CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME
PROBLEM TO BE SOLVED: To provide a cylindrical type sintered compact of 470 mm or more long in a cylindrical axial direction, a cylindrical type sputtering target and a method for producing the same.SOLUTION: A method for producing a cylindrical type sputtering target according to one embodiment in...
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| creator | TATENO SATOSHI OSADA KOZO |
| description | PROBLEM TO BE SOLVED: To provide a cylindrical type sintered compact of 470 mm or more long in a cylindrical axial direction, a cylindrical type sputtering target and a method for producing the same.SOLUTION: A method for producing a cylindrical type sputtering target according to one embodiment in this invention being a method for producing a cylindrical type sputtering target having a cylindrical type sintered compact, in which a cylindrical type compact of 600 mm or more long in a cylindrical axial direction on a stage provided with an oxygen feed port in contact with piping for feeding oxygen, and sintering is performed while oxygen is being fed in the cylindrical axial direction from an oxygen feed port smaller than the cylindrical inner circumference provided at the cylindrical inside of the cylindrical type compact. Also, in an another embodiment, it is possible that the stage is arranged in a chamber, and the piping for feeding oxygen is connected to the oxygen feed port from the outside of the chamber.SELECTED DRAWING: Figure 4
【課題】 円筒軸方向の長さが４７０ｍｍ以上の円筒型焼結体、円筒型スパッタリングターゲット及びそれらの製造方法を提供することを目的とする。【解決手段】 本発明の一実施形態による円筒型スパッタリングターゲットの製造方法は、円筒型焼結体を有する円筒型スパッタリングターゲットの製造方法において、酸素を供給するための配管と接続する酸素供給口を設けたステージ上に円筒軸方向の長さが６００ｍｍ以上の円筒型成形体を配置し、円筒型成形体の円筒内側に設けられた円筒内周より小さい酸素供給口から円筒軸方向に酸素を供給しながら焼結する。また、別の態様において、ステージはチャンバーの中に配置され、酸素を供給するための配管はチャンバーの外から酸素供給口に接続されてもよい。【選択図】図４ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2018009251A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2018009251A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2018009251A3</originalsourceid><addsrcrecordid>eNrjZHBxjvTx9HMJ8nR29FEIiQxwVQgOCA0JcQ3y9HNXCHEMcncNUXD0c1HwdQ3x8HdRcPMPUggI8ncJdQbLewCVO_q68jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDCwMDSyNTQ0djohQBALoeLDA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME</title><source>esp@cenet</source><creator>TATENO SATOSHI ; OSADA KOZO</creator><creatorcontrib>TATENO SATOSHI ; OSADA KOZO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a cylindrical type sintered compact of 470 mm or more long in a cylindrical axial direction, a cylindrical type sputtering target and a method for producing the same.SOLUTION: A method for producing a cylindrical type sputtering target according to one embodiment in this invention being a method for producing a cylindrical type sputtering target having a cylindrical type sintered compact, in which a cylindrical type compact of 600 mm or more long in a cylindrical axial direction on a stage provided with an oxygen feed port in contact with piping for feeding oxygen, and sintering is performed while oxygen is being fed in the cylindrical axial direction from an oxygen feed port smaller than the cylindrical inner circumference provided at the cylindrical inside of the cylindrical type compact. Also, in an another embodiment, it is possible that the stage is arranged in a chamber, and the piping for feeding oxygen is connected to the oxygen feed port from the outside of the chamber.SELECTED DRAWING: Figure 4
【課題】 円筒軸方向の長さが４７０ｍｍ以上の円筒型焼結体、円筒型スパッタリングターゲット及びそれらの製造方法を提供することを目的とする。【解決手段】 本発明の一実施形態による円筒型スパッタリングターゲットの製造方法は、円筒型焼結体を有する円筒型スパッタリングターゲットの製造方法において、酸素を供給するための配管と接続する酸素供給口を設けたステージ上に円筒軸方向の長さが６００ｍｍ以上の円筒型成形体を配置し、円筒型成形体の円筒内側に設けられた円筒内周より小さい酸素供給口から円筒軸方向に酸素を供給しながら焼結する。また、別の態様において、ステージはチャンバーの中に配置され、酸素を供給するための配管はチャンバーの外から酸素供給口に接続されてもよい。