SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

To provide a substrate processing apparatus which prevents adherence of a particle on a wafer at the time of opening/closing a pod lid.SOLUTION: A substrate processing apparatus 100 comprises: a placement part where a substrate container 110 housing a substrate is placed; a guide part 121 which composes a lid opening/closing space where a lid 120 of the substrate container is opened/closed; a gate part for separating the lid opening/closing space from a transfer chamber for transferring the substrate between the substrate container and a substrate holding tool 217 for holding the substrate; a lid opening/closing mechanism provided in the lid opening/closing space, for opening and closing the lid of the substrate container; a gas introduction mechanism for introducing the gas to the substrate container placed on the placement part; a monitoring part for causing the gas introduction mechanism to introduce the gas to the substrate container to replace a gas in the substrate container and control pressure in the substrate container; and a control part for causing the monitoring part to open the lid of the substrate container while maintaining pressure in the substrate container at a higher level than pressure in the lid opening/closing space.SELECTED DRAWING: Figure 1 【課題】ポッド蓋開閉時に、パーティクルがウエハ上に付着するのを防止する基板処理装置を提供する。【解決手段】基板処理装置１００は、基板が収納される基板収容器１１０を載置する載置部と、基板収容器の蓋１２０が開閉される蓋開閉空間を構成するガイド部１２１と、蓋開閉空間を基板収容器と基板が保持される基板保持具２１７との間で基板を搬送する移載室から分離するゲート部と、蓋開閉空間に設けられ、基板収容器の蓋を開閉する蓋開閉機構と、載置部に載置された基板収容器にガスを導入するガス導入機構と、該ガス導入機構にガスを基板収容器に導入させ、基板収容器内のガスを置換するとともに圧力を調整する監視部と、該監視部に蓋開閉空間の圧力よりも基板収容器内の圧力を高く維持させつつ、蓋開閉機構に基板収容器の蓋を開かせるように構成されている制御部と、を備える。【選択図】図１