SUBSTRATE LIQUID-PROCESSING DEVICE AND SUBSTRATE LIQUID-PROCESSING METHOD

PROBLEM TO BE SOLVED: To supply a substrate with a process liquid of a correct concentration.SOLUTION: A substrate liquid-processing device comprises: a tank 102; a circulation line 104; a processing part 16 connected to the circulation line through a branch line 112, and arranged to use a process liquid flowing through the circulation line to perform a liquid treatment on a substrate; a process liquid-producing mechanism (206A, 206B, 208) for mixing raw material liquids supplied from supply sources of at least two kinds of raw material liquids in controlled mixing proportions to produce the process liquid; a concentration measuring device 212 (or 212') for measuring a concentration of the process liquid flowing through the circulation line and a concentration of the process liquid flowing through a process liquid supply line; and a controller 4 for controlling the process liquid-producing mechanism based on the measured concentrations of the process liquid.SELECTED DRAWING: Figure 2 【課題】精確な濃度の処理液を基板に供給する。【解決手段】基板液処理装置は、タンク１０２と、循環ライン１０４と、分岐ライン１１２を介して循環ラインに接続され、循環ラインを流れる処理液を用いて基板に液処理を施す処理部１６と、少なくとも２種類の原料液のそれぞれの供給源から供給される原料液を制御された混合比で混合して処理液を生成する処理液生成機構（２０６Ａ，２０６Ｂ，２０８）と、循環ラインを流れる処理液の濃度及び処理液供給ラインを流れる処理液の濃度を測定する濃度測定装置２１２（または２１２'）と、測定された処理液の濃度に基づいて処理液生成機構を制御する制御装置４と、を備える。【選択図】図２