PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER
PROBLEM TO BE SOLVED: To provide a production method of a photosensitive resin composition for a color filter, in which a pigment is finely dispersed in high concentration to allow high-definition photolithography and defects due to the presence of foreign substances are substantially prevented.SOLU...
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| creator | ONUMA AMI YAMADA HIROAKI |
| description | PROBLEM TO BE SOLVED: To provide a production method of a photosensitive resin composition for a color filter, in which a pigment is finely dispersed in high concentration to allow high-definition photolithography and defects due to the presence of foreign substances are substantially prevented.SOLUTION: The production method of a photosensitive resin composition for a color filter includes: a first step of dispersing (C) a pigment in a dispersion medium to obtain an average particle diameter of 50 nm or less of the pigment, wherein the dispersion medium comprises (A) a compound obtained by allowing a cyclic acid anhydride to react with a hydroxy group-containing compound that is obtained by the reaction of a bisphenol fluorene type epoxy compound and an ethylenically unsaturated bond group-containing carboxylic acid, (B) a dispersant, and (Z) a solvent; a second step of compounding (D) a polymerizable monomer having at least one ethylenically unsaturated bond and (E) a photopolymerization initiator into the dispersion liquid obtained in the first step; and a third step of filtering the dispersion liquid obtained in the second step with a filtration accuracy smaller than a film thickness of a cured film to be formed by using the dispersion liquid.SELECTED DRAWING: None
【課題】顔料を高濃度で微分散させたうえで高精細なフォトリソグラフィーが可能であり、更には異物の存在による欠陥が生じにくいカラーフィルター用感光性樹脂組成物の製造方法を提供すること。【解決手段】（Ａ）ビスフェノールフルオレン型エポキシ化合物とエチレン性不飽和結合基含有カルボン酸とを反応させたヒドロキシ基含有化合物に対して環状酸無水物を反応させて得られた化合物、（Ｂ）分散剤、及び（Ｚ）溶剤を含有する分散媒に、（Ｃ）顔料をその平均粒径が５０ｎｍ以下となるように分散する第一工程、第一工程で得られた分散液に（Ｄ）少なくとも１個のエチレン性不飽和結合を有する重合性モノマー、及び（Ｅ）光重合開始剤を配合する第二工程、第二工程で得られた分散液を、それを用いて形成する硬化膜の膜厚よりも小さい濾過精度で濾過する第三工程、を含むカラーフィルター用感光性樹脂組成物の製造方法である。【選択図】なし |
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【課題】顔料を高濃度で微分散させたうえで高精細なフォトリソグラフィーが可能であり、更には異物の存在による欠陥が生じにくいカラーフィルター用感光性樹脂組成物の製造方法を提供すること。【解決手段】（Ａ）ビスフェノールフルオレン型エポキシ化合物とエチレン性不飽和結合基含有カルボン酸とを反応させたヒドロキシ基含有化合物に対して環状酸無水物を反応させて得られた化合物、（Ｂ）分散剤、及び（Ｚ）溶剤を含有する分散媒に、（Ｃ）顔料をその平均粒径が５０ｎｍ以下となるように分散する第一工程、第一工程で得られた分散液に（Ｄ）少なくとも１個のエチレン性不飽和結合を有する重合性モノマー、及び（Ｅ）光重合開始剤を配合する第二工程、第二工程で得られた分散液を、それを用いて形成する硬化膜の膜厚よりも小さい濾過精度で濾過する第三工程、を含むカラーフィルター用感光性樹脂組成物の製造方法である。【選択図】なし</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160201&DB=EPODOC&CC=JP&NR=2016018204A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160201&DB=EPODOC&CC=JP&NR=2016018204A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ONUMA AMI</creatorcontrib><creatorcontrib>YAMADA HIROAKI</creatorcontrib><title>PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER</title><description>PROBLEM TO BE SOLVED: To provide a production method of a photosensitive resin composition for a color filter, in which a pigment is finely dispersed in high concentration to allow high-definition photolithography and defects due to the presence of foreign substances are substantially prevented.SOLUTION: The production method of a photosensitive resin composition for a color filter includes: a first step of dispersing (C) a pigment in a dispersion medium to obtain an average particle diameter of 50 nm or less of the pigment, wherein the dispersion medium comprises (A) a compound obtained by allowing a cyclic acid anhydride to react with a hydroxy group-containing compound that is obtained by