【選択図】図４</description><language>eng ; jpn</language><subject>ARTIFICIAL STONE ; CEMENTS ; CERAMICS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIME, MAGNESIA ; METALLURGY ; REFRACTORIES ; SLAG ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF NATURAL STONE</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180118&DB=EPODOC&CC=JP&NR=2018009251A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180118&DB=EPODOC&CC=JP&NR=2018009251A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TATENO SATOSHI</creatorcontrib><creatorcontrib>OSADA KOZO</creatorcontrib><title>CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide a cylindrical type sintered compact of 470 mm or more long in a cylindrical axial direction, a cylindrical type sputtering target and a method for producing the same.SOLUTION: A method for producing a cylindrical type sputtering target according to one embodiment in this invention being a method for producing a cylindrical type sputtering target having a cylindrical type sintered compact, in which a cylindrical type compact of 600 mm or more long in a cylindrical axial direction on a stage provided with an oxygen feed port in contact with piping for feeding oxygen, and sintering is performed while oxygen is being fed in the cylindrical axial direction from an oxygen feed port smaller than the cylindrical inner circumference provided at the cylindrical inside of the cylindrical type compact. Also, in an another embodiment, it is possible that the stage is arranged in a chamber, and the piping for feeding oxygen is connected to the oxygen feed port from the outside of the chamber.SELECTED DRAWING: Figure 4
【課題】 円筒軸方向の長さが４７０ｍｍ以上の円筒型焼結体、円筒型スパッタリングターゲット及びそれらの製造方法を提供することを目的とする。【解決手段】 本発明の一実施形態による円筒型スパッタリングターゲットの製造方法は、円筒型焼結体を有する円筒型スパッタリングターゲットの製造方法において、酸素を供給するための配管と接続する酸素供給口を設けたステージ上に円筒軸方向の長さが６００ｍｍ以上の円筒型成形体を配置し、円筒型成形体の円筒内側に設けられた円筒内周より小さい酸素供給口から円筒軸方向に酸素を供給しながら焼結する。また、別の態様において、ステージはチャンバーの中に配置され、酸素を供給するための配管はチャンバーの外から酸素供給口に接続されてもよい。【選択図】図４</description><subject>ARTIFICIAL STONE</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIME, MAGNESIA</subject><subject>METALLURGY</subject><subject>REFRACTORIES</subject><subject>SLAG</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF NATURAL STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxjvTx9HMJ8nR29FEIiQxwVQgOCA0JcQ3y9HNXCHEMcncNUXD0c1HwdQ3x8HdRcPMPUggI8ncJdQbLewCVO_q68jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDCwMDSyNTQ0djohQBALoeLDA</recordid><startdate>20180118</startdate><enddate>20180118</enddate><creator>TATENO SATOSHI</creator><creator>OSADA KOZO</creator><scope>EVB</scope></search><sort><creationdate>20180118</creationdate><title>CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME</title><author>TATENO SATOSHI ; OSADA KOZO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2018009251A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>ARTIFICIAL STONE</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>REFRACTORIES</topic><topic>SLAG</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF NATURAL STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>TATENO SATOSHI</creatorcontrib><creatorcontrib>OSADA KOZO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TATENO SATOSHI</au><au>OSADA KOZO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME</title><date>2018-01-18</date><risdate>2018</risdate><abstract>PROBLEM TO BE SOLVED: To provide a cylindrical type sintered compact of 470 mm or more long in a cylindrical axial direction, a cylindrical type sputtering target and a method for producing the same.SOLUTION: A method for producing a cylindrical type sputtering target according to one embodiment in this invention being a method for producing a cylindrical type sputtering target having a cylindrical type sintered compact, in which a cylindrical type compact of 600 mm or more long in a cylindrical axial direction on a stage provided with an oxygen feed port in contact with piping for feeding oxygen, and sintering is performed while oxygen is being fed in the cylindrical axial direction from an oxygen feed port smaller than the cylindrical inner circumference provided at the cylindrical inside of the cylindrical type compact. Also, in an another embodiment, it is possible that the stage is arranged in a chamber, and the piping for feeding oxygen is connected to the oxygen feed port from the outside of the chamber.SELECTED DRAWING: Figure 4
【課題】 円筒軸方向の長さが４７０ｍｍ以上の円筒型焼結体、円筒型スパッタリングターゲット及びそれらの製造方法を提供することを目的とする。【解決手段】 本発明の一実施形態による円筒型スパッタリングターゲットの製造方法は、円筒型焼結体を有する円筒型スパッタリングターゲットの製造方法において、酸素を供給するための配管と接続する酸素供給口を設けたステージ上に円筒軸方向の長さが６００ｍｍ以上の円筒型成形体を配置し、円筒型成形体の円筒内側に設けられた円筒内周より小さい酸素供給口から円筒軸方向に酸素を供給しながら焼結する。また、別の態様において、ステージはチャンバーの中に配置され、酸素を供給するための配管はチャンバーの外から酸素供給口に接続されてもよい。【選択図】図４</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE |
| title | CYLINDRICAL TYPE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME |
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