METHOD AND SYSTEM OF EVALUATING TRANSCRIPTION PROPERTIES OF PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK

PROBLEM TO BE SOLVED: To provide an evaluation method and an evaluation system enabling accurate evaluation of transcription properties of a photomask for multi-patterning, and a manufacturing method enabling to manufacture a photomask having high reliability.SOLUTION: Among N (N is an integer equal...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAYANO KATSUYA, KOSUGE TAKESHI, YOSHIKAWA SHINGO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!