METAL CONTAMINATION PREVENTION METHOD AND METAL CONTAMINATION PREVENTION DEVICE, AND SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE USING THE SAME
To provide a meal contamination prevention method and a metal contamination prevention device capable of suppressing diffusion of chromium contained in a passive film, and a substrate treatment method and a substrate treatment device using the same.SOLUTION: There is provided a metal contamination p...
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| creator | NAKAJIMA SHIGERU TATENO YUSUKE HARADA TAKESHIGE TAKEZAWA YOSHIHIRO |
| description | To provide a meal contamination prevention method and a metal contamination prevention device capable of suppressing diffusion of chromium contained in a passive film, and a substrate treatment method and a substrate treatment device using the same.SOLUTION: There is provided a metal contamination prevention method conducted by aerating a metal chloride gas to a metal component of which a surface is coated by a passive film consisting of chromium oxide, having a process for supplying hydrochloric acid to the passive film coating the surface of the metal component, and reacting the chromium oxide and the hydrochloric acid to generate chromium (III) chloride heptahydrate, and a process for removing chromium from the passive film by vaporizing the chromium (III) chloride heptahydrate, and a process for covering the surface of the passive film with a compound containing a metal contained in the metal chloride gas.SELECTED DRAWING: Figure 2
【課題】不動態膜に含まれるクロムの拡散を抑制できる金属汚染防止方法及び金属汚染防止装置、並びにこれらを用いた基板処理方法及び基板処理装置を提供する。【解決手段】酸化クロムからなる不動態膜で表面が被覆された金属部品に金属塩化物ガスを通気させて行う金属汚染防止方法であって、前記金属部品の表面を覆う前記不動態膜に塩酸を供給し、前記酸化クロムと前記塩酸とを反応させ、塩化クロム（III）六水和物を生成させる工程と、該塩化クロム（III）六水和物を蒸発させることにより、前記不動態膜からクロムを除去する工程と、前記金属塩化物ガス内に含まれる金属を含む化合物で前記不動態膜の表面を覆う工程と、を有する。【選択図】図２ |
| format | Patent |
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【課題】不動態膜に含まれるクロムの拡散を抑制できる金属汚染防止方法及び金属汚染防止装置、並びにこれらを用いた基板処理方法及び基板処理装置を提供する。【解決手段】酸化クロムからなる不動態膜で表面が被覆された金属部品に金属塩化物ガスを通気させて行う金属汚染防止方法であって、前記金属部品の表面を覆う前記不動態膜に塩酸を供給し、前記酸化クロムと前記塩酸とを反応させ、塩化クロム（III）六水和物を生成させる工程と、該塩化クロム（III）六水和物を蒸発させることにより、前記不動態膜からクロムを除去する工程と、前記金属塩化物ガス内に含まれる金属を含む化合物で前記不動態膜の表面を覆う工程と、を有する。【選択図】図２</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200206&DB=EPODOC&CC=JP&NR=2020020025A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200206&DB=EPODOC&CC=JP&NR=2020020025A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKAJIMA SHIGERU</creatorcontrib><creatorcontrib>TATENO YUSUKE</creatorcontrib><creatorcontrib>HARADA TAKESHIGE</creatorcontrib><creatorcontrib>TAKEZAWA YOSHIHIRO</creatorcontrib><title>METAL CONTAMINATION PREVENTION METHOD AND METAL CONTAMINATION PREVENTION DEVICE, AND SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE USING THE SAME</title><description>To provide a meal contamination prevention method and a metal contamination prevention device capable of suppressing diffusion of chromium contained in a passive film, and a substrate treatment method and a substrate treatment device using the same.SOLUTION: There is provided a metal contamination prevention method conducted by aerating a metal chloride gas to a metal component of which a surface is coated by a passive film consisting of chromium oxide, having a process for supplying hydrochloric acid to the passive film coating the surface of the metal component, and reacting the chromium oxide and the hydrochloric acid to generate chromium (III) chloride heptahydrate, and a process for removing chromium from the passive film by vaporizing the chromium (III) chloride heptahydrate, and a process for covering the surface of the passive film with a compound containing a metal contained in the metal chloride gas.SELECTED DRAWING: Figure 2
