CLEANING DEVICE, CLEANING METHOD, AND MANUFACTURING METHOD OF MEMBER
PROBLEM TO BE SOLVED: To provide a cleaning device, a cleaning method, and a manufacturing method of a member which can remove and recover a surface treatment chemical adhering to a surface of the member with a simple structure in cleaning the member to remove the chemical adhering during surface tr...
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| creator | YANAGAWA KEITA |
| description | PROBLEM TO BE SOLVED: To provide a cleaning device, a cleaning method, and a manufacturing method of a member which can remove and recover a surface treatment chemical adhering to a surface of the member with a simple structure in cleaning the member to remove the chemical adhering during surface treatment.SOLUTION: A cleaning device 101 includes a chemical removing and recovering part A which removes and recovers a chemical by using a displacement liquid which is hydrophobic and has a larger specific gravity than the chemical, and a displacement liquid removing and recovering part B which removes and recovers the displacement liquid used in the chemical removal and recovery. The chemical removing and recovering part includes a chemical recovery tank 4 for storing the displacement liquid, a displacement liquid jetting nozzle 7 which can supply the displacement liquid to a member, and a recovery drain 11 which recovers the chemical floating in the displacement liquid stored in the chemical recovery tank to an external. The displacement liquid removing and recovering part includes a displacement liquid recovery tank 14 which stores either water or a liquid for removing a displacement liquid which is compatible with the displacement liquid, and a recovery drain 20 which recovers the displacement liquid removed from the member and discharged into the displacement liquid recovery tank to the external.SELECTED DRAWING: Figure 1
【課題】表面処理において付着した薬液を除去する部材の洗浄において、簡易な構成で、部材の表面に付着した表面処理薬液を除去回収することが可能な洗浄装置、洗浄方法、及び部材の製造方法を提供する。【解決手段】洗浄装置１０１は、疎水性であり薬液より比重の大きい置換液を用いて薬液の除去回収を行う薬液除去回収部Ａと、薬液除去回収に用いた置換液の除去回収を行う置換液除去回収部Ｂと、を備える。薬液除去回収部は、置換液が貯留される薬液回収槽４と、部材に置換液を供給可能な置換液噴射ノズル７と、薬液回収槽に貯留される置換液内で浮上した薬液を外部へ回収する回収ドレン１１と、を有する。置換液除去回収部は、水、または、置換液と相溶する置換液除去用液体、のいずれかを貯留する置換液回収槽１４と、部材から除去され、置換液回収槽内に排出された置換液を外部へ回収する回収ドレン２０と、を有する。【選択図】図１ |
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【課題】表面処理において付着した薬液を除去する部材の洗浄において、簡易な構成で、部材の表面に付着した表面処理薬液を除去回収することが可能な洗浄装置、洗浄方法、及び部材の製造方法を提供する。【解決手段】洗浄装置１０１は、疎水性であり薬液より比重の大きい置換液を用いて薬液の除去回収を行う薬液除去回収部Ａと、薬液除去回収に用いた置換液の除去回収を行う置換液除去回収部Ｂと、を備える。薬液除去回収部は、置換液が貯留される薬液回収槽４と、部材に置換液を供給可能な置換液噴射ノズル７と、薬液回収槽に貯留される置換液内で浮上した薬液を外部へ回収する回収ドレン１１と、を有する。置換液除去回収部は、水、または、置換液と相溶する置換液除去用液体、のいずれかを貯留する置換液回収槽１４と、部材から除去され、置換液回収槽内に排出された置換液を外部へ回収する回収ドレン２０と、を有する。【選択図】図１</description><language>eng ; jpn</language><subject>APPARATUS THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; TRANSPORTING</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181115&DB=EPODOC&CC=JP&NR=2018176011A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181115&DB=EPODOC&CC=JP&NR=2018176011A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANAGAWA KEITA</creatorcontrib><title>CLEANING DEVICE, CLEANING METHOD, AND MANUFACTURING METHOD OF MEMBER</title><description>PROBLEM TO BE SOLVED: To provide a cleaning device, a cleaning method, and a manufacturing method of a member which can remove and recover a surface treatment chemical adhering to a surface of the member with a simple structure in cleaning the member to remove the chemical adhering during surface treatment.SOLUTION: A cleaning device 101 includes a chemical removing and recovering part A which removes and recovers a chemical by using a displacement liquid which is hydrophobic and has a larger specific gravity than the chemical, and a displacement liquid removing and recovering part B which removes and recovers the displacement liquid used in the chemical removal and recovery. The chemical removing and recovering part includes a chemical