GLASS PLATE FOR IMPRINT MOLD, AND MANUFACTURING METHOD OF GLASS PLATE FOR IMPRINT MOLD

PROBLEM TO BE SOLVED: To provide a glass plate of an imprint mold, which is suitable for rectifying an uneven pattern.SOLUTION: A glass plate for an imprint mold, includes a non-penetration hole in a center part of one principal surface, divides the principal surface with two linear lines (X-axis an...

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Hauptverfasser:	OTA SEIGO, NAKAMURA HIROTO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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creator	OTA SEIGO NAKAMURA HIROTO
description	PROBLEM TO BE SOLVED: To provide a glass plate of an imprint mold, which is suitable for rectifying an uneven pattern.SOLUTION: A glass plate for an imprint mold, includes a non-penetration hole in a center part of one principal surface, divides the principal surface with two linear lines (X-axis and Y-axis) as a symmetric axis of the principal surface in a measurement region of an inner side of 5 mm or more from an outer peripheral edge of the principal surface and an outer side of 5 mm or more from an opening edge of the non-penetration hole into four blocks (first block to forth block), measures an angle formed by the linear line connecting a phase advance axis of double-refraction measured by vertically irradiating a light to the principal surface, a measurement point in the total blocks of the phase advance axis (±x, ±y: x and y are an optional number), and a center point of the principal surface at the measurement point in each block, and calculates a standard division σ from the angle obtained four points. An average standard deviation σcalculated by the plurality of standard divisions σ obtained by the measurement region is equal to 15° or less.SELECTED DRAWING: Figure 14 【課題】凹凸パターンの矯正に適した、インプリントモールド用ガラス板の提供。【解決手段】一方の主表面の中央部に非貫通穴を有しており、前記主表面の外周縁から５ｍｍ以上内側、且つ、前記非貫通穴の開口縁から５ｍｍ以上外側の測定領域において、前記主表面の対称軸となる２本の直線（Ｘ軸とＹ軸）で前記主表面を４区画（第１区画〜第４区画）に区切り、前記主表面に対し垂直に光を照射することで測定した複屈折の進相軸と、前記進相軸の全区画の測定点（±ｘ，±ｙ：ｘおよびｙは任意の数）と前記主表面の中心点とを結ぶ直線とのなす角を、それぞれの区画での測定点で測定し、得られた４点の角から標準偏差σを算出し、測定領域から複数得られる標準偏差σから算出する平均標準偏差σａｖｅが１５°以下である、インプリントモールド用ガラス板。【選択図】図１４
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An average standard deviation σcalculated by the plurality of standard divisions σ obtained by the measurement region is equal to 15° or less.SELECTED DRAWING: Figure 14 【課題】凹凸パターンの矯正に適した、インプリントモールド用ガラス板の提供。【解決手段】一方の主表面の中央部に非貫通穴を有しており、前記主表面の外周縁から５ｍｍ以上内側、且つ、前記非貫通穴の開口縁から５ｍｍ以上外側の測定領域において、前記主表面の対称軸となる２本の直線（Ｘ軸とＹ軸）で前記主表面を４区画（第１区画〜第４区画）に区切り、前記主表面に対し垂直に光を照射することで測定した複屈折の進相軸と、前記進相軸の全区画の測定点（±ｘ，±ｙ：ｘおよびｙは任意の数）と前記主表面の中心点とを結ぶ直線とのなす角を、それぞれの区画での測定点で測定し、得られた４点の角から標準偏差σを算出し、測定領域から複数得られる標準偏差σから算出する平均標準偏差σａｖｅが１５°以下である、インプリントモールド用ガラス板。【選択図】図１４</description><language>eng ; jpn</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170608&DB=EPODOC&CC=JP&NR=2017103309A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170608&DB=EPODOC&CC=JP&NR=2017103309A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OTA SEIGO</creatorcontrib><creatorcontrib>NAKAMURA HIROTO</creatorcontrib><title>GLASS PLATE FOR IMPRINT MOLD, AND MANUFACTURING METHOD OF GLASS PLATE FOR IMPRINT MOLD</title><description>PROBLEM TO BE SOLVED: To provide a glass plate of an imprint mold, which is suitable for rectifying an uneven pattern.SOLUTION: A glass plate for an imprint mold, includes a non-penetration hole in a center part of one principal surface, divides the principal surface with two linear lines (X-axis and Y-axis) as a symmetric axis of the principal surface in a measurement region of an inner side of 5 mm or more from an outer peripheral edge of the principal surface and an outer side of 5 mm or more from an opening edge of the non-penetration hole into four blocks (first block to forth block), measures an angle formed by the