MEMS MICROPHONE

To provide an MEMS microphone where noise reduction is achieved.SOLUTION: In an MEMS microphone 10, a substrate 20 is made of a glass. The glass substrate 20 has an insulation resistance higher than that of a semiconductor substrate such as a silicon substrate. The MEMS microphone 10 can reduce floa...

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Hauptverfasser: UEJIMA SATOSHI, OSANAI KATSUNORI, IIJIMA ATSUSHI
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creator UEJIMA SATOSHI
OSANAI KATSUNORI
IIJIMA ATSUSHI
description To provide an MEMS microphone where noise reduction is achieved.SOLUTION: In an MEMS microphone 10, a substrate 20 is made of a glass. The glass substrate 20 has an insulation resistance higher than that of a semiconductor substrate such as a silicon substrate. The MEMS microphone 10 can reduce floating capacitance by using the glass substrate 20, and can suppress noise ascribable to the floating capacitance. Also, with the MEMS microphone 10, it is not required to provide an insulation thin film between the glass substrate 20 and a conductor layer. Further, with the MEMS microphone 10, potential adjustment becomes unnecessary through usage of the glass substrate 20, and signal processing at an ASIC, a circuit design and the like can be simplified as compared with a case where a silicon substrate is used.SELECTED DRAWING: Figure 2 【課題】ノイズの低減が図られたMEMSマイクロフォンを提供する。【解決手段】MEMSマイクロフォン10においては、基板20がガラスで構成されている。ガラス基板20は、シリコン基板等の半導体基板に比べて高い絶縁抵抗を有する。MEMSマイクロフォン10は、ガラス基板20を用いることで浮遊容量を低減することができ、浮遊容量に起因するノイズを抑制することができる。また、MEMSマイクロフォン10によれば、ガラス基板20と導体層との間に絶縁薄膜を設ける必要がない。さらに、MEMSマイクロフォン10によれば、ガラス基板20を用いることで、上記の電位調整が不要となり、ASICでの信号処理や回路デザインなどがシリコン基板を用いた場合よりも簡素化することができる。【選択図】図2
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subjects DEAF-AID SETS
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRICITY
LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKEACOUSTIC ELECTROMECHANICAL TRANSDUCERS
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PUBLIC ADDRESS SYSTEMS
TRANSPORTING
title MEMS MICROPHONE
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