SYSTEM AND METHOD FOR PROGRAMMING WORKPIECE FEATURE INSPECTION OPERATIONS FOR COORDINATE MEASURING MACHINE
PROBLEM TO BE SOLVED: To provide a system and method for programming workpiece feature inspection operations for a coordinate measuring machine.SOLUTION: An editing environment for programming workpiece feature inspection operations for a coordinate measuring machine is operated to display a three-d...
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| creator | U TAIKAI TSEO ERIC YEH-WEI |
| description | PROBLEM TO BE SOLVED: To provide a system and method for programming workpiece feature inspection operations for a coordinate measuring machine.SOLUTION: An editing environment for programming workpiece feature inspection operations for a coordinate measuring machine is operated to display a three-dimensional workpiece representation including a first surface feature of a workpiece. A first feature surface sampling pattern is created having at least one pattern parameter adjusted to correspond to a first surface feature of the workpiece. User operations in a GUI further adjust pattern parameters of the sampling pattern. The further adjustment of the pattern parameters simultaneously affects a plurality of the sampling locations. The sampling pattern representation may include various types of operative and inoperative sampling locations, which may be displayed in a manner that distinguishes them from one another, such as by being represented with different colors, shapes or patterns.
【課題】座標測定機のワークピース要素検査動作をプログラミングするためのシステム及び方法を提供する。【解決手段】座標測定機のワークピース要素検査動作をプログラミングするための編集環境を動作させ、ワークピースの第１の表面要素を含む３次元ワークピース表現を表示させる。ワークピースの第１の表面要素に対応するように少なくとも１つのパターンパラメータが調節された第１の要素の表面サンプリングパターンを作成する。ＧＵＩでのユーザ操作が、サンプリングパターンのパターンパラメータを更に調節し、複数のサンプリング位置に同時に影響を及ぼす。サンプリングパターン表現は、様々な種類の有効なサンプリング位置及び無効なサンプリング位置を含むことができ、それらは異なる色、形状、又はパターンで表示することによって等、互いに区別する方法で表示することができる。【選択図】図２ |
| format | Patent |
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【課題】座標測定機のワークピース要素検査動作をプログラミングするためのシステム及び方法を提供する。【解決手段】座標測定機のワークピース要素検査動作をプログラミングするための編集環境を動作させ、ワークピースの第１の表面要素を含む３次元ワークピース表現を表示させる。ワークピースの第１の表面要素に対応するように少なくとも１つのパターンパラメータが調節された第１の要素の表面サンプリングパターンを作成する。ＧＵＩでのユーザ操作が、サンプリングパターンのパターンパラメータを更に調節し、複数のサンプリング位置に同時に影響を及ぼす。サンプリングパターン表現は、様々な種類の有効なサンプリング位置及び無効なサンプリング位置を含むことができ、それらは異なる色、形状、又はパターンで表示することによって等、互いに区別する方法で表示することができる。【選択図】図２</description><language>eng ; jpn</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150625&DB=EPODOC&CC=JP&NR=2015118097A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150625&DB=EPODOC&CC=JP&NR=2015118097A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>U TAIKAI</creatorcontrib><creatorcontrib>TSEO ERIC YEH-WEI</creatorcontrib><title>SYSTEM AND METHOD FOR PROGRAMMING WORKPIECE FEATURE INSPECTION OPERATIONS FOR COORDINATE MEASURING MACHINE</title><description>PROBLEM TO BE SOLVED: To provide a system and method for programming workpiece feature inspection operations for a coordinate measuring machine.SOLUTION: An editing environment for programming workpiece feature inspection operations for a coordinate measuring machine is operated to display a three-dimensional workpiece representation including a first surface feature of a workpiece. A first feature surface sampling pattern is created having at least one pattern parameter adjusted to correspond to a first surface feature of the workpiece. User operations in a GUI further adjust pattern parameters of the sampling pattern. The further adjustment of the pattern parameters simultaneously affects a plurality of the sampling locations. The sampling pattern representation may include various types of operative and inoperative sampling locations, which may be displayed in a manner that distinguishes them from one another, such as by being represented with different colors, shapes or patterns.
