HARD COAT FILM, TRANSPARENT CONDUCTIVE FILM, AND CAPACITIVE TOUCH PANEL
PROBLEM TO BE SOLVED: To provide a hard coat film that prevents blocking between hard coat films and has excellent adhesiveness, and a transparent conductive film and a capacitive touch panel including the hard coat film.SOLUTION: The hard coat film has a hard coat layer disposed on at least one sur...
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| creator | SATO KEIICHI WATANABE TAKUZO |
| description | PROBLEM TO BE SOLVED: To provide a hard coat film that prevents blocking between hard coat films and has excellent adhesiveness, and a transparent conductive film and a capacitive touch panel including the hard coat film.SOLUTION: The hard coat film has a hard coat layer disposed on at least one surface of a substrate film; and the hard coat layer is formed of a cured product of a hard coat layer-forming material comprising at least (A) an energy ray-curable resin, (B) a hydrophobized silica sol, and (C) a silicone-based levelling agent. The (B) hydrophobized silica sol is unevenly present on an opposite surface side of the hard coat layer after cured to the substrate film. In a region from the outermost surface of the hard coat film to a position at 5 nm depth, the concentration of silicon atoms measured by XPS analysis in a depth direction is 0.2 to 1.95 atom% with respect to the total amount of carbon atoms, oxygen atoms, and silicon atoms.
【課題】ハードコートフィルム同士のブロッキングを防止し、接着性に優れたハードコートフィルムおよびそのようなハードコートフィルムを備えた透明導電性フィルムおよび静電容量タッチパネルを提供する。【解決手段】基材フィルムの少なくとも片面にハードコート層を備えたハードコートフィルムであって、ハードコート層が、少なくとも（Ａ）エネルギー線硬化性樹脂と、（Ｂ）疎水化シリカゾルと、（Ｃ）シリコーン系レベリング剤とを含むハードコート層形成材料の硬化物からなり、（Ｂ）疎水化シリカゾルが、ハードコート層形成材料を硬化した後のハードコート層の、基材フィルムとは反対の表面側に偏在しており、ハードコートフィルムの最表面から５ｎｍの位置までの領域において、深さ方向のＸＰＳ分析によって測定される炭素原子、酸素原子、ケイ素原子の合計量に対して、ケイ素原子濃度が０．２〜１.９５ａｔｏｍ％範囲内の値である。【選択図】図３ |
| format | Patent |
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【課題】ハードコートフィルム同士のブロッキングを防止し、接着性に優れたハードコートフィルムおよびそのようなハードコートフィルムを備えた透明導電性フィルムおよび静電容量タッチパネルを提供する。【解決手段】基材フィルムの少なくとも片面にハードコート層を備えたハードコートフィルムであって、ハードコート層が、少なくとも（Ａ）エネルギー線硬化性樹脂と、（Ｂ）疎水化シリカゾルと、（Ｃ）シリコーン系レベリング剤とを含むハードコート層形成材料の硬化物からなり、（Ｂ）疎水化シリカゾルが、ハードコート層形成材料を硬化した後のハードコート層の、基材フィルムとは反対の表面側に偏在しており、ハードコートフィルムの最表面から５ｎｍの位置までの領域において、深さ方向のＸＰＳ分析によって測定される炭素原子、酸素原子、ケイ素原子の合計量に対して、ケイ素原子濃度が０．２〜１.９５ａｔｏｍ％範囲内の値である。【選択図】図３</description><language>eng ; jpn</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING-UP</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151022&DB=EPODOC&CC=JP&NR=2015183168A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151022&DB=EPODOC&CC=JP&NR=2015183168A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SATO KEIICHI</creatorcontrib><creatorcontrib>WATANABE TAKUZO</creatorcontrib><title>HARD COAT FILM, TRANSPARENT CONDUCTIVE FILM, AND CAPACITIVE TOUCH PANEL</title><description>PROBLEM TO BE SOLVED: To provide a hard coat film that prevents blocking between hard coat films and has excellent adhesiveness, and a transparent conductive film and a capacitive touch panel including the hard coat film.SOLUTION: The hard coat film has a hard coat layer disposed on at least one surface of a substrate film; and the hard coat layer is formed of a cured product of a hard coat layer-forming material comprising at least (A) an energy ray-curable resin, (B) a hydrophobized silica sol, and (C) a silicone-based levelling agent. The (B) hydrophobized silica sol is unevenly present on an opposite surface side of the hard coat layer after cured to the substrate film. In a region from the outermost surface of the hard coat film to a position at 5 nm depth, the concentration of silicon atoms measured by XPS analysis in a depth direction is 0.2 to 1.95 atom% with respect to the total amount of carbon atoms, oxygen atoms, and silicon atoms.