recovery tank 4 for storing the displacement liquid, a displacement liquid jetting nozzle 7 which can supply the displacement liquid to a member, and a recovery drain 11 which recovers the chemical floating in the displacement liquid stored in the chemical recovery tank to an external. The displacement liquid removing and recovering part includes a displacement liquid recovery tank 14 which stores either water or a liquid for removing a displacement liquid which is compatible with the displacement liquid, and a recovery drain 20 which recovers the displacement liquid removed from the member and discharged into the displacement liquid recovery tank to the external.SELECTED DRAWING: Figure 1
【課題】表面処理において付着した薬液を除去する部材の洗浄において、簡易な構成で、部材の表面に付着した表面処理薬液を除去回収することが可能な洗浄装置、洗浄方法、及び部材の製造方法を提供する。【解決手段】洗浄装置１０１は、疎水性であり薬液より比重の大きい置換液を用いて薬液の除去回収を行う薬液除去回収部Ａと、薬液除去回収に用いた置換液の除去回収を行う置換液除去回収部Ｂと、を備える。薬液除去回収部は、置換液が貯留される薬液回収槽４と、部材に置換液を供給可能な置換液噴射ノズル７と、薬液回収槽に貯留される置換液内で浮上した薬液を外部へ回収する回収ドレン１１と、を有する。置換液除去回収部は、水、または、置換液と相溶する置換液除去用液体、のいずれかを貯留する置換液回収槽１４と、部材から除去され、置換液回収槽内に排出された置換液を外部へ回収する回収ドレン２０と、を有する。【選択図】図１</description><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBx9nF19PP0c1dwcQ3zdHbVUYAL-LqGePi76Cg4-rko-Dr6hbo5OoeEBiFkFPzdgCxfJ9cgHgbWtMSc4lReKM3NoOTmGuLsoZtakB-fWlyQmJyal1oS7xVgZGBoYWhuZmBo6GhMlCIAYgErlQ</recordid><startdate>20181115</startdate><enddate>20181115</enddate><creator>YANAGAWA KEITA</creator><scope>EVB</scope></search><sort><creationdate>20181115</creationdate><title>CLEANING DEVICE, CLEANING METHOD, AND MANUFACTURING METHOD OF MEMBER</title><author>YANAGAWA KEITA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2018176011A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YANAGAWA KEITA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANAGAWA KEITA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CLEANING DEVICE, CLEANING METHOD, AND MANUFACTURING METHOD OF MEMBER</title><date>2018-11-15</date><risdate>2018</risdate><abstract>PROBLEM TO BE SOLVED: To provide a cleaning device, a cleaning method, and a manufacturing method of a member which can remove and recover a surface treatment chemical adhering to a surface of the member with a simple structure in cleaning the member to remove the chemical adhering during surface treatment.SOLUTION: A cleaning device 101 includes a chemical removing and recovering part A which removes and recovers a chemical by using a displacement liquid which is hydrophobic and has a larger specific gravity than the chemical, and a displacement liquid removing and recovering part B which removes and recovers the displacement liquid used in the chemical removal and recovery. The chemical removing and recovering part includes a chemical recovery tank 4 for storing the displacement liquid, a displacement liquid jetting nozzle 7 which can supply the displacement liquid to a member, and a recovery drain 11 which recovers the chemical floating in the displacement liquid stored in the chemical recovery tank to an external. The displacement liquid removing and recovering part includes a displacement liquid recovery tank 14 which stores either water or a liquid for removing a displacement liquid which is compatible with the displacement liquid, and a recovery drain 20 which recovers the displacement liquid removed from the member and discharged into the displacement liquid recovery tank to the external.SELECTED DRAWING: Figure 1
【課題】表面処理において付着した薬液を除去する部材の洗浄において、簡易な構成で、部材の表面に付着した表面処理薬液を除去回収することが可能な洗浄装置、洗浄方法、及び部材の製造方法を提供する。【解決手段】洗浄装置１０１は、疎水性であり薬液より比重の大きい置換液を用いて薬液の除去回収を行う薬液除去回収部Ａと、薬液除去回収に用いた置換液の除去回収を行う置換液除去回収部Ｂと、を備える。薬液除去回収部は、置換液が貯留される薬液回収槽４と、部材に置換液を供給可能な置換液噴射ノズル７と、薬液回収槽に貯留される置換液内で浮上した薬液を外部へ回収する回収ドレン１１と、を有する。置換液除去回収部は、水、または、置換液と相溶する置換液除去用液体、のいずれかを貯留する置換液回収槽１４と、部材から除去され、置換液回収槽内に排出された置換液を外部へ回収する回収ドレン２０と、を有する。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TRANSPORTING |
| title | CLEANING DEVICE, CLEANING METHOD, AND MANUFACTURING METHOD OF MEMBER |
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