PATTERN INSPECTION DEVICE
PROBLEM TO BE SOLVED: To provide an inspection device that minimizes a rotation deviation of a sample arising from yawing of a stage upon driving, and can highly accurately and quickly measure an amount of rotation deviation.SOLUTION: An inspection device comprises: a Zθ stage 70 (a first stage) tha...
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| creator | NUKADA HIDEKI |
| description | PROBLEM TO BE SOLVED: To provide an inspection device that minimizes a rotation deviation of a sample arising from yawing of a stage upon driving, and can highly accurately and quickly measure an amount of rotation deviation.SOLUTION: An inspection device comprises: a Zθ stage 70 (a first stage) that loads an inspected sample having patterns formed at a position off a center of gravity of an own; 2D (two-dimensional) scales 80 and 82 that are arranged on a first stage so as to form a position relation across a center-of-gravity position of the first stage; an X stage 74 that is arranged below a region overlapping on the center of gravity of the first stage and not overlapping on the inspected sample loaded on the first stage, supports the first stage and moves the first stage; and a position circuit that computes a position of the inspected sample using position information measured by the 2D scales 80 and 82.SELECTED DRAWING: Figure 2
【課題】駆動時におけるステージのヨーイングに起因する試料の回転ずれを小さくすると共に、回転ずれ量を高速かつ高精度に測定することが可能な検査装置を提供する。【解決手段】検査装置は、自己の重心から外れた位置で、パターンが形成された被検査試料を載置するＺθステージ７０（第１のステージ）と、第１のステージの重心位置を挟んだ位置関係になるように第１のステージに配置された２Ｄスケール８０，８２と、第１のステージの重心と重なる領域であって第１のステージに載置された被検査試料とは重ならない領域下に配置され、第１のステージを支持すると共に、第１のステージを移動させるｘステージ７４と、２Ｄスケール８０，８２により測定された位置情報を用いて、被検査試料の位置を演算する位置回路とを備える。【選択図】図２ |
| format | Patent |
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【課題】駆動時におけるステージのヨーイングに起因する試料の回転ずれを小さくすると共に、回転ずれ量を高速かつ高精度に測定することが可能な検査装置を提供する。【解決手段】検査装置は、自己の重心から外れた位置で、パターンが形成された被検査試料を載置するＺθステージ７０（第１のステージ）と、第１のステージの重心位置を挟んだ位置関係になるように第１のステージに配置された２Ｄスケール８０，８２と、第１のステージの重心と重なる領域であって第１のステージに載置された被検査試料とは重ならない領域下に配置され、第１のステージを支持すると共に、第１のステージを移動させるｘステージ７４と、２Ｄスケール８０，８２により測定された位置情報を用いて、被検査試料の位置を演算する位置回路とを備える。【選択図】図２</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170209&DB=EPODOC&CC=JP&NR=2017032457A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170209&DB=EPODOC&CC=JP&NR=2017032457A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NUKADA HIDEKI</creatorcontrib><title>PATTERN INSPECTION DEVICE</title><description>PROBLEM TO BE SOLVED: To provide an inspection device that minimizes a rotation deviation of a sample arising from yawing of a stage upon driving, and can highly accurately and quickly measure an amount of rotation deviation.SOLUTION: An inspection device comprises: a Zθ stage 70 (a first stage) that loads an inspected sample having patterns formed at a position off a center of gravity of an own; 2D (two-dimensional) scales 80 and 82 that are arranged on a first stage so as to form a position relation across a center-of-gravity position of the first stage; an X stage 74 that is arranged below a region overlapping on the center of gravity of the first stage and not overlapping on the inspected sample loaded on the first stage, supports the first stage and moves the first stage; and a position circuit that computes a position of the inspected sample using position information measured by the 2D scales 80 and 82.SELECTED DRAWING: Figure 2
【課題】駆動時におけるステージのヨーイングに起因する試料の回転ずれを小さくすると共に、回転ずれ量を高速かつ高精度に測定することが可能な検査装置を提供する。【解決手段】検査装置は、自己の重心から外れた位置で、パターンが形成された被検査試料を載置するＺθステージ７０（第１のステージ）と、第１のステージの重心位置を挟んだ位置関係になるように第１のステージに配置された２Ｄスケール８０，８２と、第１のステージの重心と重なる領域であって第１のステージに載置された被検査試料とは重ならない領域下に配置され、第１のステージを支持すると共に、第１のステージを移動させるｘステージ７４と、２Ｄスケール８０，８２により測定された位置情報を用いて、被検査試料の位置を演算する位置回路とを備える。【選択図】図２</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAMcAwJcQ3yU_D0Cw5wdQ7x9PdTcHEN83R25WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaG5gbGRiam5o7GRCkCAFpKIHw</recordid><startdate>20170209</startdate><enddate>20170209</enddate><creator>NUKADA HIDEKI</creator><scope>EVB</scope></search><sort><creationdate>20170209</creationdate><title>PATTERN INSPECTION DEVICE</title><author>NUKADA HIDEKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2017032457A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NUKADA HIDEKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NUKADA HIDEKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PATTERN INSPECTION DEVICE</title><date>2017-02-09</date><risdate>2017</risdate><abstract>PROBLEM TO BE SOLVED: To provide an inspection device that minimizes a rotation deviation of a sample arising from yawing of a stage upon driving, and can highly accurately and quickly measure an amount of rotation deviation.SOLUTION: An inspection device comprises: a Zθ stage 70 (a first stage) that loads an inspected sample having patterns formed at a position off a center of gravity of an own; 2D (two-dimensional) scales 80 and 82 that are arranged on a first stage so as to form a position relation across a center-of-gravity position of the first stage; an X stage 74 that is arranged below a region overlapping on the center of gravity of the first stage and not overlapping on the inspected sample loaded on the first stage, supports the first stage and moves the first stage; and a position circuit that computes a position of the inspected sample using position information measured by the 2D scales 80 and 82.SELECTED DRAWING: Figure 2
【課題】駆動時におけるステージのヨーイングに起因する試料の回転ずれを小さくすると共に、回転ずれ量を高速かつ高精度に測定することが可能な検査装置を提供する。【解決手段】検査装置は、自己の重心から外れた位置で、パターンが形成された被検査試料を載置するＺθステージ７０（第１のステージ）と、第１のステージの重心位置を挟んだ位置関係になるように第１のステージに配置された２Ｄスケール８０，８２と、第１のステージの重心と重なる領域であって第１のステージに載置された被検査試料とは重ならない領域下に配置され、第１のステージを支持すると共に、第１のステージを移動させるｘステージ７４と、２Ｄスケール８０，８２により測定された位置情報を用いて、被検査試料の位置を演算する位置回路とを備える。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | PATTERN INSPECTION DEVICE |
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