ANTIREFLECTION FILM
To provide an antireflection film capable of simultaneously realizing high scratch resistance and antifouling properties while having low reflectivity and high light transmittance, and further capable of enhancing screen sharpness of a display device.SOLUTION: The present invention relates to an ant...
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| creator | CHANG YEONG RAE KOO JA PIL BYUN JIN SEOK KIM BOO KYUNG JANG SEOK HOON |
| description | To provide an antireflection film capable of simultaneously realizing high scratch resistance and antifouling properties while having low reflectivity and high light transmittance, and further capable of enhancing screen sharpness of a display device.SOLUTION: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm and exhibits one extremum at a thickness of 85 nm to 105 nm in a graph of the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu-Kα rays.SELECTED DRAWING: Figure 1
【課題】低い反射率および高い透光率を有しかつ、高い耐スクラッチ性および防汚性を同時に実現することができ、ディスプレイ装置の画面の鮮明度を高めることができる反射防止フィルムを提供すること。【解決手段】本発明は、Ｃｕ−Ｋα線によるＸ線反射率の測定結果に対するフーリエ変換解析（Ｆｏｕｒｉｅｒ ｔｒａｎｓｆｏｒｍ ａｎａｌｙｓｉｓ）結果グラフにおいて、３５ｎｍ〜５５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示し、８５ｎｍ〜１０５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示す反射防止フィルムに関する。【選択図】図１ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2019015954A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2019015954A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2019015954A3</originalsourceid><addsrcrecordid>eNrjZBB29AvxDHJ183F1DvH091Nw8_Tx5WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGlgaGppamJo7GRCkCAJtJHtU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ANTIREFLECTION FILM</title><source>esp@cenet</source><creator>CHANG YEONG RAE ; KOO JA PIL ; BYUN JIN SEOK ; KIM BOO KYUNG ; JANG SEOK HOON</creator><creatorcontrib>CHANG YEONG RAE ; KOO JA PIL ; BYUN JIN SEOK ; KIM BOO KYUNG ; JANG SEOK HOON</creatorcontrib><description>To provide an antireflection film capable of simultaneously realizing high scratch resistance and antifouling properties while having low reflectivity and high light transmittance, and further capable of enhancing screen sharpness of a display device.SOLUTION: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm and exhibits one extremum at a thickness of 85 nm to 105 nm in a graph of the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu-Kα rays.SELECTED DRAWING: Figure 1
【課題】低い反射率および高い透光率を有しかつ、高い耐スクラッチ性および防汚性を同時に実現することができ、ディスプレイ装置の画面の鮮明度を高めることができる反射防止フィルムを提供すること。【解決手段】本発明は、Ｃｕ−Ｋα線によるＸ線反射率の測定結果に対するフーリエ変換解析（Ｆｏｕｒｉｅｒ ｔｒａｎｓｆｏｒｍ ａｎａｌｙｓｉｓ）結果グラフにおいて、３５ｎｍ〜５５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示し、８５ｎｍ〜１０５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示す反射防止フィルムに関する。【選択図】図１</description><language>eng ; jpn</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190131&DB=EPODOC&CC=JP&NR=2019015954A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190131&DB=EPODOC&CC=JP&NR=2019015954A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANG YEONG RAE</creatorcontrib><creatorcontrib>KOO JA PIL</creatorcontrib><creatorcontrib>BYUN JIN SEOK</creatorcontrib><creatorcontrib>KIM BOO KYUNG</creatorcontrib><creatorcontrib>JANG SEOK HOON</creatorcontrib><title>ANTIREFLECTION FILM</title><description>To provide an antireflection film capable of simultaneously realizing high scratch resistance and antifouling properties while having low reflectivity and high light transmittance, and further capable of enhancing screen sharpness of a display device.SOLUTION: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm and exhibits one extremum at a thickness of 85 nm to 105 nm in a graph of the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu-Kα rays.SELECTED DRAWING: Figure 1
【課題】低い反射率および高い透光率を有しかつ、高い耐スクラッチ性および防汚性を同時に実現することができ、ディスプレイ装置の画面の鮮明度を高めることができる反射防止フィルムを提供すること。【解決手段】本発明は、Ｃｕ−Ｋα線によるＸ線反射率の測定結果に対するフーリエ変換解析（Ｆｏｕｒｉｅｒ ｔｒａｎｓｆｏｒｍ ａｎａｌｙｓｉｓ）結果グラフにおいて、３５ｎｍ〜５５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示し、８５ｎｍ〜１０５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示す反射防止フィルムに関する。【選択図】図１</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB29AvxDHJ183F1DvH091Nw8_Tx5WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGlgaGppamJo7GRCkCAJtJHtU</recordid><startdate>20190131</startdate><enddate>20190131</enddate><creator>CHANG YEONG RAE</creator><creator>KOO JA PIL</creator><creator>BYUN JIN SEOK</creator><creator>KIM BOO KYUNG</creator><creator>JANG SEOK HOON</creator><scope>EVB</scope></search><sort><creationdate>20190131</creationdate><title>ANTIREFLECTION FILM</title><author>CHANG YEONG RAE ; KOO JA PIL ; BYUN JIN SEOK ; KIM BOO KYUNG ; JANG SEOK HOON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2019015954A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2019</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANG YEONG RAE</creatorcontrib><creatorcontrib>KOO JA PIL</creatorcontrib><creatorcontrib>BYUN JIN SEOK</creatorcontrib><creatorcontrib>KIM BOO KYUNG</creatorcontrib><creatorcontrib>JANG SEOK HOON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANG YEONG RAE</au><au>KOO JA PIL</au><au>BYUN JIN SEOK</au><au>KIM BOO KYUNG</au><au>JANG SEOK HOON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANTIREFLECTION FILM</title><date>2019-01-31</date><risdate>2019</risdate><abstract>To provide an antireflection film capable of simultaneously realizing high scratch resistance and antifouling properties while having low reflectivity and high light transmittance, and further capable of enhancing screen sharpness of a display device.SOLUTION: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm and exhibits one extremum at a thickness of 85 nm to 105 nm in a graph of the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu-Kα rays.SELECTED DRAWING: Figure 1
【課題】低い反射率および高い透光率を有しかつ、高い耐スクラッチ性および防汚性を同時に実現することができ、ディスプレイ装置の画面の鮮明度を高めることができる反射防止フィルムを提供すること。【解決手段】本発明は、Ｃｕ−Ｋα線によるＸ線反射率の測定結果に対するフーリエ変換解析（Ｆｏｕｒｉｅｒ ｔｒａｎｓｆｏｒｍ ａｎａｌｙｓｉｓ）結果グラフにおいて、３５ｎｍ〜５５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示し、８５ｎｍ〜１０５ｎｍの厚さ（ｔｈｉｃｋｎｅｓｓ）で１つの極値を示す反射防止フィルムに関する。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | ANTIREFLECTION FILM |
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