linear line connecting a phase advance axis of double-refraction measured by vertically irradiating a light to the principal surface, a measurement point in the total blocks of the phase advance axis (±x, ±y: x and y are an optional number), and a center point of the principal surface at the measurement point in each block, and calculates a standard division σ from the angle obtained four points. An average standard deviation σcalculated by the plurality of standard divisions σ obtained by the measurement region is equal to 15° or less.SELECTED DRAWING: Figure 14 【課題】凹凸パターンの矯正に適した、インプリントモールド用ガラス板の提供。【解決手段】一方の主表面の中央部に非貫通穴を有しており、前記主表面の外周縁から５ｍｍ以上内側、且つ、前記非貫通穴の開口縁から５ｍｍ以上外側の測定領域において、前記主表面の対称軸となる２本の直線（Ｘ軸とＹ軸）で前記主表面を４区画（第１区画〜第４区画）に区切り、前記主表面に対し垂直に光を照射することで測定した複屈折の進相軸と、前記進相軸の全区画の測定点（±ｘ，±ｙ：ｘおよびｙは任意の数）と前記主表面の中心点とを結ぶ直線とのなす角を、それぞれの区画での測定点で測定し、得られた４点の角から標準偏差σを算出し、測定領域から複数得られる標準偏差σから算出する平均標準偏差σａｖｅが１５°以下である、インプリントモールド用ガラス板。【選択図】図１４</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhz93EMDlYI8HEMcVVw8w9S8PQNCPL0C1Hw9fdx0VFw9HNR8HX0C3VzdA4JBYq7K_i6hnj4uyj4uyng08nDwJqWmFOcyguluRmU3FxDnD10Uwvy41OLCxKTU_NSS-K9AowMDM0NDYyNDSwdjYlSBAC9UzC6</recordid><startdate>20170608</startdate><enddate>20170608</enddate><creator>OTA SEIGO</creator><creator>NAKAMURA HIROTO</creator><scope>EVB</scope></search><sort><creationdate>20170608</creationdate><title>GLASS PLATE FOR IMPRINT MOLD, AND MANUFACTURING METHOD OF GLASS PLATE FOR IMPRINT MOLD</title><author>OTA SEIGO ; NAKAMURA HIROTO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2017103309A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2017</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>OTA SEIGO</creatorcontrib><creatorcontrib>NAKAMURA HIROTO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OTA SEIGO</au><au>NAKAMURA HIROTO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GLASS PLATE FOR IMPRINT MOLD, AND MANUFACTURING METHOD OF GLASS PLATE FOR IMPRINT MOLD</title><date>2017-06-08</date><risdate>2017</risdate><abstract>PROBLEM TO BE SOLVED: To provide a glass plate of an imprint mold, which is suitable for rectifying an uneven pattern.SOLUTION: A glass plate for an imprint mold, includes a non-penetration hole in a center part of one principal surface, divides the principal surface with two linear lines (X-axis and Y-axis) as a symmetric axis of the principal surface in a measurement region of an inner side of 5 mm or more from an outer peripheral edge of the principal surface and an outer side of 5 mm or more from an opening edge of the non-penetration hole into four blocks (first block to forth block), measures an angle formed by the linear line connecting a phase advance axis of double-refraction measured by vertically irradiating a light to the principal surface, a measurement point in the total blocks of the phase advance axis (±x, ±y: x and y are an optional number), and a center point of the principal surface at the measurement point in each block, and calculates a standard division σ from the angle obtained four points. An average standard deviation σcalculated by the plurality of standard divisions σ obtained by the measurement region is equal to 15° or less.SELECTED DRAWING: Figure 14 【課題】凹凸パターンの矯正に適した、インプリントモールド用ガラス板の提供。【解決手段】一方の主表面の中央部に非貫通穴を有しており、前記主表面の外周縁から５ｍｍ以上内側、且つ、前記非貫通穴の開口縁から５ｍｍ以上外側の測定領域において、前記主表面の対称軸となる２本の直線（Ｘ軸とＹ軸）で前記主表面を４区画（第１区画〜第４区画）に区切り、前記主表面に対し垂直に光を照射することで測定した複屈折の進相軸と、前記進相軸の全区画の測定点（±ｘ，±ｙ：ｘおよびｙは任意の数）と前記主表面の中心点とを結ぶ直線とのなす角を、それぞれの区画での測定点で測定し、得られた４点の角から標準偏差σを算出し、測定領域から複数得られる標準偏差σから算出する平均標準偏差σａｖｅが１５°以下である、インプリントモールド用ガラス板。【選択図】図１４</abstract><oa>free_for_read</oa></addata></record>
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subjects	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
title	GLASS PLATE FOR IMPRINT MOLD, AND MANUFACTURING METHOD OF GLASS PLATE FOR IMPRINT MOLD
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