MEASUREMENT METHOD, PROGRAM, MEASUREMENT DEVICE, SYSTEM, AND ARTICLE MANUFACTURING METHOD

To provide a measurement device advantageous in terms of measurement accuracy.SOLUTION: A measurement method for measuring a position and a posture of an object W with the use of an image obtained by imaging the object includes: a first arithmetic process for processing a first processing object wit...

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1. Verfasser: KITAMURA TSUTOMU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a measurement device advantageous in terms of measurement accuracy.SOLUTION: A measurement method for measuring a position and a posture of an object W with the use of an image obtained by imaging the object includes: a first arithmetic process for processing a first processing object with the use of an image; a second arithmetic process for processing second processing objects in an image associated with the first processing object with the use of a processing result in the first arithmetic process; and a determination process for determining a position and a posture with the use of processing results in the second arithmetic process. Multiple second processing objects are associated with the first processing object. In the determination process, determination is performed based on processing results obtained with respect to each one of the multiple second processing objects.SELECTED DRAWING: Figure 6 【課題】計測精度の点で有利な計測装置を提供する。【解決手段】物体Wを撮像して得た画像を用いて物体の位置および姿勢を計測する計測方法であって、画像を用いて第1処理対象を処理する第1演算工程と、第1演算工程における処理の結果を用いて第1処理対象に紐づく画像中の第2処理対象を処理する第2演算工程と、第2演算工程における処理の結果を用いて位置および姿勢を決定する決定工程と、を含み、第1処理対象には、複数の第2処理対象が紐づき、決定工程では、複数の第2処理対象のそれぞれについて得られた処理の結果に基づいて決定を行う。【選択図】図6