【課題】ハードコートフィルム同士のブロッキングを防止し、接着性に優れたハードコートフィルムおよびそのようなハードコートフィルムを備えた透明導電性フィルムおよび静電容量タッチパネルを提供する。【解決手段】基材フィルムの少なくとも片面にハードコート層を備えたハードコートフィルムであって、ハードコート層が、少なくとも（Ａ）エネルギー線硬化性樹脂と、（Ｂ）疎水化シリカゾルと、（Ｃ）シリコーン系レベリング剤とを含むハードコート層形成材料の硬化物からなり、（Ｂ）疎水化シリカゾルが、ハードコート層形成材料を硬化した後のハードコート層の、基材フィルムとは反対の表面側に偏在しており、ハードコートフィルムの最表面から５ｎｍの位置までの領域において、深さ方向のＸＰＳ分析によって測定される炭素原子、酸素原子、ケイ素原子の合計量に対して、ケイ素原子濃度が０．２〜１.９５ａｔｏｍ％範囲内の値である。【選択図】図３</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PERFORMING OPERATIONS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD3cAxyUXD2dwxRcPP08dVRCAly9AsOcAxy9QsBCvu5hDqHeIa5QiUd_YBqHQMcnT3BgiH-oc4eCgGOfq4-PAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3ivAyMDQ1NDC2NDMwtGYKEUA-ZUsmw</recordid><startdate>20151022</startdate><enddate>20151022</enddate><creator>SATO KEIICHI</creator><creator>WATANABE TAKUZO</creator><scope>EVB</scope></search><sort><creationdate>20151022</creationdate><title>HARD COAT FILM, TRANSPARENT CONDUCTIVE FILM, AND CAPACITIVE TOUCH PANEL</title><author>SATO KEIICHI ; WATANABE TAKUZO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2015183168A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2015</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>SATO KEIICHI</creatorcontrib><creatorcontrib>WATANABE TAKUZO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SATO KEIICHI</au><au>WATANABE TAKUZO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>HARD COAT FILM, TRANSPARENT CONDUCTIVE FILM, AND CAPACITIVE TOUCH PANEL</title><date>2015-10-22</date><risdate>2015</risdate><abstract>PROBLEM TO BE SOLVED: To provide a hard coat film that prevents blocking between hard coat films and has excellent adhesiveness, and a transparent conductive film and a capacitive touch panel including the hard coat film.SOLUTION: The hard coat film has a hard coat layer disposed on at least one surface of a substrate film; and the hard coat layer is formed of a cured product of a hard coat layer-forming material comprising at least (A) an energy ray-curable resin, (B) a hydrophobized silica sol, and (C) a silicone-based levelling agent. The (B) hydrophobized silica sol is unevenly present on an opposite surface side of the hard coat layer after cured to the substrate film. In a region from the outermost surface of the hard coat film to a position at 5 nm depth, the concentration of silicon atoms measured by XPS analysis in a depth direction is 0.2 to 1.95 atom% with respect to the total amount of carbon atoms, oxygen atoms, and silicon atoms.
【課題】ハードコートフィルム同士のブロッキングを防止し、接着性に優れたハードコートフィルムおよびそのようなハードコートフィルムを備えた透明導電性フィルムおよび静電容量タッチパネルを提供する。【解決手段】基材フィルムの少なくとも片面にハードコート層を備えたハードコートフィルムであって、ハードコート層が、少なくとも（Ａ）エネルギー線硬化性樹脂と、（Ｂ）疎水化シリカゾルと、（Ｃ）シリコーン系レベリング剤とを含むハードコート層形成材料の硬化物からなり、（Ｂ）疎水化シリカゾルが、ハードコート層形成材料を硬化した後のハードコート層の、基材フィルムとは反対の表面側に偏在しており、ハードコートフィルムの最表面から５ｎｍの位置までの領域において、深さ方向のＸＰＳ分析によって測定される炭素原子、酸素原子、ケイ素原子の合計量に対して、ケイ素原子濃度が０．２〜１.９５ａｔｏｍ％範囲内の値である。【選択図】図３</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP |
| title | HARD COAT FILM, TRANSPARENT CONDUCTIVE FILM, AND CAPACITIVE TOUCH PANEL |
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