POLISHING SHEET

To provide a polishing sheet that is suited for mirror polishing, and capable of obtaining a mirror plane of higher quality, that is a mirror plane with high specular in-plane uniformity and less flaws, in silicon bare wafers, glass, compound semiconductor substrates and hard disk substrates or the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SHIRO KUNIYASU, TERADA KOHEI, WADA MASAHARU
Format: Patent
Sprache:eng ; jpn
Schlagworte:
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