ANALYTICAL METHOD, ANALYZER AND SUBSTRATE PROCESSING APPARATUS
PROBLEM TO BE SOLVED: To provide an analytical method which allows for analysis of the measurement results of treatment temperature by means of a heat treatment plate, and to provide an analyzer and a substrate processing apparatus.SOLUTION: An analytical method includes a phenomenon determination s...
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| creator | JO KENICHIRO INOUE KAZUHIRO GOTO SHIGEHIRO |
| description | PROBLEM TO BE SOLVED: To provide an analytical method which allows for analysis of the measurement results of treatment temperature by means of a heat treatment plate, and to provide an analyzer and a substrate processing apparatus.SOLUTION: An analytical method includes a phenomenon determination step (steps S401, S403, S411, S421, S431, S432) for determining whether or not a predetermined phenomenon has occurred, based on the temperature data obtained by measurements of the treatment temperature by means of a heat treatment plate, and an estimation step (steps S402, 404, 412, 422, 433) for estimating the cause of the phenomenon, and at least any one of the countermeasures for eliminating the cause, when a determination is made that a predetermined phenomenon has occurred.
【課題】熱処理プレートによる処理温度の測定結果を分析することができる分析方法、分析装置および基板処理装置を提供する。【解決手段】熱処理プレートによる処理温度の測定によって得られた温度データに基づいて、所定の現象が起きたか否かを判定する現象判定過程（ステップＳ４０１、Ｓ４０３、Ｓ４１１、Ｓ４２１、Ｓ４３１、Ｓ４３２）と、現象が起きたと現象判定過程が判定した場合には、起きたと判定された現象の原因、および、その原因を解消するための対策の少なくともいずれかを推定する推定過程（ステップＳ４０２、４０４、４１２、４２２、４３３）と、を備えている分析方法である。【選択図】図３１ |
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【課題】熱処理プレートによる処理温度の測定結果を分析することができる分析方法、分析装置および基板処理装置を提供する。【解決手段】熱処理プレートによる処理温度の測定によって得られた温度データに基づいて、所定の現象が起きたか否かを判定する現象判定過程（ステップＳ４０１、Ｓ４０３、Ｓ４１１、Ｓ４２１、Ｓ４３１、Ｓ４３２）と、現象が起きたと現象判定過程が判定した場合には、起きたと判定された現象の原因、および、その原因を解消するための対策の少なくともいずれかを推定する推定過程（ステップＳ４０２、４０４、４１２、４２２、４３３）と、を備えている分析方法である。【選択図】図３１</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141215&DB=EPODOC&CC=JP&NR=2014236084A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141215&DB=EPODOC&CC=JP&NR=2014236084A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JO KENICHIRO</creatorcontrib><creatorcontrib>INOUE KAZUHIRO</creatorcontrib><creatorcontrib>GOTO SHIGEHIRO</creatorcontrib><title>ANALYTICAL METHOD, ANALYZER AND SUBSTRATE PROCESSING APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide an analytical method which allows for analysis of the measurement results of treatment temperature by means of a heat treatment plate, and to provide an analyzer and a substrate processing apparatus.SOLUTION: An analytical method includes a phenomenon determination step (steps S401, S403, S411, S421, S431, S432) for determining whether or not a predetermined phenomenon has occurred, based on the temperature data obtained by measurements of the treatment temperature by means of a heat treatment plate, and an estimation step (steps S402, 404, 412, 422, 433) for estimating the cause of the phenomenon, and at least any one of the countermeasures for eliminating the cause, when a determination is made that a predetermined phenomenon has occurred.
【課題】熱処理プレートによる処理温度の測定結果を分析することができる分析方法、分析装置および基板処理装置を提供する。【解決手段】熱処理プレートによる処理温度の測定によって得られた温度データに基づいて、所定の現象が起きたか否かを判定する現象判定過程（ステップＳ４０１、Ｓ４０３、Ｓ４１１、Ｓ４２１、Ｓ４３１、Ｓ４３２）と、現象が起きたと現象判定過程が判定した場合には、起きたと判定された現象の原因、および、その原因を解消するための対策の少なくともいずれかを推定する推定過程（ステップＳ４０２、４０４、４１２、４２２、４３３）と、を備えている分析方法である。【選択図】図３１</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBz9HP0iQzxdHb0UfB1DfHwd9FRAAtFuQYBGS4KwaFOwSFBjiGuCgFB_s6uwcGefu4KjgEBjkCx0GAeBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGhiZGxmYGHiaEyUIgDCdSrI</recordid><startdate>20141215</startdate><enddate>20141215</enddate><creator>JO KENICHIRO</creator><creator>INOUE KAZUHIRO</creator><creator>GOTO SHIGEHIRO</creator><scope>EVB</scope></search><sort><creationdate>20141215</creationdate><title>ANALYTICAL METHOD, ANALYZER AND SUBSTRATE PROCESSING APPARATUS</title><author>JO KENICHIRO ; INOUE KAZUHIRO ; GOTO SHIGEHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2014236084A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2014</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>JO KENICHIRO</creatorcontrib><creatorcontrib>INOUE KAZUHIRO</creatorcontrib><creatorcontrib>GOTO SHIGEHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JO KENICHIRO</au><au>INOUE KAZUHIRO</au><au>GOTO SHIGEHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANALYTICAL METHOD, ANALYZER AND SUBSTRATE PROCESSING APPARATUS</title><date>2014-12-15</date><risdate>2014</risdate><abstract>PROBLEM TO BE SOLVED: To provide an analytical method which allows for analysis of the measurement results of treatment temperature by means of a heat treatment plate, and to provide an analyzer and a substrate processing apparatus.SOLUTION: An analytical method includes a phenomenon determination step (steps S401, S403, S411, S421, S431, S432) for determining whether or not a predetermined phenomenon has occurred, based on the temperature data obtained by measurements of the treatment temperature by means of a heat treatment plate, and an estimation step (steps S402, 404, 412, 422, 433) for estimating the cause of the phenomenon, and at least any one of the countermeasures for eliminating the cause, when a determination is made that a predetermined phenomenon has occurred.
【課題】熱処理プレートによる処理温度の測定結果を分析することができる分析方法、分析装置および基板処理装置を提供する。【解決手段】熱処理プレートによる処理温度の測定によって得られた温度データに基づいて、所定の現象が起きたか否かを判定する現象判定過程（ステップＳ４０１、Ｓ４０３、Ｓ４１１、Ｓ４２１、Ｓ４３１、Ｓ４３２）と、現象が起きたと現象判定過程が判定した場合には、起きたと判定された現象の原因、および、その原因を解消するための対策の少なくともいずれかを推定する推定過程（ステップＳ４０２、４０４、４１２、４２２、４３３）と、を備えている分析方法である。【選択図】図３１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | ANALYTICAL METHOD, ANALYZER AND SUBSTRATE PROCESSING APPARATUS |
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