TRANSPORT DEVICE
PROBLEM TO BE SOLVED: To provide a transport device capable of precisely transporting a substrate under a reduced pressure environment.SOLUTION: A transport device includes: a hollow chamber part 2 having multiple wall parts 21, 22, and 23 and having a closed space formed therein; a transport part 3...
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| creator | TERASHI SEIJI KAWASUGI MASAAKI |
| description | PROBLEM TO BE SOLVED: To provide a transport device capable of precisely transporting a substrate under a reduced pressure environment.SOLUTION: A transport device includes: a hollow chamber part 2 having multiple wall parts 21, 22, and 23 and having a closed space formed therein; a transport part 3 accommodated in the chamber part 2, having multiple transport rolls 30, and transporting a band-shaped substrate W by rotation of the transport roll 30 in a state of being brought into contact with the substrate W; an evacuation mechanism 5 reducing a pressure in an inner space of the chamber part 2; and a frame part 4 which have multiple legs, and are fixed or mounted on the inside of the chamber part 2 by bringing the legs into contact with the wall parts. All the transport rolls 30 are connected to the frame part 4.SELECTED DRAWING: Figure 1
【課題】減圧環境下で基材を精度良く搬送することができる搬送装置の提供。【解決手段】複数の壁部２１，２２，２３を有し、内部に密閉空間を形成する中空のチャンバー部２と、チャンバー部２に収容され、複数の搬送ロール３０を有し、当該搬送ロール３０が帯状の基材Ｗと当接している状態で回転することにより基材Ｗを搬送する搬送部３と、チャンバー部２の内部空間を減圧する減圧機構５と、複数の脚部を有し、当該脚部が前記壁部に当接することによりチャンバー部２の内部に載置もしくは固定されるフレーム部４と、を備え、全ての搬送ロール３０はフレーム部４に連結されている搬送装置。【選択図】図１ |
| format | Patent |
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【課題】減圧環境下で基材を精度良く搬送することができる搬送装置の提供。【解決手段】複数の壁部２１，２２，２３を有し、内部に密閉空間を形成する中空のチャンバー部２と、チャンバー部２に収容され、複数の搬送ロール３０を有し、当該搬送ロール３０が帯状の基材Ｗと当接している状態で回転することにより基材Ｗを搬送する搬送部３と、チャンバー部２の内部空間を減圧する減圧機構５と、複数の脚部を有し、当該脚部が前記壁部に当接することによりチャンバー部２の内部に載置もしくは固定されるフレーム部４と、を備え、全ての搬送ロール３０はフレーム部４に連結されている搬送装置。【選択図】図１</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160901&DB=EPODOC&CC=JP&NR=2016156052A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160901&DB=EPODOC&CC=JP&NR=2016156052A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TERASHI SEIJI</creatorcontrib><creatorcontrib>KAWASUGI MASAAKI</creatorcontrib><title>TRANSPORT DEVICE</title><description>PROBLEM TO BE SOLVED: To provide a transport device capable of precisely transporting a substrate under a reduced pressure environment.SOLUTION: A transport device includes: a hollow chamber part 2 having multiple wall parts 21, 22, and 23 and having a closed space formed therein; a transport part 3 accommodated in the chamber part 2, having multiple transport rolls 30, and transporting a band-shaped substrate W by rotation of the transport roll 30 in a state of being brought into contact with the substrate W; an evacuation mechanism 5 reducing a pressure in an inner space of the chamber part 2; and a frame part 4 which have multiple legs, and are fixed or mounted on the inside of the chamber part 2 by bringing the legs into contact with the wall parts. All the transport rolls 30 are connected to the frame part 4.SELECTED DRAWING: Figure 1
【課題】減圧環境下で基材を精度良く搬送することができる搬送装置の提供。【解決手段】複数の壁部２１，２２，２３を有し、内部に密閉空間を形成する中空のチャンバー部２と、チャンバー部２に収容され、複数の搬送ロール３０を有し、当該搬送ロール３０が帯状の基材Ｗと当接している状態で回転することにより基材Ｗを搬送する搬送部３と、チャンバー部２の内部空間を減圧する減圧機構５と、複数の脚部を有し、当該脚部が前記壁部に当接することによりチャンバー部２の内部に載置もしくは固定されるフレーム部４と、を備え、全ての搬送ロール３０はフレーム部４に連結されている搬送装置。【選択図】図１</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAICXL0Cw7wDwpRcHEN83R25WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGZoamZgamRo7GRCkCAEXvHgA</recordid><startdate>20160901</startdate><enddate>20160901</enddate><creator>TERASHI SEIJI</creator><creator>KAWASUGI MASAAKI</creator><scope>EVB</scope></search><sort><creationdate>20160901</creationdate><title>TRANSPORT DEVICE</title><author>TERASHI SEIJI ; KAWASUGI MASAAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016156052A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>TERASHI SEIJI</creatorcontrib><creatorcontrib>KAWASUGI MASAAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TERASHI SEIJI</au><au>KAWASUGI MASAAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRANSPORT DEVICE</title><date>2016-09-01</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To provide a transport device capable of precisely transporting a substrate under a reduced pressure environment.SOLUTION: A transport device includes: a hollow chamber part 2 having multiple wall parts 21, 22, and 23 and having a closed space formed therein; a transport part 3 accommodated in the chamber part 2, having multiple transport rolls 30, and transporting a band-shaped substrate W by rotation of the transport roll 30 in a state of being brought into contact with the substrate W; an evacuation mechanism 5 reducing a pressure in an inner space of the chamber part 2; and a frame part 4 which have multiple legs, and are fixed or mounted on the inside of the chamber part 2 by bringing the legs into contact with the wall parts. All the transport rolls 30 are connected to the frame part 4.SELECTED DRAWING: Figure 1
【課題】減圧環境下で基材を精度良く搬送することができる搬送装置の提供。【解決手段】複数の壁部２１，２２，２３を有し、内部に密閉空間を形成する中空のチャンバー部２と、チャンバー部２に収容され、複数の搬送ロール３０を有し、当該搬送ロール３０が帯状の基材Ｗと当接している状態で回転することにより基材Ｗを搬送する搬送部３と、チャンバー部２の内部空間を減圧する減圧機構５と、複数の脚部を有し、当該脚部が前記壁部に当接することによりチャンバー部２の内部に載置もしくは固定されるフレーム部４と、を備え、全ての搬送ロール３０はフレーム部４に連結されている搬送装置。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | TRANSPORT DEVICE |
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