CONSTANT DARKNESS TYPE CULTIVATION SYSTEM, HETEROTROPIC CULTIVATION CROP, AND CULTIVATION METHOD OF THE SAME

PROBLEM TO BE SOLVED: To provide a high-practicability plant cultivation process control method by a reactive engineering method, particularly to provide a cultivation system or the like capable of producing sprout vegetable and other heterotropic crop at a low cost and efficiently in a plant factor...

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Hauptverfasser: TSUKADA YOSHIHIRO, TAKAHASHI YOSHIO, ESASHI MASAHIRO, ISHIKAWA DAITARO, TAMATE HARUKA, ENDO TAKAHIRO, NAKAI RAN, NAKAMORI YASUYUKI, FUJII TOMOYUKI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a high-practicability plant cultivation process control method by a reactive engineering method, particularly to provide a cultivation system or the like capable of producing sprout vegetable and other heterotropic crop at a low cost and efficiently in a plant factory or the like.SOLUTION: A constant darkness type cultivation system 10 comprises a feedback control system 5 which measures a cultivation condition in a cultivation chamber 1 and performs control based on the condition, in which the cultivation chamber 1 comprises flow-down type sprinkling means 2 and one or a plurality of mounting parts 3 which mount an object to be cultivated thereon, the feedback control system 5 comprises measurement means and control means 8, the measurement means includes temperature measurement means 6 and gas concentration measurement means 7, and the control means 8 is designed to control a sprinkling condition of the sprinkling means 2 based on a measurement result. The gas concentration measurement means 7 measures at least oxygen concentration.SELECTED DRAWING: Figure 1 【課題】 反応工学的手法による実用性の高い植物栽培プロセス制御方法を提供すること。特に、植物工場等において低コストでかつ効率的に発芽野菜その他の従属栄養型作物を生産することのできる栽培システム等を提供すること。【解決手段】 恒暗型栽培システム10は、栽培室1内の栽培条件を測定してそれに基づく制御を行うフィードバック制御系5を備えてなる栽培システムであって、栽培室1は流下式の散水手段2と、被栽培物を載置する一または複数の載置部3とを備え、フィードバック制御系5は測定手段と制御手段8とを備え、測定手段には温度測定手段6およびガス濃度測定手段7が含まれ、制御手段8は測定結果に基づき散水手段2の散水条件を制御するようになされている構成とする。ガス濃度測定手段7は少なくとも酸素濃度を測定する。【選択図】 図1