PROCESSING DEVICE

PROBLEM TO BE SOLVED: To provide a processing device that allows waste fluid to be reused while suppressing expansion of size of the device to a minimum.SOLUTION: A device main body (10) of a processing device (1) is provided with processing means (21) that processes a work-piece (W) while injecting...

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Bibliographische Detailangaben
Hauptverfasser: MORI TAKASHI, TAJIRI KAZUTAKA
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a processing device that allows waste fluid to be reused while suppressing expansion of size of the device to a minimum.SOLUTION: A device main body (10) of a processing device (1) is provided with processing means (21) that processes a work-piece (W) while injecting pure water and control means (40) that integrally controls the whole of the device. Reproducing means (50) that reproduces the pure water by collecting processing waste fluid to be discharged by processing the work-piece is externally attached to and unitized with the device main body, and switching between driving and stopping of the reproducing means is controlled in the control means of the device main body.SELECTED DRAWING: Figure 2 【課題】装置サイズの拡張を最小限に抑えつつ、加工廃液を再利用すること。【解決手段】加工装置(1)の装置本体(10)には、純水を噴射しながら被加工物(W)を加工する加工手段(21)と、装置全体を統括制御する制御手段(40)とが設けられ、被加工物の加工によって出される加工廃液を回収して純水を再生する再生手段(50)が装置本体に対して外付けユニット化されており、装置本体の制御手段において再生手段の駆動と停止を切換制御する構成にした。【選択図】図2