NEUTRAL PARTICLE BEAM GENERATING SOURCE INCLUDING BELT TYPE MAGNET
PROBLEM TO BE SOLVED: To provide a neutral particle beam generating source that generates uniform high density plasma under a high degree of vacuum.SOLUTION: A neutral particle beam generating source includes: a plasma chamber 100 that provides a plasma discharging space; a neutralizing reflecting p...
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| creator | YU SOK JAE KIM SEONG BONG |
| description | PROBLEM TO BE SOLVED: To provide a neutral particle beam generating source that generates uniform high density plasma under a high degree of vacuum.SOLUTION: A neutral particle beam generating source includes: a plasma chamber 100 that provides a plasma discharging space; a neutralizing reflecting plate 300 installed in the plasma chamber 100 to change a plasma ion into a neutral particle by collision; a limiter 500 installed on a lower end of the plasma discharging space to limit a plasma ion and an electron except a neutral particle to the plasma discharging space; a microwave irradiating apparatus 200 mounted on the plasma chamber 100 to emit a microwave into the plasma chamber 100; and a pair of belt type magnet 400 surrounding a periphery of the plasma chamber 100. Each of the pair of belt type magnet 400 shows complementary magnetism polarity between inside and outside of the belt, and magnetism polarity of the two belt type magnets 400 arranged vertically in parallel around the plasma chamber 100 is also constituted so that they complement each other at upper and lower positions.
【課題】高真空度において均一な高密度プラズマを発生させる中性粒子ビーム発生源を提供する。【解決手段】プラズマ放電空間を提供するプラズマチャンバ１００、プラズマイオンを、衝突によって中性粒子に変換させるために、プラズマチャンバ１００内部に設置された中和プレート３００、中性粒子以外のプラズマイオンと電子を上記プラズマ放電空間に制限するよう、上記プラズマ放電空間の下端に設置されているリミッタ５００、プラズマチャンバ１００に装着され、プラズマチャンバ１００内にマイクロ波を出射するマイクロ波照射装置２００、プラズマチャンバ１００の周囲を囲む一組のベルト型磁石４００を含み、の一組のベルト型磁石４００のそれぞれは、ベルトの内部と外部が相補的な磁力極性を示し、プラズマチャンバ１００の周囲に上下平行に配列される２つのベルト型磁石４００の磁力の極性も、上下の位置において互いに補うよう構成する。【選択図】図８ |
| format | Patent |
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【課題】高真空度において均一な高密度プラズマを発生させる中性粒子ビーム発生源を提供する。【解決手段】プラズマ放電空間を提供するプラズマチャンバ１００、プラズマイオンを、衝突によって中性粒子に変換させるために、プラズマチャンバ１００内部に設置された中和プレート３００、中性粒子以外のプラズマイオンと電子を上記プラズマ放電空間に制限するよう、上記プラズマ放電空間の下端に設置されているリミッタ５００、プラズマチャンバ１００に装着され、プラズマチャンバ１００内にマイクロ波を出射するマイクロ波照射装置２００、プラズマチャンバ１００の周囲を囲む一組のベルト型磁石４００を含み、の一組のベルト型磁石４００のそれぞれは、ベルトの内部と外部が相補的な磁力極性を示し、プラズマチャンバ１００の周囲に上下平行に配列される２つのベルト型磁石４００の磁力の極性も、上下の位置において互いに補うよう構成する。【選択図】図８</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150723&DB=EPODOC&CC=JP&NR=2015133321A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150723&DB=EPODOC&CC=JP&NR=2015133321A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YU SOK JAE</creatorcontrib><creatorcontrib>KIM SEONG BONG</creatorcontrib><title>NEUTRAL PARTICLE BEAM GENERATING SOURCE INCLUDING BELT TYPE MAGNET</title><description>PROBLEM TO BE SOLVED: To provide a neutral particle beam generating source that generates uniform high density plasma under a high degree of vacuum.SOLUTION: A neutral particle beam generating source includes: a plasma chamber 100 that provides a plasma discharging space; a neutralizing reflecting plate 300 installed in the plasma chamber 100 to change a plasma ion into a neutral particle by collision; a limiter 500 installed on a lower end of the plasma discharging space to limit a plasma ion and an electron except a neutral particle to the plasma discharging space; a microwave irradiating apparatus 200 mounted on the plasma chamber 100 to emit a microwave into the plasma chamber 100; and a pair of belt type magnet 400 surrounding a periphery of the plasma chamber 100. Each of the pair of belt type magnet 400 shows complementary magnetism polarity between inside and outside of the belt, and magnetism polarity of the two belt type magnets 400 arranged vertically in parallel around the plasma chamber 100 is also constituted so that they complement each other at upper and lower positions.
