MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum a...
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| creator | KOIZUMI KATSUYUKI KOIWA SHINGO KUDO YUKIHISA |
| description | PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum alloy and is connected to the cooling table to transmit high frequency power from a high frequency power supply. A base of the electrostatic chuck has conductivity. An attraction unit is made of ceramics, incorporates an attraction electrode and a heater therein, and is fastened to the base by metal bonding. A first elastic member is provided between the cooling table and the base to allow the electrostatic chuck to be spaced apart from the cooling table. The first elastic member forms, along with the cooling table and the base, a heat transfer space into which heat transfer gas is supplied between the cooling table and the base. The clamping member is made of a metal, is contacted with the cooling table and the base, and allows the base and the first elastic member to be interposed between the cooling table and the clamping member.SELECTED DRAWING: Figure 1
【課題】プラズマ処理装置用の載置台を提供する。【解決手段】一実施形態の載置台は、冷却台、給電体、静電チャック、第１の弾性部材、及び締付部材を備えている。給電体は、アルミニウム又はアルミニウム合金製であり、高周波電源からの高周波を伝送するために、冷却台に接続されている。静電チャックの基台は、導電性を有している。吸着部は、セラミックス製であり、吸着用電極及びヒータを内蔵している。吸着部は、金属接合により基台に結合されている。第１の弾性部材は、冷却台と基台との間に設けられており、静電チャックを冷却台から離間させている。第１の弾性部材は、冷却台と基台との間に伝熱ガスが供給される伝熱空間を、冷却台及び基台と共に画成する。締付部材は、金属製であり、冷却台及び基台に接触し、基台及び第１の弾性部材を冷却台と締付部材の間に挟持する。【選択図】図１ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2017063011A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2017063011A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2017063011A3</originalsourceid><addsrcrecordid>eNrjZNDz9Q_1C_H0c1cIcXTycVVw9HNRCPBxDPZ1VAgI8nd2DQ4GyTkGBDgGOYaEBvMwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknivACMDQ3MDM2MDQ0NHY6IUAQAxnCYr</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MOUNTING TABLE AND PLASMA PROCESSING APPARATUS</title><source>esp@cenet</source><creator>KOIZUMI KATSUYUKI ; KOIWA SHINGO ; KUDO YUKIHISA</creator><creatorcontrib>KOIZUMI KATSUYUKI ; KOIWA SHINGO ; KUDO YUKIHISA</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum alloy and is connected to the cooling table to transmit high frequency power from a high frequency power supply. A base of the electrostatic chuck has conductivity. An attraction unit is made of ceramics, incorporates an attraction electrode and a heater therein, and is fastened to the base by metal bonding. A first elastic member is provided between the cooling table and the base to allow the electrostatic chuck to be spaced apart from the cooling table. The first elastic member forms, along with the cooling table and the base, a heat transfer space into which heat transfer gas is supplied between the cooling table and the base. The clamping member is made of a metal, is contacted with the cooling table and the base, and allows the base and the first elastic member to be interposed between the cooling table and the clamping member.SELECTED DRAWING: Figure 1
【課題】プラズマ処理装置用の載置台を提供する。【解決手段】一実施形態の載置台は、冷却台、給電体、静電チャック、第１の弾性部材、及び締付部材を備えている。給電体は、アルミニウム又はアルミニウム合金製であり、高周波電源からの高周波を伝送するために、冷却台に接続されている。静電チャックの基台は、導電性を有している。吸着部は、セラミックス製であり、吸着用電極及びヒータを内蔵している。吸着部は、金属接合により基台に結合されている。第１の弾性部材は、冷却台と基台との間に設けられており、静電チャックを冷却台から離間させている。第１の弾性部材は、冷却台と基台との間に伝熱ガスが供給される伝熱空間を、冷却台及び基台と共に画成する。締付部材は、金属製であり、冷却台及び基台に接触し、基台及び第１の弾性部材を冷却台と締付部材の間に挟持する。