SUBSTRATE HOLDER AND METHOD FOR MANUFACTURING SOLAR CELL USING THE SAME

PROBLEM TO BE SOLVED: To provide a substrate holder necessary for manufacturing a solar cell having high conversion efficiency by using a substrate having an amorphous layer and forming an electrode layer and a method for manufacturing the substrate holder, and to provide a method for manufacturing...

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Hauptverfasser: UENO NAOYUKI, MISHIMA RYOTA, YANAGIHARA YUTAKA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate holder necessary for manufacturing a solar cell having high conversion efficiency by using a substrate having an amorphous layer and forming an electrode layer and a method for manufacturing the substrate holder, and to provide a method for manufacturing a crystal silicon solar cell which suppresses absorption loss due to reduction of a transparent electrode layer and has high conversion efficiency.SOLUTION: A substrate holder is used for forming an electrode layer on a substrate having an amorphous layer on a crystalline semiconductor by a PVD method. The substrate holder contains a metal as a main component and has a first recess on which the substrate is mounted. It is desirable that the substrate is mounted on the first recess so that a contact area between the substrate and the mounting surface of the substrate holder is 1/5 or less of an area of the substrate.SELECTED DRAWING: Figure 1 【課題】非晶質層を有する基板を用いて、電極層を製膜して変換効率の高い太陽電池を作製するために必要な基板ホルダおよび製造方法を提供する。また、透明電極層の還元による吸収ロスを抑制した、変換効率の高い結晶シリコン太陽電池の製造方法を提供する。【解決手段】結晶性半導体上に非晶質層を有する基板上に、PVD法により電極層を形成するための基板ホルダであって、前記基板ホルダは、金属を主成分とし、かつ、前記基板が載置される第1の凹部を有する。前記第1の凹部において、前記基板と基板ホルダの載置面との接触する面積が、前記基板の面積の5分の1以下となるように基板が載置されることが好ましい。【選択図】図1