MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KOIZUMI KATSUYUKI, KOIWA SHINGO, KUDO YUKIHISA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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