SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor device having a structure within a through hole suitable for a power circuit part; and provide a manufacturing method of the semiconductor device.SOLUTION: A semiconductor device comprises: an interlayer insulation film II2 having via holes VH1, VH2;...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KOSHIMIZU AKIRA, FUKAYA KAZUHIDE, HANAWA TOSHIKAZU
Format: Patent
Sprache:eng ; jpn
Schlagworte:
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