【課題】不動態膜に含まれるクロムの拡散を抑制できる金属汚染防止方法及び金属汚染防止装置、並びにこれらを用いた基板処理方法及び基板処理装置を提供する。【解決手段】酸化クロムからなる不動態膜で表面が被覆された金属部品に金属塩化物ガスを通気させて行う金属汚染防止方法であって、前記金属部品の表面を覆う前記不動態膜に塩酸を供給し、前記酸化クロムと前記塩酸とを反応させ、塩化クロム（III）六水和物を生成させる工程と、該塩化クロム（III）六水和物を蒸発させることにより、前記不動態膜からクロムを除去する工程と、前記金属塩化物ガス内に含まれる金属を含む化合物で前記不動態膜の表面を覆う工程と、を有する。【選択図】図２</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJjr6xri6KPg7O8X4ujr6ecY4unvpxAQ5Brm6gdmAqU9_F0UHP1cFAiodHEN83R21QErDQ51Cg4JcgxxVQgJcnUM8QUqQTYJmzREu0JosKefu0KIh6tCsKOvKw8Da1piTnEqL5TmZlBycw1x9tBNLciPTy0uSExOzUstifcKMDIwMgAjU0djohQBAIVKRMo</recordid><startdate>20200206</startdate><enddate>20200206</enddate><creator>NAKAJIMA SHIGERU</creator><creator>TATENO YUSUKE</creator><creator>HARADA TAKESHIGE</creator><creator>TAKEZAWA YOSHIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20200206</creationdate><title>METAL CONTAMINATION PREVENTION METHOD AND METAL CONTAMINATION PREVENTION DEVICE, AND SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE USING THE SAME</title><author>NAKAJIMA SHIGERU ; TATENO YUSUKE ; HARADA TAKESHIGE ; TAKEZAWA YOSHIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020020025A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKAJIMA SHIGERU</creatorcontrib><creatorcontrib>TATENO YUSUKE</creatorcontrib><creatorcontrib>HARADA TAKESHIGE</creatorcontrib><creatorcontrib>TAKEZAWA YOSHIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKAJIMA SHIGERU</au><au>TATENO YUSUKE</au><au>HARADA TAKESHIGE</au><au>TAKEZAWA YOSHIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METAL CONTAMINATION PREVENTION METHOD AND METAL CONTAMINATION PREVENTION DEVICE, AND SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE USING THE SAME</title><date>2020-02-06</date><risdate>2020</risdate><abstract>To provide a meal contamination prevention method and a metal contamination prevention device capable of suppressing diffusion of chromium contained in a passive film, and a substrate treatment method and a substrate treatment device using the same.SOLUTION: There is provided a metal contamination prevention method conducted by aerating a metal chloride gas to a metal component of which a surface is coated by a passive film consisting of chromium oxide, having a process for supplying hydrochloric acid to the passive film coating the surface of the metal component, and reacting the chromium oxide and the hydrochloric acid to generate chromium (III) chloride heptahydrate, and a process for removing chromium from the passive film by vaporizing the chromium (III) chloride heptahydrate, and a process for covering the surface of the passive film with a compound containing a metal contained in the metal chloride gas.SELECTED DRAWING: Figure 2
【課題】不動態膜に含まれるクロムの拡散を抑制できる金属汚染防止方法及び金属汚染防止装置、並びにこれらを用いた基板処理方法及び基板処理装置を提供する。【解決手段】酸化クロムからなる不動態膜で表面が被覆された金属部品に金属塩化物ガスを通気させて行う金属汚染防止方法であって、前記金属部品の表面を覆う前記不動態膜に塩酸を供給し、前記酸化クロムと前記塩酸とを反応させ、塩化クロム（III）六水和物を生成させる工程と、該塩化クロム（III）六水和物を蒸発させることにより、前記不動態膜からクロムを除去する工程と、前記金属塩化物ガス内に含まれる金属を含む化合物で前記不動態膜の表面を覆う工程と、を有する。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | METAL CONTAMINATION PREVENTION METHOD AND METAL CONTAMINATION PREVENTION DEVICE, AND SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE USING THE SAME |
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