COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a novel photoresist composition useful for immersion lithography with reduced blob defects.SOLUTION: A photoresist composition comprises one or more resins, a photoactive component, and one or more materials that comprise (A) one or more base reactive groups and (B)...

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Bibliographische Detailangaben
Hauptverfasser:	CHENG BAI SU, WANG DEYAN, KONG LIU, LI MINGQI, DORIS H KUNG, MATTHIAS S OBER, OH JUNG-SOK, CLARK H COMINS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a novel photoresist composition useful for immersion lithography with reduced blob defects.SOLUTION: A photoresist composition comprises one or more resins, a photoactive component, and one or more materials that comprise (A) one or more base reactive groups and (B) one or more polar groups distinct from the base reactive groups.SELECTED DRAWING: None 【課題】液浸リソグラフィに有用なブロブ欠陥が低減された新規フォトレジスト組成物の提供。【解決手段】１種以上の樹脂、光活性成分、および（Ａ）１以上の塩基反応性基および（Ｂ）前記塩基反応性基とは異なる１以上の極性基を含む１種以上の材料を含むフォトレジスト組成物。【選択図】なし