PLASMA DEVICE
PROBLEM TO BE SOLVED: To restrain warpage of a workpiece.SOLUTION: A plasma device comprises: a workpiece; a first masking member arranged at one face side of the workpiece, and covering a non-treatment object portion; a second masking member arranged at the other face side of the workpiece; a first...
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| creator | SATO TAKAYASU BABA TETSUJI KOIZUMI MASAFUMI |
| description | PROBLEM TO BE SOLVED: To restrain warpage of a workpiece.SOLUTION: A plasma device comprises: a workpiece; a first masking member arranged at one face side of the workpiece, and covering a non-treatment object portion; a second masking member arranged at the other face side of the workpiece; a first die that can move forward and backward, and can press the first masking member to the second masking member; and a second die. The first or second masking member has a hole part whose depth direction is directed to a diagonal direction and an outside direction of the workpiece on a face on which the workpiece is located, at a portion corresponding to an opening of the workpiece. The hole part is provided with a movable member that can move in the depth direction. An outer end of the opening of the workpiece is arranged in an inner direction of the workpiece than an outer end of a surface opening of the hole part. When the first masking member is pressed to the second masking member, the movable member presses the outer end of the opening of the workpiece.SELECTED DRAWING: Figure 8
【課題】ワークの反りを抑制する。【解決手段】プラズマ装置は、ワークと、ワークの一方の面側に配置され、非処理対象部分を覆う第１マスキング部材と、ワークの他方の面側に配置される第２マスキング部材と、往復動可能であるとともに、第１マスキング部材を第２マスキング部材に向けて押圧可能な第１の型と、第２の型と、を備える。第１または第２マスキング部材は、ワークの開口に対応する箇所に、ワークが載置される面に斜め方向、かつワークの外側方向に深さ方向が向けられた孔部を有している。孔部には、深さ方向に移動可能な可動部材が備えられる。ワークの開口の外端が、孔部の表面開口の外端よりも、ワークの内側方向に位置する。第１マスキング部材が第２マスキング部材に向けて押圧されている状態のときに、可動部材は、ワークの開口の外端を押圧している。【選択図】図８ |
| format | Patent |
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【課題】ワークの反りを抑制する。【解決手段】プラズマ装置は、ワークと、ワークの一方の面側に配置され、非処理対象部分を覆う第１マスキング部材と、ワークの他方の面側に配置される第２マスキング部材と、往復動可能であるとともに、第１マスキング部材を第２マスキング部材に向けて押圧可能な第１の型と、第２の型と、を備える。第１または第２マスキング部材は、ワークの開口に対応する箇所に、ワークが載置される面に斜め方向、かつワークの外側方向に深さ方向が向けられた孔部を有している。孔部には、深さ方向に移動可能な可動部材が備えられる。ワークの開口の外端が、孔部の表面開口の外端よりも、ワークの内側方向に位置する。第１マスキング部材が第２マスキング部材に向けて押圧されている状態のときに、可動部材は、ワークの開口の外端を押圧している。【選択図】図８</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180913&DB=EPODOC&CC=JP&NR=2018141200A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180913&DB=EPODOC&CC=JP&NR=2018141200A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SATO TAKAYASU</creatorcontrib><creatorcontrib>BABA TETSUJI</creatorcontrib><creatorcontrib>KOIZUMI MASAFUMI</creatorcontrib><title>PLASMA DEVICE</title><description>PROBLEM TO BE SOLVED: To restrain warpage of a workpiece.SOLUTION: A plasma device comprises: a workpiece; a first masking member arranged at one face side of the workpiece, and covering a non-treatment object portion; a second masking member arranged at the other face side of the workpiece; a first die that can move forward and backward, and can press the first masking member to the second masking member; and a second die. The first or second masking member has a hole part whose depth direction is directed to a diagonal direction and an outside direction of the workpiece on a face on which the workpiece is located, at a portion corresponding to an opening of the workpiece. The hole part is provided with a movable member that can move in the depth direction. An outer end of the opening of the workpiece is arranged in an inner direction of the workpiece than an outer end of a surface opening of the hole part. When the first masking member is pressed to the second masking member, the movable member presses the outer end of the opening of the workpiece.SELECTED DRAWING: Figure 8
【課題】ワークの反りを抑制する。【解決手段】プラズマ装置は、ワークと、ワークの一方の面側に配置され、非処理対象部分を覆う第１マスキング部材と、ワークの他方の面側に配置される第２マスキング部材と、往復動可能であるとともに、第１マスキング部材を第２マスキング部材に向けて押圧可能な第１の型と、第２の型と、を備える。第１または第２マスキング部材は、ワークの開口に対応する箇所に、ワークが載置される面に斜め方向、かつワークの外側方向に深さ方向が向けられた孔部を有している。孔部には、深さ方向に移動可能な可動部材が備えられる。ワークの開口の外端が、孔部の表面開口の外端よりも、ワークの内側方向に位置する。第１マスキング部材が第２マスキング部材に向けて押圧されている状態のときに、可動部材は、ワークの開口の外端を押圧している。【選択図】図８</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAN8HEM9nVUcHEN83R25WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGFoYmhkYGBo7GRCkCANRpHNw</recordid><startdate>20180913</startdate><enddate>20180913</enddate><creator>SATO TAKAYASU</creator><creator>BABA TETSUJI</creator><creator>KOIZUMI MASAFUMI</creator><scope>EVB</scope></search><sort><creationdate>20180913</creationdate><title>PLASMA DEVICE</title><author>SATO TAKAYASU ; BABA TETSUJI ; KOIZUMI MASAFUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2018141200A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SATO TAKAYASU</creatorcontrib><creatorcontrib>BABA TETSUJI</creatorcontrib><creatorcontrib>KOIZUMI MASAFUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SATO TAKAYASU</au><au>BABA TETSUJI</au><au>KOIZUMI MASAFUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA DEVICE</title><date>2018-09-13</date><risdate>2018</risdate><abstract>PROBLEM TO BE SOLVED: To restrain warpage of a workpiece.SOLUTION: A plasma device comprises: a workpiece; a first masking member arranged at one face side of the workpiece, and covering a non-treatment object portion; a second masking member arranged at the other face side of the workpiece; a first die that can move forward and backward, and can press the first masking member to the second masking member; and a second die. The first or second masking member has a hole part whose depth direction is directed to a diagonal direction and an outside direction of the workpiece on a face on which the workpiece is located, at a portion corresponding to an opening of the workpiece. The hole part is provided with a movable member that can move in the depth direction. An outer end of the opening of the workpiece is arranged in an inner direction of the workpiece than an outer end of a surface opening of the hole part. When the first masking member is pressed to the second masking member, the movable member presses the outer end of the opening of the workpiece.SELECTED DRAWING: Figure 8
【課題】ワークの反りを抑制する。【解決手段】プラズマ装置は、ワークと、ワークの一方の面側に配置され、非処理対象部分を覆う第１マスキング部材と、ワークの他方の面側に配置される第２マスキング部材と、往復動可能であるとともに、第１マスキング部材を第２マスキング部材に向けて押圧可能な第１の型と、第２の型と、を備える。第１または第２マスキング部材は、ワークの開口に対応する箇所に、ワークが載置される面に斜め方向、かつワークの外側方向に深さ方向が向けられた孔部を有している。孔部には、深さ方向に移動可能な可動部材が備えられる。ワークの開口の外端が、孔部の表面開口の外端よりも、ワークの内側方向に位置する。第１マスキング部材が第２マスキング部材に向けて押圧されている状態のときに、可動部材は、ワークの開口の外端を押圧している。【選択図】図８</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PLASMA DEVICE |
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