SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

PROBLEM TO BE SOLVED: To provide a substrate cleaning device which can further inhibit the occurrence of development defects.SOLUTION: A processing procedure unit U1 comprises: a rotation holding unit 20 for rotating a wafer W and liquid nozzles h2-h5 for discharging cleaning liquid onto a surface W...

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Bibliographische Detailangaben

Hauptverfasser:	KYODA HIDEJI, MUTA KOSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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