PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM
PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; jpn |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HOMMI MOTONOBU SUGIYAMA AKIYUKI IZAWA MIKI YAMAGUCHI SATOSHI |
| description | PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement device finds the centers of gravity of a plurality of patterns included in an image, finds the distance between the centers of gravity of the plurality of patterns, etc., and on the basis of the found distance between the centers of gravity, etc., identifies a pattern of a specific condition to patterns different from the pattern of the specific condition or calculates information pertaining to the number of patterns of the specific condition, the size of an area that includes the pattern of the specific condition, and the number of virtual line segments between the patterns of the specific condition.SELECTED DRAWING: Figure 1
【課題】本発明は、ＤＳＡ法によって形成されるパターンを高精度に定量評価することをパターン測定装置の提供を目的とする。【解決手段】本発明は、試料に形成されたパターン間の寸法を測定するパターン測定装置であって、画像内に含まれる複数のパターンの重心を求め、複数のパターンの重心間の距離等を求め、当該求められた重心間の距離等に基づいて、特定の条件のパターンを、当該特定の条件のパターンとは異なるパターンと識別、又は特定の条件のパターンの数、特定の条件のパターンを含む領域の大きさ、及び特定の条件のパターン間の仮想線分の数に関する情報を演算するパターン測定装置を提案する。【選択図】 図１ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2017067443A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2017067443A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2017067443A3</originalsourceid><addsrcrecordid>eNrjZNAPcAwJcQ3yU_B1dQwODXL1dfULUXBxDfN0dlVw9HNRcPb3DQgFKlAICPJ3D3L05WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaG5gZm5iYmxo7GRCkCAGTUJpw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM</title><source>esp@cenet</source><creator>HOMMI MOTONOBU ; SUGIYAMA AKIYUKI ; IZAWA MIKI ; YAMAGUCHI SATOSHI</creator><creatorcontrib>HOMMI MOTONOBU ; SUGIYAMA AKIYUKI ; IZAWA MIKI ; YAMAGUCHI SATOSHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement device finds the centers of gravity of a plurality of patterns included in an image, finds the distance between the centers of gravity of the plurality of patterns, etc., and on the basis of the found distance between the centers of gravity, etc., identifies a pattern of a specific condition to patterns different from the pattern of the specific condition or calculates information pertaining to the number of patterns of the specific condition, the size of an area that includes the pattern of the specific condition, and the number of virtual line segments between the patterns of the specific condition.SELECTED DRAWING: Figure 1
【課題】本発明は、ＤＳＡ法によって形成されるパターンを高精度に定量評価することをパターン測定装置の提供を目的とする。【解決手段】本発明は、試料に形成されたパターン間の寸法を測定するパターン測定装置であって、画像内に含まれる複数のパターンの重心を求め、複数のパターンの重心間の距離等を求め、当該求められた重心間の距離等に基づいて、特定の条件のパターンを、当該特定の条件のパターンとは異なるパターンと識別、又は特定の条件のパターンの数、特定の条件のパターンを含む領域の大きさ、及び特定の条件のパターン間の仮想線分の数に関する情報を演算するパターン測定装置を提案する。【選択図】 図１</description><language>eng ; jpn</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170406&DB=EPODOC&CC=JP&NR=2017067443A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170406&DB=EPODOC&CC=JP&NR=2017067443A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HOMMI MOTONOBU</creatorcontrib><creatorcontrib>SUGIYAMA AKIYUKI</creatorcontrib><creatorcontrib>IZAWA MIKI</creatorcontrib><creatorcontrib>YAMAGUCHI SATOSHI</creatorcontrib><title>PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM</title><description>PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement device finds the centers of gravity of a plurality of patterns included in an image, finds the distance between the centers of gravity of the plurality of patterns, etc., and on the basis of the found distance between the centers of gravity, etc., identifies a pattern of a specific condition to patterns different from the pattern of the specific condition or calculates information pertaining to the number of patterns of the specific condition, the size of an area that includes the pattern of the specific condition, and the number of virtual line segments between the patterns of the specific condition.SELECTED DRAWING: Figure 1
【課題】本発明は、ＤＳＡ法によって形成されるパターンを高精度に定量評価することをパターン測定装置の提供を目的とする。【解決手段】本発明は、試料に形成されたパターン間の寸法を測定するパターン測定装置であって、画像内に含まれる複数のパターンの重心を求め、複数のパターンの重心間の距離等を求め、当該求められた重心間の距離等に基づいて、特定の条件のパターンを、当該特定の条件のパターンとは異なるパターンと識別、又は特定の条件のパターンの数、特定の条件のパターンを含む領域の大きさ、及び特定の条件のパターン間の仮想線分の数に関する情報を演算するパターン測定装置を提案する。【選択図】 図１</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAPcAwJcQ3yU_B1dQwODXL1dfULUXBxDfN0dlVw9HNRcPb3DQgFKlAICPJ3D3L05WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaG5gZm5iYmxo7GRCkCAGTUJpw</recordid><startdate>20170406</startdate><enddate>20170406</enddate><creator>HOMMI MOTONOBU</creator><creator>SUGIYAMA AKIYUKI</creator><creator>IZAWA MIKI</creator><creator>YAMAGUCHI SATOSHI</creator><scope>EVB</scope></search><sort><creationdate>20170406</creationdate><title>PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM</title><author>HOMMI MOTONOBU ; SUGIYAMA AKIYUKI ; IZAWA MIKI ; YAMAGUCHI SATOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2017067443A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2017</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HOMMI MOTONOBU</creatorcontrib><creatorcontrib>SUGIYAMA AKIYUKI</creatorcontrib><creatorcontrib>IZAWA MIKI</creatorcontrib><creatorcontrib>YAMAGUCHI SATOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOMMI MOTONOBU</au><au>SUGIYAMA AKIYUKI</au><au>IZAWA MIKI</au><au>YAMAGUCHI SATOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM</title><date>2017-04-06</date><risdate>2017</risdate><abstract>PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement device finds the centers of gravity of a plurality of patterns included in an image, finds the distance between the centers of gravity of the plurality of patterns, etc., and on the basis of the found distance between the centers of gravity, etc., identifies a pattern of a specific condition to patterns different from the pattern of the specific condition or calculates information pertaining to the number of patterns of the specific condition, the size of an area that includes the pattern of the specific condition, and the number of virtual line segments between the patterns of the specific condition.SELECTED DRAWING: Figure 1
【課題】本発明は、ＤＳＡ法によって形成されるパターンを高精度に定量評価することをパターン測定装置の提供を目的とする。【解決手段】本発明は、試料に形成されたパターン間の寸法を測定するパターン測定装置であって、画像内に含まれる複数のパターンの重心を求め、複数のパターンの重心間の距離等を求め、当該求められた重心間の距離等に基づいて、特定の条件のパターンを、当該特定の条件のパターンとは異なるパターンと識別、又は特定の条件のパターンの数、特定の条件のパターンを含む領域の大きさ、及び特定の条件のパターン間の仮想線分の数に関する情報を演算するパターン測定装置を提案する。【選択図】 図１</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; jpn |
| recordid | cdi_epo_espacenet_JP2017067443A |
| source | esp@cenet |
| subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
| title | PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T13%3A22%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HOMMI%20MOTONOBU&rft.date=2017-04-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2017067443A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |