METHOD FOR GENERATING REFERENCE IMAGE AND METHOD FOR INSPECTING PATTERN
To provide a method for generating a reference image and a method for inspecting a pattern which can increase the accuracy of a reference image and can reduce detection of a dummy defect.SOLUTION: The method includes the steps of: dividing a sample into different regions with different features on t...
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| creator | YASUI YOSHITAKA ISOMURA IKUNAO |
| description | To provide a method for generating a reference image and a method for inspecting a pattern which can increase the accuracy of a reference image and can reduce detection of a dummy defect.SOLUTION: The method includes the steps of: dividing a sample into different regions with different features on the basis of feature information showing features of a pattern added to design data of the sample with the pattern; calculating parameter information according to features for generating a reference image used to inspect the pattern from the design data on several regions-by-several regions basis; and generating the reference image from the design data on the basis of the calculated parameter information.SELECTED DRAWING: Figure 2
【課題】参照画像の精度を向上させて疑似欠陥の検出を抑制することができる参照画像生成方法およびパターン検査方法を提供する。【解決手段】パターンを有する試料の設計データに付加されたパターンの特徴を示す特徴情報に基づいて、試料を特徴が異なる複数の領域に区分する工程と、複数の領域毎に、設計データからパターンの検査に用いる参照画像を生成するための特徴に応じたパラメータ情報を算出する工程と、算出されたパラメータ情報に基づいて、設計データから参照画像を生成する工程と、を有する。【選択図】図２ |
| format | Patent |
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【課題】参照画像の精度を向上させて疑似欠陥の検出を抑制することができる参照画像生成方法およびパターン検査方法を提供する。【解決手段】パターンを有する試料の設計データに付加されたパターンの特徴を示す特徴情報に基づいて、試料を特徴が異なる複数の領域に区分する工程と、複数の領域毎に、設計データからパターンの検査に用いる参照画像を生成するための特徴に応じたパラメータ情報を算出する工程と、算出されたパラメータ情報に基づいて、設計データから参照画像を生成する工程と、を有する。【選択図】図２</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MATERIALS THEREFOR ; MEASURING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200917&DB=EPODOC&CC=JP&NR=2020148615A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200917&DB=EPODOC&CC=JP&NR=2020148615A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YASUI YOSHITAKA</creatorcontrib><creatorcontrib>ISOMURA IKUNAO</creatorcontrib><title>METHOD FOR GENERATING REFERENCE IMAGE AND METHOD FOR INSPECTING PATTERN</title><description>To provide a method for generating a reference image and a method for inspecting a pattern which can increase the accuracy of a reference image and can reduce detection of a dummy defect.SOLUTION: The method includes the steps of: dividing a sample into different regions with different features on the basis of feature information showing features of a pattern added to design data of the sample with the pattern; calculating parameter information according to features for generating a reference image used to inspect the pattern from the design data on several regions-by-several regions basis; and generating the reference image from the design data on the basis of the calculated parameter information.SELECTED DRAWING: Figure 2
【課題】参照画像の精度を向上させて疑似欠陥の検出を抑制することができる参照画像生成方法およびパターン検査方法を提供する。【解決手段】パターンを有する試料の設計データに付加されたパターンの特徴を示す特徴情報に基づいて、試料を特徴が異なる複数の領域に区分する工程と、複数の領域毎に、設計データからパターンの検査に用いる参照画像を生成するための特徴に応じたパラメータ情報を算出する工程と、算出されたパラメータ情報に基づいて、設計データから参照画像を生成する工程と、を有する。【選択図】図２</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD3dQ3x8HdRcPMPUnB39XMNcgzx9HNXCHJ1cw1y9XN2VfD0dXR3VXD0c1FAUunpFxzg6gxWGeAYEuIa5MfDwJqWmFOcyguluRmU3FxDnD10Uwvy41OLCxKTU_NSS-K9AowMjAwMTSzMDE0djYlSBAAR1yzH</recordid><startdate>20200917</startdate><enddate>20200917</enddate><creator>YASUI YOSHITAKA</creator><creator>ISOMURA IKUNAO</creator><scope>EVB</scope></search><sort><creationdate>20200917</creationdate><title>METHOD FOR GENERATING REFERENCE IMAGE AND METHOD FOR INSPECTING PATTERN</title><author>YASUI YOSHITAKA ; ISOMURA IKUNAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020148615A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YASUI YOSHITAKA</creatorcontrib><creatorcontrib>ISOMURA IKUNAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YASUI YOSHITAKA</au><au>ISOMURA IKUNAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR GENERATING REFERENCE IMAGE AND METHOD FOR INSPECTING PATTERN</title><date>2020-09-17</date><risdate>2020</risdate><abstract>To provide a method for generating a reference image and a method for inspecting a pattern which can increase the accuracy of a reference image and can reduce detection of a dummy defect.SOLUTION: The method includes the steps of: dividing a sample into different regions with different features on the basis of feature information showing features of a pattern added to design data of the sample with the pattern; calculating parameter information according to features for generating a reference image used to inspect the pattern from the design data on several regions-by-several regions basis; and generating the reference image from the design data on the basis of the calculated parameter information.SELECTED DRAWING: Figure 2
【課題】参照画像の精度を向上させて疑似欠陥の検出を抑制することができる参照画像生成方法およびパターン検査方法を提供する。【解決手段】パターンを有する試料の設計データに付加されたパターンの特徴を示す特徴情報に基づいて、試料を特徴が異なる複数の領域に区分する工程と、複数の領域毎に、設計データからパターンの検査に用いる参照画像を生成するための特徴に応じたパラメータ情報を算出する工程と、算出されたパラメータ情報に基づいて、設計データから参照画像を生成する工程と、を有する。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
| title | METHOD FOR GENERATING REFERENCE IMAGE AND METHOD FOR INSPECTING PATTERN |
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