ABRASIVE PAD AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide an abrasive pad capable of remarkably reducing the occurrence of defects of a polished object, an abrasive pad excellent in polishing stability, and a method for manufacturing the abrasive pads.SOLUTION: According to one embodiment, an urethane foam sheet showing neg...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TATENO TEPPEI, MIYASAKA HIROHITO, MATSUOKA RYUMA, SAEKI TAKU, KIRAKU YOSHIE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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