【課題】座標測定機のワークピース要素検査動作をプログラミングするためのシステム及び方法を提供する。【解決手段】座標測定機のワークピース要素検査動作をプログラミングするための編集環境を動作させ、ワークピースの第１の表面要素を含む３次元ワークピース表現を表示させる。ワークピースの第１の表面要素に対応するように少なくとも１つのパターンパラメータが調節された第１の要素の表面サンプリングパターンを作成する。ＧＵＩでのユーザ操作が、サンプリングパターンのパターンパラメータを更に調節し、複数のサンプリング位置に同時に影響を及ぼす。サンプリングパターン表現は、様々な種類の有効なサンプリング位置及び無効なサンプリング位置を含むことができ、それらは異なる色、形状、又はパターンで表示することによって等、互いに区別する方法で表示することができる。【選択図】図２</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKwkAQRdNYiHqHwV5IFDGWw2aSrLI7y-wGsQpB1kJEA_H-aMQDWL1fvP-myc2ffSADaAswFGouoGQBJ1wJGqNtBSeWo9OkCErC0AiBtt6RCpotsCPBcfnvTzFLoS0G-tTQNzIGDKpaW5onk2t3H-Lix1myLCmoehX7ZxuHvrvER3y1B7dOs22W5el-h5u_pDc4UTcQ</recordid><startdate>20150625</startdate><enddate>20150625</enddate><creator>U TAIKAI</creator><creator>TSEO ERIC YEH-WEI</creator><scope>EVB</scope></search><sort><creationdate>20150625</creationdate><title>SYSTEM AND METHOD FOR PROGRAMMING WORKPIECE FEATURE INSPECTION OPERATIONS FOR COORDINATE MEASURING MACHINE</title><author>U TAIKAI ; TSEO ERIC YEH-WEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2015118097A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2015</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>U TAIKAI</creatorcontrib><creatorcontrib>TSEO ERIC YEH-WEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>U TAIKAI</au><au>TSEO ERIC YEH-WEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SYSTEM AND METHOD FOR PROGRAMMING WORKPIECE FEATURE INSPECTION OPERATIONS FOR COORDINATE MEASURING MACHINE</title><date>2015-06-25</date><risdate>2015</risdate><abstract>PROBLEM TO BE SOLVED: To provide a system and method for programming workpiece feature inspection operations for a coordinate measuring machine.SOLUTION: An editing environment for programming workpiece feature inspection operations for a coordinate measuring machine is operated to display a three-dimensional workpiece representation including a first surface feature of a workpiece. A first feature surface sampling pattern is created having at least one pattern parameter adjusted to correspond to a first surface feature of the workpiece. User operations in a GUI further adjust pattern parameters of the sampling pattern. The further adjustment of the pattern parameters simultaneously affects a plurality of the sampling locations. The sampling pattern representation may include various types of operative and inoperative sampling locations, which may be displayed in a manner that distinguishes them from one another, such as by being represented with different colors, shapes or patterns.
【課題】座標測定機のワークピース要素検査動作をプログラミングするためのシステム及び方法を提供する。【解決手段】座標測定機のワークピース要素検査動作をプログラミングするための編集環境を動作させ、ワークピースの第１の表面要素を含む３次元ワークピース表現を表示させる。ワークピースの第１の表面要素に対応するように少なくとも１つのパターンパラメータが調節された第１の要素の表面サンプリングパターンを作成する。ＧＵＩでのユーザ操作が、サンプリングパターンのパターンパラメータを更に調節し、複数のサンプリング位置に同時に影響を及ぼす。サンプリングパターン表現は、様々な種類の有効なサンプリング位置及び無効なサンプリング位置を含むことができ、それらは異なる色、形状、又はパターンで表示することによって等、互いに区別する方法で表示することができる。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
| title | SYSTEM AND METHOD FOR PROGRAMMING WORKPIECE FEATURE INSPECTION OPERATIONS FOR COORDINATE MEASURING MACHINE |
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