【選択図】図１</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SEMICONDUCTOR DEVICES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170330&DB=EPODOC&CC=JP&NR=2017063011A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170330&DB=EPODOC&CC=JP&NR=2017063011A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOIZUMI KATSUYUKI</creatorcontrib><creatorcontrib>KOIWA SHINGO</creatorcontrib><creatorcontrib>KUDO YUKIHISA</creatorcontrib><title>MOUNTING TABLE AND PLASMA PROCESSING APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum alloy and is connected to the cooling table to transmit high frequency power from a high frequency power supply. A base of the electrostatic chuck has conductivity. An attraction unit is made of ceramics, incorporates an attraction electrode and a heater therein, and is fastened to the base by metal bonding. A first elastic member is provided between the cooling table and the base to allow the electrostatic chuck to be spaced apart from the cooling table. The first elastic member forms, along with the cooling table and the base, a heat transfer space into which heat transfer gas is supplied between the cooling table and the base. The clamping member is made of a metal, is contacted with the cooling table and the base, and allows the base and the first elastic member to be interposed between the cooling table and the clamping member.SELECTED DRAWING: Figure 1
【課題】プラズマ処理装置用の載置台を提供する。【解決手段】一実施形態の載置台は、冷却台、給電体、静電チャック、第１の弾性部材、及び締付部材を備えている。給電体は、アルミニウム又はアルミニウム合金製であり、高周波電源からの高周波を伝送するために、冷却台に接続されている。静電チャックの基台は、導電性を有している。吸着部は、セラミックス製であり、吸着用電極及びヒータを内蔵している。吸着部は、金属接合により基台に結合されている。第１の弾性部材は、冷却台と基台との間に設けられており、静電チャックを冷却台から離間させている。第１の弾性部材は、冷却台と基台との間に伝熱ガスが供給される伝熱空間を、冷却台及び基台と共に画成する。締付部材は、金属製であり、冷却台及び基台に接触し、基台及び第１の弾性部材を冷却台と締付部材の間に挟持する。【選択図】図１</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDz9Q_1C_H0c1cIcXTycVVw9HNRCPBxDPZ1VAgI8nd2DQ4GyTkGBDgGOYaEBvMwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknivACMDQ3MDM2MDQ0NHY6IUAQAxnCYr</recordid><startdate>20170330</startdate><enddate>20170330</enddate><creator>KOIZUMI KATSUYUKI</creator><creator>KOIWA SHINGO</creator><creator>KUDO YUKIHISA</creator><scope>EVB</scope></search><sort><creationdate>20170330</creationdate><title>MOUNTING TABLE AND PLASMA PROCESSING APPARATUS</title><author>KOIZUMI KATSUYUKI ; KOIWA SHINGO ; KUDO YUKIHISA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2017063011A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KOIZUMI KATSUYUKI</creatorcontrib><creatorcontrib>KOIWA SHINGO</creatorcontrib><creatorcontrib>KUDO YUKIHISA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOIZUMI KATSUYUKI</au><au>KOIWA SHINGO</au><au>KUDO YUKIHISA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MOUNTING TABLE AND PLASMA PROCESSING APPARATUS</title><date>2017-03-30</date><risdate>2017</risdate><abstract>PROBLEM TO BE SOLVED: To provide a mounting table for a plasma processing apparatus.SOLUTION: A mounting table of one embodiment includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is made of aluminum or an aluminum alloy and is connected to the cooling table to transmit high frequency power from a high frequency power supply. A base of the electrostatic chuck has conductivity. An attraction unit is made of ceramics, incorporates an attraction electrode and a heater therein, and is fastened to the base by metal bonding. A first elastic member is provided between the cooling table and the base to allow the electrostatic chuck to be spaced apart from the cooling table. The first elastic member forms, along with the cooling table and the base, a heat transfer space into which heat transfer gas is supplied between the cooling table and the base. The clamping member is made of a metal, is contacted with the cooling table and the base, and allows the base and the first elastic member to be interposed between the cooling table and the clamping member.SELECTED DRAWING: Figure 1
【課題】プラズマ処理装置用の載置台を提供する。【解決手段】一実施形態の載置台は、冷却台、給電体、静電チャック、第１の弾性部材、及び締付部材を備えている。給電体は、アルミニウム又はアルミニウム合金製であり、高周波電源からの高周波を伝送するために、冷却台に接続されている。静電チャックの基台は、導電性を有している。吸着部は、セラミックス製であり、吸着用電極及びヒータを内蔵している。吸着部は、金属接合により基台に結合されている。第１の弾性部材は、冷却台と基台との間に設けられており、静電チャックを冷却台から離間させている。第１の弾性部材は、冷却台と基台との間に伝熱ガスが供給される伝熱空間を、冷却台及び基台と共に画成する。締付部材は、金属製であり、冷却台及び基台に接触し、基台及び第１の弾性部材を冷却台と締付部材の間に挟持する。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES |
| title | MOUNTING TABLE AND PLASMA PROCESSING APPARATUS |
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