHARA SEIJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UMEHARA SEIJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VAPOR DEPOSITION SOURCE, VACUUM PROCESSING APPARATUS AND FILM DEPOSITION METHOD</title><date>2020-10-29</date><risdate>2020</risdate><abstract>To provide: a vapor deposition source capable of improving the directivity of a vapor deposition material ejected from an ejection nozzle; a vacuum processing apparatus; and a film deposition method.SOLUTION: The vapor deposition source includes an evaporation vessel for storing a vapor deposition material and an ejection nozzle provided in the evaporation vessel and ejecting the vapor deposition material. A blocking member for partially blocking the ejection port of the ejection nozzle is provided on the axis of the ejection nozzle. According to such a vapor deposition source, the directivity of the vapor deposition material is high, and the vapor deposition material further converges to be ejected from the ejection nozzle.SELECTED DRAWING: Figure 1
【課題】噴出ノズルから噴出する蒸着材料の指向性が向上する蒸着源、真空処理装置、及び成膜方法を提供する。【解決手段】上記目的を達成するため、本発明の一形態に係る蒸着源は、蒸着材料を収容する蒸発容器と、前記蒸発容器に設けられ、前記蒸着材料が噴出する噴出ノズルとを具備する。前記噴出ノズルの軸心上に、前記噴出ノズルの噴出口を部分的に閉塞する閉塞部材が設けられている。このような蒸着源によれば、蒸着材料の指向性が高くなり、蒸着材料がより集束して噴出ノズルから噴出する。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | VAPOR DEPOSITION SOURCE, VACUUM PROCESSING APPARATUS AND FILM DEPOSITION METHOD |
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