【課題】高真空度において均一な高密度プラズマを発生させる中性粒子ビーム発生源を提供する。【解決手段】プラズマ放電空間を提供するプラズマチャンバ１００、プラズマイオンを、衝突によって中性粒子に変換させるために、プラズマチャンバ１００内部に設置された中和プレート３００、中性粒子以外のプラズマイオンと電子を上記プラズマ放電空間に制限するよう、上記プラズマ放電空間の下端に設置されているリミッタ５００、プラズマチャンバ１００に装着され、プラズマチャンバ１００内にマイクロ波を出射するマイクロ波照射装置２００、プラズマチャンバ１００の周囲を囲む一組のベルト型磁石４００を含み、の一組のベルト型磁石４００のそれぞれは、ベルトの内部と外部が相補的な磁力極性を示し、プラズマチャンバ１００の周囲に上下平行に配列される２つのベルト型磁石４００の磁力の極性も、上下の位置において互いに補うよう構成する。【選択図】図８</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDycw0NCXL0UQhwDArxdPZxVXBydfRVcHf1cw1yDPH0c1cI9g8NcnZV8PRz9gl1AQk4ufqEKIREBrgq-Dq6-7mG8DCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDU0NjY2MjQ0djohQBAE--K4I</recordid><startdate>20150723</startdate><enddate>20150723</enddate><creator>YU SOK JAE</creator><creator>KIM SEONG BONG</creator><scope>EVB</scope></search><sort><creationdate>20150723</creationdate><title>NEUTRAL PARTICLE BEAM GENERATING SOURCE INCLUDING BELT TYPE MAGNET</title><author>YU SOK JAE ; KIM SEONG BONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2015133321A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2015</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>YU SOK JAE</creatorcontrib><creatorcontrib>KIM SEONG BONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YU SOK JAE</au><au>KIM SEONG BONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NEUTRAL PARTICLE BEAM GENERATING SOURCE INCLUDING BELT TYPE MAGNET</title><date>2015-07-23</date><risdate>2015</risdate><abstract>PROBLEM TO BE SOLVED: To provide a neutral particle beam generating source that generates uniform high density plasma under a high degree of vacuum.SOLUTION: A neutral particle beam generating source includes: a plasma chamber 100 that provides a plasma discharging space; a neutralizing reflecting plate 300 installed in the plasma chamber 100 to change a plasma ion into a neutral particle by collision; a limiter 500 installed on a lower end of the plasma discharging space to limit a plasma ion and an electron except a neutral particle to the plasma discharging space; a microwave irradiating apparatus 200 mounted on the plasma chamber 100 to emit a microwave into the plasma chamber 100; and a pair of belt type magnet 400 surrounding a periphery of the plasma chamber 100. Each of the pair of belt type magnet 400 shows complementary magnetism polarity between inside and outside of the belt, and magnetism polarity of the two belt type magnets 400 arranged vertically in parallel around the plasma chamber 100 is also constituted so that they complement each other at upper and lower positions.
【課題】高真空度において均一な高密度プラズマを発生させる中性粒子ビーム発生源を提供する。【解決手段】プラズマ放電空間を提供するプラズマチャンバ１００、プラズマイオンを、衝突によって中性粒子に変換させるために、プラズマチャンバ１００内部に設置された中和プレート３００、中性粒子以外のプラズマイオンと電子を上記プラズマ放電空間に制限するよう、上記プラズマ放電空間の下端に設置されているリミッタ５００、プラズマチャンバ１００に装着され、プラズマチャンバ１００内にマイクロ波を出射するマイクロ波照射装置２００、プラズマチャンバ１００の周囲を囲む一組のベルト型磁石４００を含み、の一組のベルト型磁石４００のそれぞれは、ベルトの内部と外部が相補的な磁力極性を示し、プラズマチャンバ１００の周囲に上下平行に配列される２つのベルト型磁石４００の磁力の極性も、上下の位置において互いに補うよう構成する。【選択図】図８</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | NEUTRAL PARTICLE BEAM GENERATING SOURCE INCLUDING BELT TYPE MAGNET |
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