METHOD OF FORMING PATTERN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE
To provide a method of forming a pattern which is advantageous, for example, both for small foot printing and high throughput.SOLUTION: A lithography apparatus detects a plurality of first substrate side marks arranged in a part of shot region scheduled for forming a pattern using a first original p...
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| creator | HASHIMOTO TAKAYUKI SUZUKI TORU IWAKOSHI MORITAKA KURITA YUSUKE KAWADA DAIZO OKAZUMI HIRONORI KARAKI SHUNSUKE YOSHIOKA YASUTOMO |
| description | To provide a method of forming a pattern which is advantageous, for example, both for small foot printing and high throughput.SOLUTION: A lithography apparatus detects a plurality of first substrate side marks arranged in a part of shot region scheduled for forming a pattern using a first original plate with the lithography apparatus of a plurality of shot regions of the substrate, and also detects a plurality of second substrate side marks arranged in a shot region other than the part of the shot region scheduled for forming a pattern using a second original plate other than the first original plate with another lithography apparatus of a plurality of the shot regions. The lithography apparatus outputs information of a detection result of a plurality of the second substrate side marks so as to be used by the other lithography apparatus. Then, the lithography apparatus forms a pattern while positioning the first original plate about the part of the shot region on the basis of the detection result of a plurality of the first substrate side marks.SELECTED DRAWING: Figure 1
【課題】例えば、小フットプリント化と高スループット化の両立に有利なパターン形成方法を提供すること。【解決手段】リソグラフィ装置は、基板の複数のショット領域のうち、このリソグラフィ装置で第１原版を用いてパターン形成を行うことが予定されている一部のショット領域に関して配置されている複数の第１基板側マークを検出するとともに、当該複数のショット領域のうち、他のリソグラフィ装置で第１原版とは異なる第２原版を用いてパターン形成を行うことが予定されている上記一部のショット領域とは異なる他のショット領域に関して配置されている複数の第２基板側マークを検出する。リソグラフィ装置は、複数の第２基板側マークの検出結果の情報を、他のリソグラフィ装置で利用可能になるように出力する。そしてリソグラフィ装置は、複数の第１基板側マークの検出結果に基づいて、上記一部のショット領域について第１原版との位置合わせを行いながらパターン形成を行う。【選択図】 図１ |
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【課題】例えば、小フットプリント化と高スループット化の両立に有利なパターン形成方法を提供すること。【解決手段】リソグラフィ装置は、基板の複数のショット領域のうち、このリソグラフィ装置で第１原版を用いてパターン形成を行うことが予定されている一部のショット領域に関して配置されている複数の第１基板側マークを検出するとともに、当該複数のショット領域のうち、他のリソグラフィ装置で第１原版とは異なる第２原版を用いてパターン形成を行うことが予定されている上記一部のショット領域とは異なる他のショット領域に関して配置されている複数の第２基板側マークを検出する。リソグラフィ装置は、複数の第２基板側マークの検出結果の情報を、他のリソグラフィ装置で利用可能になるように出力する。そしてリソグラフィ装置は、複数の第１基板側マークの検出結果に基づいて、上記一部のショット領域について第１原版との位置合わせを行いながらパターン形成を行う。【選択図】 図１</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190322&DB=EPODOC&CC=JP&NR=2019045726A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190322&DB=EPODOC&CC=JP&NR=2019045726A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HASHIMOTO TAKAYUKI</creatorcontrib><creatorcontrib>SUZUKI TORU</creatorcontrib><creatorcontrib>IWAKOSHI MORITAKA</creatorcontrib><creatorcontrib>KURITA YUSUKE</creatorcontrib><creatorcontrib>KAWADA DAIZO</creatorcontrib><creatorcontrib>OKAZUMI HIRONORI</creatorcontrib><creatorcontrib>KARAKI SHUNSUKE</creatorcontrib><creatorcontrib>YOSHIOKA YASUTOMO</creatorcontrib><title>METHOD OF FORMING PATTERN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE</title><description>To provide a method of forming a pattern which is advantageous, for example, both for small foot printing and high throughput.SOLUTION: A lithography apparatus detects a plurality of first substrate side marks arranged in a part of shot region scheduled for forming a pattern using a first original plate with the lithography apparatus of a plurality of shot regions of the substrate, and also detects a plurality of second substrate side marks arranged in a shot region other than the part of the shot region scheduled for forming a pattern using a second original plate other than the first original plate with another lithography apparatus of a plurality of the shot regions. The lithography apparatus outputs information of a detection result of a plurality of the second substrate side marks so as to be used by the other lithography apparatus. Then, the lithography apparatus forms a pattern while positioning the first original plate about the part of the shot region on the basis of the detection result of a plurality of the first substrate side marks.SELECTED DRAWING: Figure 1
