ELECTRON BEAM LITHOGRAPHY APPARATUS
PROBLEM TO BE SOLVED: To perform correction of beam drift due to contamination, without increasing the apparatus cost.SOLUTION: An electron beam lithography apparatus includes: a deflector having at least a pair of first electrode and second electrode for deflecting an electron beam impinging on a s...
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| description | PROBLEM TO BE SOLVED: To perform correction of beam drift due to contamination, without increasing the apparatus cost.SOLUTION: An electron beam lithography apparatus includes: a deflector having at least a pair of first electrode and second electrode for deflecting an electron beam impinging on a specimen; a member coated with an organic material becoming the generation source of contamination, and disposed at a position where an electron beam deflected by the deflector can impinge; and deflection control means for making the electron beam impinge on the organic material, applied to the member, while deflecting in a direction toward one electrode, when the electron beam drifts in a direction toward any one of the first or second electrode.SELECTED DRAWING: Figure 12
【課題】コンタミネーションによるビームドリフトの補正を、装置のコストを増大させることなく行う。【解決手段】本実発明に係る電子線描画装置は、試料へ入射する電子線を偏向する少なくとも１対の第１電極及び第２電極を有する偏向器と、コンタミネーションの発生源となる有機物が塗布され、偏向器によって偏向された電子線が入射可能な位置に配置された部材と、第１電極及び第２電極のうちのいずれか一方の電極へ向かう方向へ、電子線がドリフトするときに、電子線を一方の電極へ向かう方向へ偏向させて部材に塗布された有機物へ入射させる偏向制御手段と、を備える。【選択図】図１２ |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2016201491A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2016201491A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2016201491A3</originalsourceid><addsrcrecordid>eNrjZFB29XF1Dgny91NwcnX0VfDxDPHwdw9yDPCIVHAMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhmZAbGJp6GhMlCIAqPEjPw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTRON BEAM LITHOGRAPHY APPARATUS</title><source>esp@cenet</source><creator>TSURUTA KAORU</creator><creatorcontrib>TSURUTA KAORU</creatorcontrib><description>PROBLEM TO BE SOLVED: To perform correction of beam drift due to contamination, without increasing the apparatus cost.SOLUTION: An electron beam lithography apparatus includes: a deflector having at least a pair of first electrode and second electrode for deflecting an electron beam impinging on a specimen; a member coated with an organic material becoming the generation source of contamination, and disposed at a position where an electron beam deflected by the deflector can impinge; and deflection control means for making the electron beam impinge on the organic material, applied to the member, while deflecting in a direction toward one electrode, when the electron beam drifts in a direction toward any one of the first or second electrode.SELECTED DRAWING: Figure 12
【課題】コンタミネーションによるビームドリフトの補正を、装置のコストを増大させることなく行う。【解決手段】本実発明に係る電子線描画装置は、試料へ入射する電子線を偏向する少なくとも１対の第１電極及び第２電極を有する偏向器と、コンタミネーションの発生源となる有機物が塗布され、偏向器によって偏向された電子線が入射可能な位置に配置された部材と、第１電極及び第２電極のうちのいずれか一方の電極へ向かう方向へ、電子線がドリフトするときに、電子線を一方の電極へ向かう方向へ偏向させて部材に塗布された有機物へ入射させる偏向制御手段と、を備える。【選択図】図１２</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161201&DB=EPODOC&CC=JP&NR=2016201491A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161201&DB=EPODOC&CC=JP&NR=2016201491A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSURUTA KAORU</creatorcontrib><title>ELECTRON BEAM LITHOGRAPHY APPARATUS</title><description>PROBLEM TO BE SOLVED: To perform correction of beam drift due to contamination, without increasing the apparatus cost.SOLUTION: An electron beam lithography apparatus includes: a deflector having at least a pair of first electrode and second electrode for deflecting an electron beam impinging on a specimen; a member coated with an organic material becoming the generation source of contamination, and disposed at a position where an electron beam deflected by the deflector can impinge; and deflection control means for making the electron beam impinge on the organic material, applied to the member, while deflecting in a direction toward one electrode, when the electron beam drifts in a direction toward any one of the first or second electrode.SELECTED DRAWING: Figure 12
【課題】コンタミネーションによるビームドリフトの補正を、装置のコストを増大させることなく行う。【解決手段】本実発明に係る電子線描画装置は、試料へ入射する電子線を偏向する少なくとも１対の第１電極及び第２電極を有する偏向器と、コンタミネーションの発生源となる有機物が塗布され、偏向器によって偏向された電子線が入射可能な位置に配置された部材と、第１電極及び第２電極のうちのいずれか一方の電極へ向かう方向へ、電子線がドリフトするときに、電子線を一方の電極へ向かう方向へ偏向させて部材に塗布された有機物へ入射させる偏向制御手段と、を備える。【選択図】図１２</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB29XF1Dgny91NwcnX0VfDxDPHwdw9yDPCIVHAMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhmZAbGJp6GhMlCIAqPEjPw</recordid><startdate>20161201</startdate><enddate>20161201</enddate><creator>TSURUTA KAORU</creator><scope>EVB</scope></search><sort><creationdate>20161201</creationdate><title>ELECTRON BEAM LITHOGRAPHY APPARATUS</title><author>TSURUTA KAORU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016201491A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>TSURUTA KAORU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSURUTA KAORU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRON BEAM LITHOGRAPHY APPARATUS</title><date>2016-12-01</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To perform correction of beam drift due to contamination, without increasing the apparatus cost.SOLUTION: An electron beam lithography apparatus includes: a deflector having at least a pair of first electrode and second electrode for deflecting an electron beam impinging on a specimen; a member coated with an organic material becoming the generation source of contamination, and disposed at a position where an electron beam deflected by the deflector can impinge; and deflection control means for making the electron beam impinge on the organic material, applied to the member, while deflecting in a direction toward one electrode, when the electron beam drifts in a direction toward any one of the first or second electrode.SELECTED DRAWING: Figure 12
【課題】コンタミネーションによるビームドリフトの補正を、装置のコストを増大させることなく行う。【解決手段】本実発明に係る電子線描画装置は、試料へ入射する電子線を偏向する少なくとも１対の第１電極及び第２電極を有する偏向器と、コンタミネーションの発生源となる有機物が塗布され、偏向器によって偏向された電子線が入射可能な位置に配置された部材と、第１電極及び第２電極のうちのいずれか一方の電極へ向かう方向へ、電子線がドリフトするときに、電子線を一方の電極へ向かう方向へ偏向させて部材に塗布された有機物へ入射させる偏向制御手段と、を備える。【選択図】図１２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | ELECTRON BEAM LITHOGRAPHY APPARATUS |
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