PHOTOSENSITIVE COMPOSITION, AND METHOD FOR FORMING CURED FILM

PROBLEM TO BE SOLVED: To provide a photosensitive composition which suppresses occurrence of a foreign matter in the photosensitive composition and can satisfactorily resolve a fine pattern, and to provide a method for forming a cured film using the photosensitive composition.SOLUTION: Amine (E) is...

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Bibliographische Detailangaben

Hauptverfasser:	TAKEGAWA MASAHIRO, ITO YOSUKE, YAMAGUCHI NAOTO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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