the reaction of a bisphenol fluorene type epoxy compound and an ethylenically unsaturated bond group-containing carboxylic acid, (B) a dispersant, and (Z) a solvent; a second step of compounding (D) a polymerizable monomer having at least one ethylenically unsaturated bond and (E) a photopolymerization initiator into the dispersion liquid obtained in the first step; and a third step of filtering the dispersion liquid obtained in the second step with a filtration accuracy smaller than a film thickness of a cured film to be formed by using the dispersion liquid.SELECTED DRAWING: None
【課題】顔料を高濃度で微分散させたうえで高精細なフォトリソグラフィーが可能であり、更には異物の存在による欠陥が生じにくいカラーフィルター用感光性樹脂組成物の製造方法を提供すること。【解決手段】（Ａ）ビスフェノールフルオレン型エポキシ化合物とエチレン性不飽和結合基含有カルボン酸とを反応させたヒドロキシ基含有化合物に対して環状酸無水物を反応させて得られた化合物、（Ｂ）分散剤、及び（Ｚ）溶剤を含有する分散媒に、（Ｃ）顔料をその平均粒径が５０ｎｍ以下となるように分散する第一工程、第一工程で得られた分散液に（Ｄ）少なくとも１個のエチレン性不飽和結合を有する重合性モノマー、及び（Ｅ）光重合開始剤を配合する第二工程、第二工程で得られた分散液を、それを用いて形成する硬化膜の膜厚よりも小さい濾過精度で濾過する第三工程、を含むカラーフィルター用感光性樹脂組成物の製造方法である。【選択図】なし</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgNCPJ3CXUO8fT3U_B1DfHwd1Hwd1MI8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJAJW6-QcB-T5A0s3TJ8Q1SEfB0c-FdG08DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTeK8DIwNDMwNDCyMDE0ZgoRQC2WjyO</recordid><startdate>20160201</startdate><enddate>20160201</enddate><creator>ONUMA AMI</creator><creator>YAMADA HIROAKI</creator><scope>EVB</scope></search><sort><creationdate>20160201</creationdate><title>PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER</title><author>ONUMA AMI ; YAMADA HIROAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016018204A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>ONUMA AMI</creatorcontrib><creatorcontrib>YAMADA HIROAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ONUMA AMI</au><au>YAMADA HIROAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER</title><date>2016-02-01</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To provide a production method of a photosensitive resin composition for a color filter, in which a pigment is finely dispersed in high concentration to allow high-definition photolithography and defects due to the presence of foreign substances are substantially prevented.SOLUTION: The production method of a photosensitive resin composition for a color filter includes: a first step of dispersing (C) a pigment in a dispersion medium to obtain an average particle diameter of 50 nm or less of the pigment, wherein the dispersion medium comprises (A) a compound obtained by allowing a cyclic acid anhydride to react with a hydroxy group-containing compound that is obtained by the reaction of a bisphenol fluorene type epoxy compound and an ethylenically unsaturated bond group-containing carboxylic acid, (B) a dispersant, and (Z) a solvent; a second step of compounding (D) a polymerizable monomer having at least one ethylenically unsaturated bond and (E) a photopolymerization initiator into the dispersion liquid obtained in the first step; and a third step of filtering the dispersion liquid obtained in the second step with a filtration accuracy smaller than a film thickness of a cured film to be formed by using the dispersion liquid.SELECTED DRAWING: None
【課題】顔料を高濃度で微分散させたうえで高精細なフォトリソグラフィーが可能であり、更には異物の存在による欠陥が生じにくいカラーフィルター用感光性樹脂組成物の製造方法を提供すること。【解決手段】（Ａ）ビスフェノールフルオレン型エポキシ化合物とエチレン性不飽和結合基含有カルボン酸とを反応させたヒドロキシ基含有化合物に対して環状酸無水物を反応させて得られた化合物、（Ｂ）分散剤、及び（Ｚ）溶剤を含有する分散媒に、（Ｃ）顔料をその平均粒径が５０ｎｍ以下となるように分散する第一工程、第一工程で得られた分散液に（Ｄ）少なくとも１個のエチレン性不飽和結合を有する重合性モノマー、及び（Ｅ）光重合開始剤を配合する第二工程、第二工程で得られた分散液を、それを用いて形成する硬化膜の膜厚よりも小さい濾過精度で濾過する第三工程、を含むカラーフィルター用感光性樹脂組成物の製造方法である。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER |
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