EXPOSURE DEVICE AND EXPOSURE METHOD
PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method capable of efficiently performing exposure transfer on a substrate having a plurality of exposure regions by shortening tact time.SOLUTION: Provided are: a substrate holding part 2 which holds a substrate W having a plurality...
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| creator | TOGASHI TAKUMI HARADA TOMONORI NAGAI KAZUMA |
| description | PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method capable of efficiently performing exposure transfer on a substrate having a plurality of exposure regions by shortening tact time.SOLUTION: Provided are: a substrate holding part 2 which holds a substrate W having a plurality of exposure regions E1 to E6; a mask holding part 1 which holds a mask M where patterns in size substantially equivalent to that of the exposure regions E are formed; a substrate transport part 10 capable of transporting the substrate W in a prescribed direction; a mask transport part 40 capable of transporting the mask M in a prescribed direction; a mask driving part 50 capable of adjusting alignment of the substrate W and the mask M; and a lighting device 3 which irradiates the exposure regions E with exposure light via the mask M.SELECTED DRAWING: Figure 1
【課題】タクトタイムを短縮して、複数の露光領域を有する基板に対して効率よく露光転写することができる露光装置及び露光方法を提供する。【解決手段】複数の露光領域Ｅ１〜Ｅ６を有する基板Ｗを保持する基板保持部２と、露光領域Ｅと略等しい大きさを有するパターンが形成されたマスクＭを保持するマスク保持部１と、基板Ｗを所定の方向に搬送可能な基板搬送部１０と、マスクＭを所定の方向に搬送可能なマスク搬送部４０と、基板ＷとマスクＭとのアライメントを調整可能なマスク駆動部５０と、マスクＭを介して露光領域Ｅに露光光を照射する照明装置３と、を備える。【選択図】図１ |
| format | Patent |
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【課題】タクトタイムを短縮して、複数の露光領域を有する基板に対して効率よく露光転写することができる露光装置及び露光方法を提供する。【解決手段】複数の露光領域Ｅ１〜Ｅ６を有する基板Ｗを保持する基板保持部２と、露光領域Ｅと略等しい大きさを有するパターンが形成されたマスクＭを保持するマスク保持部１と、基板Ｗを所定の方向に搬送可能な基板搬送部１０と、マスクＭを所定の方向に搬送可能なマスク搬送部４０と、基板ＷとマスクＭとのアライメントを調整可能なマスク駆動部５０と、マスクＭを介して露光領域Ｅに露光光を照射する照明装置３と、を備える。【選択図】図１</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180308&DB=EPODOC&CC=JP&NR=2018036330A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180308&DB=EPODOC&CC=JP&NR=2018036330A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TOGASHI TAKUMI</creatorcontrib><creatorcontrib>HARADA TOMONORI</creatorcontrib><creatorcontrib>NAGAI KAZUMA</creatorcontrib><title>EXPOSURE DEVICE AND EXPOSURE METHOD</title><description>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method capable of efficiently performing exposure transfer on a substrate having a plurality of exposure regions by shortening tact time.SOLUTION: Provided are: a substrate holding part 2 which holds a substrate W having a plurality of exposure regions E1 to E6; a mask holding part 1 which holds a mask M where patterns in size substantially equivalent to that of the exposure regions E are formed; a substrate transport part 10 capable of transporting the substrate W in a prescribed direction; a mask transport part 40 capable of transporting the mask M in a prescribed direction; a mask driving part 50 capable of adjusting alignment of the substrate W and the mask M; and a lighting device 3 which irradiates the exposure regions E with exposure light via the mask M.SELECTED DRAWING: Figure 1
【課題】タクトタイムを短縮して、複数の露光領域を有する基板に対して効率よく露光転写することができる露光装置及び露光方法を提供する。【解決手段】複数の露光領域Ｅ１〜Ｅ６を有する基板Ｗを保持する基板保持部２と、露光領域Ｅと略等しい大きさを有するパターンが形成されたマスクＭを保持するマスク保持部１と、基板Ｗを所定の方向に搬送可能な基板搬送部１０と、マスクＭを所定の方向に搬送可能なマスク搬送部４０と、基板ＷとマスクＭとのアライメントを調整可能なマスク駆動部５０と、マスクＭを介して露光領域Ｅに露光光を照射する照明装置３と、を備える。【選択図】図１</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB2jQjwDw4NclVwcQ3zdHZVcPRzUYCL-bqGePi78DCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDCwNjM2NjA0djohQBAKURIyw</recordid><startdate>20180308</startdate><enddate>20180308</enddate><creator>TOGASHI TAKUMI</creator><creator>HARADA TOMONORI</creator><creator>NAGAI KAZUMA</creator><scope>EVB</scope></search><sort><creationdate>20180308</creationdate><title>EXPOSURE DEVICE AND EXPOSURE METHOD</title><author>TOGASHI TAKUMI ; HARADA TOMONORI ; NAGAI KAZUMA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2018036330A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>TOGASHI TAKUMI</creatorcontrib><creatorcontrib>HARADA TOMONORI</creatorcontrib><creatorcontrib>NAGAI KAZUMA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TOGASHI TAKUMI</au><au>HARADA TOMONORI</au><au>NAGAI KAZUMA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE DEVICE AND EXPOSURE METHOD</title><date>2018-03-08</date><risdate>2018</risdate><abstract>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method capable of efficiently performing exposure transfer on a substrate having a plurality of exposure regions by shortening tact time.SOLUTION: Provided are: a substrate holding part 2 which holds a substrate W having a plurality of exposure regions E1 to E6; a mask holding part 1 which holds a mask M where patterns in size substantially equivalent to that of the exposure regions E are formed; a substrate transport part 10 capable of transporting the substrate W in a prescribed direction; a mask transport part 40 capable of transporting the mask M in a prescribed direction; a mask driving part 50 capable of adjusting alignment of the substrate W and the mask M; and a lighting device 3 which irradiates the exposure regions E with exposure light via the mask M.SELECTED DRAWING: Figure 1
【課題】タクトタイムを短縮して、複数の露光領域を有する基板に対して効率よく露光転写することができる露光装置及び露光方法を提供する。【解決手段】複数の露光領域Ｅ１〜Ｅ６を有する基板Ｗを保持する基板保持部２と、露光領域Ｅと略等しい大きさを有するパターンが形成されたマスクＭを保持するマスク保持部１と、基板Ｗを所定の方向に搬送可能な基板搬送部１０と、マスクＭを所定の方向に搬送可能なマスク搬送部４０と、基板ＷとマスクＭとのアライメントを調整可能なマスク駆動部５０と、マスクＭを介して露光領域Ｅに露光光を照射する照明装置３と、を備える。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | EXPOSURE DEVICE AND EXPOSURE METHOD |
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