SUBSTRATE PROCESSING METHOD, SOLUTION SENDING METHOD, AND SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing method, a solution sending method and a substrate processing apparatus, which can inhibit cost increase and inhibit or prevent generation of a precipitate.SOLUTION: A substrate processing method comprises: performing a low-purity rinse solution...

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Bibliographische Detailangaben
Hauptverfasser:	MIURA ATSUYASU, FUJITA KAZUHIRO, TSUJIKAWA HIROTAKA, DOBASHI YUYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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