【課題】例えば、小フットプリント化と高スループット化の両立に有利なパターン形成方法を提供すること。【解決手段】リソグラフィ装置は、基板の複数のショット領域のうち、このリソグラフィ装置で第１原版を用いてパターン形成を行うことが予定されている一部のショット領域に関して配置されている複数の第１基板側マークを検出するとともに、当該複数のショット領域のうち、他のリソグラフィ装置で第１原版とは異なる第２原版を用いてパターン形成を行うことが予定されている上記一部のショット領域とは異なる他のショット領域に関して配置されている複数の第２基板側マークを検出する。リソグラフィ装置は、複数の第２基板側マークの検出結果の情報を、他のリソグラフィ装置で利用可能になるように出力する。そしてリソグラフィ装置は、複数の第１基板側マークの検出結果に基づいて、上記一部のショット領域について第１原版との位置合わせを行いながらパターン形成を行う。【選択図】 図１</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAj0dQ3x8HdR8HdTcPMP8vX0c1cIcAwJcQ3y01Hw8QRKuQc5BnhEKjgGBDgGOYaEBusoIHT4OvqFujk6h4QGgfQ5BoV4Ovu48jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDSwMTU3MjM0djohQBAAYpL9w</recordid><startdate>20190322</startdate><enddate>20190322</enddate><creator>HASHIMOTO TAKAYUKI</creator><creator>SUZUKI TORU</creator><creator>IWAKOSHI MORITAKA</creator><creator>KURITA YUSUKE</creator><creator>KAWADA DAIZO</creator><creator>OKAZUMI HIRONORI</creator><creator>KARAKI SHUNSUKE</creator><creator>YOSHIOKA YASUTOMO</creator><scope>EVB</scope></search><sort><creationdate>20190322</creationdate><title>METHOD OF FORMING PATTERN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE</title><author>HASHIMOTO TAKAYUKI ; SUZUKI TORU ; IWAKOSHI MORITAKA ; KURITA YUSUKE ; KAWADA DAIZO ; OKAZUMI HIRONORI ; KARAKI SHUNSUKE ; YOSHIOKA YASUTOMO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2019045726A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HASHIMOTO TAKAYUKI</creatorcontrib><creatorcontrib>SUZUKI TORU</creatorcontrib><creatorcontrib>IWAKOSHI MORITAKA</creatorcontrib><creatorcontrib>KURITA YUSUKE</creatorcontrib><creatorcontrib>KAWADA DAIZO</creatorcontrib><creatorcontrib>OKAZUMI HIRONORI</creatorcontrib><creatorcontrib>KARAKI SHUNSUKE</creatorcontrib><creatorcontrib>YOSHIOKA YASUTOMO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HASHIMOTO TAKAYUKI</au><au>SUZUKI TORU</au><au>IWAKOSHI MORITAKA</au><au>KURITA YUSUKE</au><au>KAWADA DAIZO</au><au>OKAZUMI HIRONORI</au><au>KARAKI SHUNSUKE</au><au>YOSHIOKA YASUTOMO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING PATTERN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE</title><date>2019-03-22</date><risdate>2019</risdate><abstract>To provide a method of forming a pattern which is advantageous, for example, both for small foot printing and high throughput.SOLUTION: A lithography apparatus detects a plurality of first substrate side marks arranged in a part of shot region scheduled for forming a pattern using a first original plate with the lithography apparatus of a plurality of shot regions of the substrate, and also detects a plurality of second substrate side marks arranged in a shot region other than the part of the shot region scheduled for forming a pattern using a second original plate other than the first original plate with another lithography apparatus of a plurality of the shot regions. The lithography apparatus outputs information of a detection result of a plurality of the second substrate side marks so as to be used by the other lithography apparatus. Then, the lithography apparatus forms a pattern while positioning the first original plate about the part of the shot region on the basis of the detection result of a plurality of the first substrate side marks.SELECTED DRAWING: Figure 1
【課題】例えば、小フットプリント化と高スループット化の両立に有利なパターン形成方法を提供すること。【解決手段】リソグラフィ装置は、基板の複数のショット領域のうち、このリソグラフィ装置で第１原版を用いてパターン形成を行うことが予定されている一部のショット領域に関して配置されている複数の第１基板側マークを検出するとともに、当該複数のショット領域のうち、他のリソグラフィ装置で第１原版とは異なる第２原版を用いてパターン形成を行うことが予定されている上記一部のショット領域とは異なる他のショット領域に関して配置されている複数の第２基板側マークを検出する。リソグラフィ装置は、複数の第２基板側マークの検出結果の情報を、他のリソグラフィ装置で利用可能になるように出力する。そしてリソグラフィ装置は、複数の第１基板側マークの検出結果に基づいて、上記一部のショット領域について第１原版との位置合わせを行いながらパターン形成を行う。【選択図】 図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | METHOD OF FORMING PATTERN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE |
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