MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR PROJECTION LENS

PROBLEM TO BE SOLVED: To improve a projection exposure apparatus such that imaging defects resulting from inhomogeneities of the refractive index within the immersion liquid are reduced.SOLUTION: A microlithographic projection exposure apparatus includes a projection lens (20) that is configured for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MALLMANN JOERG, WEGMANN ULRICH, EHRMANN ALBRECHT, SCHUSTER KARL HEINZ, HOCH RAINER
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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