RETICLE TRANSMISSIVITY MEASURING METHOD, PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD
PROBLEM TO BE SOLVED: To provide a method for calculating reticle transmissivity without impairing productivity even for a pattern having any features as measures to cope with out-of-focus caused by lens expansion with increase of an exposure load in a projection exposure device.SOLUTION: When using...
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| creator | GOMI YUTAKA MURATA MICHIHIRO |
| description | PROBLEM TO BE SOLVED: To provide a method for calculating reticle transmissivity without impairing productivity even for a pattern having any features as measures to cope with out-of-focus caused by lens expansion with increase of an exposure load in a projection exposure device.SOLUTION: When using a reticle for the first time, the reticle is actually put into a device and oblique measurement/random measurement is performed. Therefore, even without increasing the number of times of sampling, the risk of erroneous sampling can be avoided and the entire reticle that is a mother group can be captured. A fixed measurement spot size is made variable and an incidence angle is changed in accordance with the measurement spot size, thereby also obtaining similar effects.SELECTED DRAWING: Figure 3
【課題】投影露光装置における露光負荷の増加に伴うレンズ膨張に起因するフォーカスずれの対策として、いかなる特徴をもつパターンであっても、生産性を損なわずに、レチクル透過率を求める方法を提供することにある。【解決手段】初回レチクルを使用する時に、実際にレチクルを装置に入れて、斜め測定・ランダム測定を行うことによって、サンプリング数を増やさずとも、偏ったサンプリングの危険性が回避でき、母集団であるレチクル全体を捉えることが可能となる。また、固定となっている計測スポットサイズを可変とし、この計測スポットサイズに応じた入射角度の変更を行うことによって、同様の効果を得ることも可能となる。【選択図】図３ |
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【課題】投影露光装置における露光負荷の増加に伴うレンズ膨張に起因するフォーカスずれの対策として、いかなる特徴をもつパターンであっても、生産性を損なわずに、レチクル透過率を求める方法を提供することにある。【解決手段】初回レチクルを使用する時に、実際にレチクルを装置に入れて、斜め測定・ランダム測定を行うことによって、サンプリング数を増やさずとも、偏ったサンプリングの危険性が回避でき、母集団であるレチクル全体を捉えることが可能となる。また、固定となっている計測スポットサイズを可変とし、この計測スポットサイズに応じた入射角度の変更を行うことによって、同様の効果を得ることも可能となる。【選択図】図３</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MATERIALS THEREFOR ; MEASURING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160509&DB=EPODOC&CC=JP&NR=2016072598A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160509&DB=EPODOC&CC=JP&NR=2016072598A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GOMI YUTAKA</creatorcontrib><creatorcontrib>MURATA MICHIHIRO</creatorcontrib><title>RETICLE TRANSMISSIVITY MEASURING METHOD, PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD</title><description>PROBLEM TO BE SOLVED: To provide a method for calculating reticle transmissivity without impairing productivity even for a pattern having any features as measures to cope with out-of-focus caused by lens expansion with increase of an exposure load in a projection exposure device.SOLUTION: When using a reticle for the first time, the reticle is actually put into a device and oblique measurement/random measurement is performed. Therefore, even without increasing the number of times of sampling, the risk of erroneous sampling can be avoided and the entire reticle that is a mother group can be captured. A fixed measurement spot size is made variable and an incidence angle is changed in accordance with the measurement spot size, thereby also obtaining similar effects.SELECTED DRAWING: Figure 3
【課題】投影露光装置における露光負荷の増加に伴うレンズ膨張に起因するフォーカスずれの対策として、いかなる特徴をもつパターンであっても、生産性を損なわずに、レチクル透過率を求める方法を提供することにある。【解決手段】初回レチクルを使用する時に、実際にレチクルを装置に入れて、斜め測定・ランダム測定を行うことによって、サンプリング数を増やさずとも、偏ったサンプリングの危険性が回避でき、母集団であるレチクル全体を捉えることが可能となる。また、固定となっている計測スポットサイズを可変とし、この計測スポットサイズに応じた入射角度の変更を行うことによって、同様の効果を得ることも可能となる。【選択図】図３</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgKcg3xdPZxVQgJcvQL9vUMDvYM8wyJVPB1dQwODfL0cweyQjz8XXQUAoL8vVydQzz9_RRcIwL8gbKuCi6uYZ7OrgqOfi5YpSFaeRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGhmYG5kamlhaMxUYoAwCE1Og</recordid><startdate>20160509</startdate><enddate>20160509</enddate><creator>GOMI YUTAKA</creator><creator>MURATA MICHIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20160509</creationdate><title>RETICLE TRANSMISSIVITY MEASURING METHOD, PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD</title><author>GOMI YUTAKA ; MURATA MICHIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016072598A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GOMI YUTAKA</creatorcontrib><creatorcontrib>MURATA MICHIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GOMI YUTAKA</au><au>MURATA MICHIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RETICLE TRANSMISSIVITY MEASURING METHOD, PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD</title><date>2016-05-09</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method for calculating reticle transmissivity without impairing productivity even for a pattern having any features as measures to cope with out-of-focus caused by lens expansion with increase of an exposure load in a projection exposure device.SOLUTION: When using a reticle for the first time, the reticle is actually put into a device and oblique measurement/random measurement is performed. Therefore, even without increasing the number of times of sampling, the risk of erroneous sampling can be avoided and the entire reticle that is a mother group can be captured. A fixed measurement spot size is made variable and an incidence angle is changed in accordance with the measurement spot size, thereby also obtaining similar effects.SELECTED DRAWING: Figure 3
【課題】投影露光装置における露光負荷の増加に伴うレンズ膨張に起因するフォーカスずれの対策として、いかなる特徴をもつパターンであっても、生産性を損なわずに、レチクル透過率を求める方法を提供することにある。【解決手段】初回レチクルを使用する時に、実際にレチクルを装置に入れて、斜め測定・ランダム測定を行うことによって、サンプリング数を増やさずとも、偏ったサンプリングの危険性が回避でき、母集団であるレチクル全体を捉えることが可能となる。また、固定となっている計測スポットサイズを可変とし、この計測スポットサイズに応じた入射角度の変更を行うことによって、同様の効果を得ることも可能となる。【選択図】図３</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | RETICLE TRANSMISSIVITY MEASURING METHOD, PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD |
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